Patents by Inventor Ian Sharp

Ian Sharp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10301287
    Abstract: The invention relates to solid forms of cenicriviroc mesylate, methods of their preparation, pharmaceutical compositions thereof and methods of their use.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: May 28, 2019
    Assignee: Tobira Therapeutics, Inc.
    Inventors: Pasit Phiasivongsa, Martin Ian Cooper, Emma Kay Sharp
  • Patent number: 8472015
    Abstract: A method of resection-based positioning of a rotating fan beam transmitter is provided. The fan beam is rotating about a single axis of rotation. The rotating fan beam is being detected in a detector space including a detector cluster further including a plurality of detectors. The single axis of rotation intersects a reference plane in the detector space at an arbitrary angle. The method comprises: (A) detecting the rotating fan beam by using a plurality of detectors; (B) processing a set of detection signals to obtain a set of time-strike tags; and (C) determining the axis of rotation of the rotating fan beam in the detector space by using the set of time-strike tags. At least minimum number of detectors is stricken by the rotating fan beam. Each stricken detector generates a detection signal having a time-strike tag corresponding to a timing coordinate of the strike by the rotating fan beam.
    Type: Grant
    Filed: December 7, 2010
    Date of Patent: June 25, 2013
    Assignee: Trimble Navigation Ltd
    Inventor: Kevin Andrew Ian Sharp
  • Patent number: 8363928
    Abstract: A method for determining an absolute orientation in a global coordinate system is provided. In each grid position an image capturing device is directed to a selected object located in a scene. The method comprises: (A) reconstructing a scale model of the scene using point, line and/or region correspondences in multiple views of the scene obtained by the image capturing device placed in at least three grid positions; (B) obtaining location coordinates of at least three grid positions in the global coordinate system; and (C) determining a similarity transform from a photogrammetric coordinate system to the global coordinate system by determining rotation, translation and scale of the image capturing device for each grid position.
    Type: Grant
    Filed: December 24, 2010
    Date of Patent: January 29, 2013
    Assignee: Trimble Navigation Ltd.
    Inventor: Kevin Andrew Ian Sharp
  • Publication number: 20090303067
    Abstract: The present invention relates to a method and apparatus for tracking position of an object in a multipath environment (for example, inside a building) using radio signals. In order to provide an accurate Time of Arrival (TOA) estimate in a multipath environment, a wide bandwidth signal (providing a sharp rise time pulse) is required. Only a limited bandwidth is available in the radio spectrum, however. Further, installations for position tracking which generate wide bandwidth signals require expensive and complex radios. In the present invention, a number of narrow bandwidth signals are generated by a transmitter and combined together at a receiver to provide an effective wideband position location signal. Only relatively narrow bandwidth signals have to be transmitted, therefore, but accurate position can still be determined. Further, transmission of narrow bandwidth signals enables the use of relatively inexpensive radio transmitters.
    Type: Application
    Filed: March 8, 2007
    Publication date: December 10, 2009
    Applicant: COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION
    Inventor: Ian Sharp
  • Publication number: 20070184843
    Abstract: A method of determining the position of a plurality of a radio transmitter units relative to a master unit is disclosed in which a control signal is provided from the master unit commanding each of the radio transmitter units to transmit a test signal and the remaining units to receive. The arrival times of the test signals are measured at the receiving radio transmitter units, and the position of each radio transmitter unit relative to the master unit is calculated solely on the basis of the measured arrival times, and an approximate initial position for each unit.
    Type: Application
    Filed: May 26, 2004
    Publication date: August 9, 2007
    Inventor: Ian Sharp
  • Publication number: 20070098049
    Abstract: A device for encoding a datum, the device being operable to encode the datum by effecting a phase difference between one or more first pseudorandom signals and one or more corresponding second pseudorandom signals.
    Type: Application
    Filed: June 24, 2004
    Publication date: May 3, 2007
    Inventor: Ian Sharp
  • Publication number: 20060125644
    Abstract: A method of tracking a human or animal is disclosed. A mobile unit is carried by the human or animal, the mobile unit including at least one inertial sensor and a radio transmitter for transmitting data from the mobile unit to a base station. The output data of the inertial sensor is used to count the number of steps taken by the human or animal, and the position of the human or animal is predicted based on the number of steps taken and step length data for the human or animal.
