Patents by Inventor Ibrahim Khalaf M Alsulami

Ibrahim Khalaf M Alsulami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200325025
    Abstract: Producing nanostructure materials in a thin film reactor (TFR) from starting material of inorganic or organic material of layered or two dimensional (2D) structure or inorganic material transformed in situ into 2D inorganic material, or single walled carbon nanotubes (SWCNTs), and a solvent or liquid phase. The TFR can be a vortex fluidic device (VFD) or a device with spaced first and second fluid contact surfaces, which can be conical, for relative rotation to generate shear stress in the thin film therebetween. A liquid supply means delivers a liquid between the first and second fluid contact surfaces. The composition can be exposed to laser energy. The thin film reactor can form graphene, graphene oxide, scrolls, tubes, spheres or rings of the layered or 2D material.
    Type: Application
    Filed: November 15, 2018
    Publication date: October 15, 2020
    Inventors: Colin Raston, Kasturi Vimalanathan, Darryl Bruce Jones, Ibrahim Khalaf M Alsulami, Thaar Muqhim D Alharbi