Abstract: Embodiments of the disclosure provide a saw chain having a pitch in the range of approximately 0.440 to approximately 0.450. Embodiments also include tie straps and/or other components having fluid distribution features.

Abstract: Embodiments of the disclosure provide an aggregate cutting saw chain having a pitch in the range of approximately 0.440 to approximately 0.450. Embodiments also include tie straps and/or other components having fluid distribution features.

Abstract: Embodiments of the disclosure provide an aggregate cutting saw chain having a pitch in the range of approximately 0.440 to approximately 0.450. Embodiments also include tie straps and/or other components having fluid distribution features.

Abstract: A guide for a concrete cutting chain saw. The guide has multiple paired slots which receive a post of a bracket mounted to the chain saw. The slots provide multiple pivotal mounts for the chain saw. The chain saw is mounted on the guide with the post being received in a pair of slots. The multiple slots provide sequential pivotal mounts for moving the saw to complete the cut. The post is mountable on either end of the bracket so the guide may be mounted on either side of the cut line.

Abstract: A chain saw for aggregate material has a nozzle that provides a spray of water to that portion of the saw chain that is traveling between the guide bar and the drive sprocket. The flooding provided by the nozzle washes slurry off of the saw chain. A basin with inclined baffles is provided to collect the slurry carried by the saw chain into the housing. Apertures are provided in the basin for discharging the collected slurry.

Abstract: The resistance of a resistive memory element, e.g. a synaptic element is programmed, e.g. adjusted to a target value, by pulses of a constant height and variable width. One polarity gives an increase in resistance; the other polarity gives a decrease. A short pulse applied after a longer pulse appears to have no effect. After each polarity change short pulses can again be used to make small adjustments. In a preferred embodiment longer and longer pulses are used until the resistance overshoots the target value. After overshooting the polarity is reversed and a second series of pulses is used to obtain a closer approach to the target. The resistive element comprises a resistive layer located between two electrodes, e.g. a matrix of amorphous silicon doped with boron containing V. One electrode is Cr and the other is V.