    Type: Application
    Filed: February 25, 2004
    Publication date: June 15, 2006
    Inventor: Ian Sharp
  • Patent number: 6745494
    Abstract: A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlled draining of the liquid using a moveable drain that extracts water from a depth maintained just below the gas-liquid interface. Thereafter, the pressure may be reduced in the vessel and the dry and clean wafer may be removed. The high pressure suppresses the boiling point of liquids, thus allowing higher temperatures to be used to optimize reactivity. Megasonic waves are used with pressurized fluid to enhance cleaning performance. Supercritical substances are provided in a sealed vessel containing a wafer to promote cleaning and other treatment.
    Type: Grant
    Filed: December 30, 2002
    Date of Patent: June 8, 2004
    Assignee: Semitool, Inc.
    Inventors: Eric J. Bergman, Ian Sharp, Craig P. Meuchel, H. Frederick Woods
  • Patent number: 6681499
    Abstract: A processor and method for rinsing and drying of semiconductor substrates includes a process vessel contained within an outer containment vessel. A diluted organic vapor creates a Marangoni effect flow along the surface of processing liquid contained within the process vessel. The process vessel includes porous walls that allow residual chemicals, organic species, and other unwanted materials to flow from the process vessel to the outer containment vessel. The porous walls allow for the maintenance of a stable surface tension gradient to sustain a consistent Marangoni force for even drying. Replacement processing fluid is preferably introduced to the process vessel to prevent the build up of organic species in the surface layer of the processing fluid.
    Type: Grant
    Filed: January 3, 2003
    Date of Patent: January 27, 2004
    Assignee: Semitool, Inc.
    Inventors: Dana Scranton, Ian Sharp
  • Publication number: 20030101616
    Abstract: A processor for rinsing and drying of semiconductor substrates includes a process vessel contained within an outer containment vessel. A diluted organic vapor creates a Marangoni effect flow along the surface of processing liquid contained within the process vessel. The process vessel includes porous walls that allow residual chemicals, organic species, and other unwanted materials to flow from the process vessel to the outer containment vessel. The porous walls allow for the maintenance of a stable surface tension gradient to sustain a consistent Marangoni force for even drying. Replacement processing fluid is preferably introduced to the process vessel to prevent the build up of organic species in the surface layer of the processing fluid.
    Type: Application
    Filed: January 3, 2003
    Publication date: June 5, 2003
    Applicant: Semitool, Inc.
    Inventors: Dana Scranton, Ian Sharp
  • Publication number: 20030088995
    Abstract: A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlled draining of the liquid using a moveable drain that extracts water from a depth maintained just below the gas-liquid interface. Thereafter, the pressure may be reduced in the vessel and the dry and clean wafer may be removed. The high pressure suppresses the boiling point of liquids, thus allowing higher temperatures to be used to optimize reactivity. Megasonic waves are used with pressurized fluid to enhance cleaning performance. Supercritical substances are provided in a sealed vessel containing a wafer to promote cleaning and other treatment.
    Type: Application
    Filed: December 30, 2002
    Publication date: May 15, 2003
    Applicant: Semitool, Inc.
    Inventors: Eric J. Bergman, Ian Sharp, Craig P. Meuchel, H. Frederick Woods
  • Patent number: 6543156
    Abstract: A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlled draining of the liquid using a moveable drain that extracts water from a depth maintained just below the gas-liquid interface. Thereafter, the pressure may be reduced in the vessel and the dry and clean wafer may be removed. The high pressure suppresses the boiling point of liquids, thus allowing higher temperatures to be used to optimize reactivity. Megasonic waves are used with pressurized fluid to enhance cleaning performance. Supercritical substances are provided in a sealed vessel containing a wafer to promote cleaning and other treatment.
    Type: Grant
    Filed: March 18, 2002
    Date of Patent: April 8, 2003
    Assignee: Semitool, Inc.
    Inventors: Eric J. Bergman, Ian Sharp, Craig P. Meuchel, H. Frederick Woods
  • Patent number: 6502591
    Abstract: A processor for rinsing and drying of semiconductor substrates includes a process vessel contained within an outer containment vessel. A diluted organic vapor creates a Marangoni effect flow along the surface of processing liquid contained within the process vessel. The process vessel includes porous walls that allow residual chemicals, organic species, and other unwanted materials to flow from the process vessel to the outer containment vessel. The porous walls allow for the maintenance of a stable surface tension gradient to sustain a consistent Marangoni force for even drying. Replacement processing fluid is preferably introduced to the process vessel to prevent the build up of organic species in the surface layer of the processing fluid.
    Type: Grant
    Filed: June 8, 2000
    Date of Patent: January 7, 2003
    Assignee: Semitool, Inc.
