Abstract: The invention is a surface plasmon resonance (SPR) sensor to determine the presence and quantity of biological or chemical entities in an analyte. The sensor comprises a metal periodic structure deposited as a thin layer of a noble metal, comprising a one dimensional array of nanoslits or a two dimensional array of nanoholes on a transparent dielectric substrate, a nm-thick layer of transparent dielectric protection layer on top of the metal periodic structure and a functionalization layer, which acts as a binding layer to biological or biochemical entities in an analyte that is in contact with the functionaliztion layer.

Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

Abstract: Novel, polarization-insensitive, birefringent, broadband tunable filter arrangements that allow high throughput, based on a combination of tunable birefringent layers or polarization dependent filters, in combination with one or more of the following components (i) thin film achromatic quarter waveplates based on the form birefringence of dielectric subwavelength grating structures, (ii) nano wire-grid polarizers made of metallic wire grids; (iii) omnidirectional dielectric mirrors, (iv) polarization conversion mirrors, (v) reflective polarized beam splitters for circularly polarized light, (vi) metallic subwavelength gratings with lines having Gaussian profile, and (vii) Faraday mirror. All of these components may be implemented in thin film form on one or more substrates, such that a compact and cost effective filter can be produced. The birefringent layers can be any birefringent or magneto-optic layer but especially liquid crystals.

Abstract: An optical coherence tomography (OCT) imager comprising: a low coherence light source that provides light; a photosensor for imaging light; optics that directs a first portion of the light along a first optical path so that it is imaged on the photosensor and a second portion of the light along a second optical path so that it is reflected by material in the target to the photosensor where it is imaged to interfere with light from the first portion to form an interference pattern; and a mask through which light from at least one of the first and second portions of light passes that generates a relative phase perturbation between portions of light that passes through it.

Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, critical dimension and overlay misregistration. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

Abstract: Novel, polarization-insensitive, birefringent, broadband tunable filter arrangements that allow high throughput, based on a combination of tunable birefringent layers or polarization dependent filters, in combination with one or more of the following components (i) thin film achromatic quarter waveplates based on the form birefringence of dielectric subwavelength grating structures, (ii) nano wire-grid polarizers made of metallic wire grids; (iii) omnidirectional dielectric mirrors, (iv) polarization conversion mirrors, (v) reflective polarized beam splitters for circularly polarized light, (vi) metallic subwavelength gratings with lines having Gaussian profile, and (vii) Faraday mirror. All of these components may be implemented in thin film form on one or more substrates, such that a compact and cost effective filter can be produced. The birefringent layers can be any birefringent or magneto-optic layer but especially liquid crystals.

Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

Abstract: Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.

Abstract: Before the diffraction from a diffracting structure on a semiconductor wafer is measured, where necessary, the film thickness and index of refraction of the films underneath the structure are first measured using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then used to calculate intensity or ellipsometric signatures of the diffracting structure. The diffracting structure is then measured using a spectroscopic scatterometer using polarized and broadband radiation to obtain an intensity or ellipsometric signature of the diffracting structure. Such signature is then matched with the signatures in the database to determine the grating shape parameters of the structure.

Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying, or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.