    Inventors: Dana Scranton, Ian Sharp
  • Patent number: 6488038
    Abstract: A method and apparatus for cleaning organic material from a semiconductor substrate suppresses the oxidation of a conductive film or layer on the substrate. A semiconductor substrate is immersed within a bath of water. The conductive layer is contacted to a source of electrons. The electrons form a floating charge protecting the conductive layer from oxidation. Ozone gas is introduced into the water bath. In another aspect, the semiconductor substrate is sprayed with water. Organic contaminants or films are oxidized and removed by the ozone, while the conductive or metal layer is preserved. An anode may be placed adjacent to the surface of the semiconductor substrate to passivate the metal layer via current flow.
    Type: Grant
    Filed: November 6, 2000
    Date of Patent: December 3, 2002
    Assignee: Semitool, Inc.
    Inventors: Eric J. Bergman, Craig P. Meuchel, Ian Sharp
  • Publication number: 20020095816
    Abstract: A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlled draining of the liquid using a moveable drain that extracts water from a depth maintained just below the gas-liquid interface. Thereafter, the pressure may be reduced in the vessel and the dry and clean wafer may be removed. The high pressure suppresses the boiling point of liquids, thus allowing higher temperatures to be used to optimize reactivity. Megasonic waves are used with pressurized fluid to enhance cleaning performance. Supercritical substances are provided in a sealed vessel containing a wafer to promote cleaning and other treatment.
    Type: Application
    Filed: March 18, 2002
    Publication date: July 25, 2002
    Applicant: Semitool, Inc.
    Inventors: Eric J. Bergman, Ian Sharp, Craig P. Meuchel, H. Frederick Woods
  • Patent number: 6357142
    Abstract: A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlled draining of the liquid using a moveable drain that extracts water from a depth maintained just below the gas-liquid interface. Thereafter, the pressure may be reduced in the vessel and the dry and clean wafer may be removed. The high pressure suppresses the boiling point of liquids, thus allowing higher temperatures to be used to optimize reactivity. Megasonic waves are used with pressurized fluid to enhance cleaning performance. Supercritical substances are provided in a sealed vessel containing a wafer to promote cleaning and other treatment.
    Type: Grant
    Filed: August 7, 2001
    Date of Patent: March 19, 2002
    Assignee: Semitool, Inc.
    Inventors: Eric J. Bergman, Ian Sharp, Craig P. Meuchel, H. Frederick Woods
  • Publication number: 20020026729
    Abstract: A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlled draining of the liquid using a moveable drain that extracts water from a depth maintained just below the gas-liquid interface. Thereafter, the pressure may be reduced in the vessel and the dry and clean wafer may be removed. The high pressure suppresses the boiling point of liquids, thus allowing higher temperatures to be used to optimize reactivity. Megasonic waves are used with pressurized fluid to enhance cleaning performance. Supercritical substances are provided in a sealed vessel containing a wafer to promote cleaning and other treatment.
    Type: Application
    Filed: August 7, 2001
    Publication date: March 7, 2002
    Applicant: Semitool, Inc.
    Inventors: Eric J. Bergman, Ian Sharp, Craig P. Meuchel, H. Frederick Woods
  • Patent number: 6330503
    Abstract: A global positioning system (GPS) controlled marking apparatus for staking and a method of using the apparatus to stake a surface. The apparatus uses a standard architectural or other surface site application program and a stakeout driver program in a standard computer and includes a GPS receiver, a stakeout tool, an autopilot, a vehicle, a geographical drawing converter, and a location comparator. The geographical drawing converter converts an image of a drawing pattern to geographical mark locations. The autopilot guides the vehicle to the geographical mark locations. The location comparator detects a location march between the geographical mark locations of the drawing pattern and a current geographical location determined by the GPS receiver. Information for the location match is used by the stakeout tool for driving a stake into the ground.
    Type: Grant
    Filed: October 2, 2000
    Date of Patent: December 11, 2001
    Assignee: Trimble Navigation Limited
    Inventors: Kevin Andrew Ian Sharp, Charles David Hope Manning
  • Patent number: 6286231
    Abstract: A method and apparatus for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlled draining of the liquid using a moveable drain that extracts water from a depth maintained just below the gas-liquid interface. Thereafter, the pressure may be reduced in the vessel and the dry and clean wafer may be removed. The high pressure suppresses the boiling point of liquids, thus allowing higher temperatures to be used to optimize reactivity. Megasonic waves are used with pressurized fluid to enhance cleaning performance. Supercritical substances are provided in a sealed vessel containing a wafer to promote cleaning and other treatment.
    Type: Grant
    Filed: January 12, 2000
    Date of Patent: September 11, 2001
    Assignee: Semitool, Inc.
    Inventors: Eric J. Bergman, Ian Sharp, Craig P. Meuchel, H. Frederick Woods