Abstract: A method for producing a cyclic ether represented by formula (2) includes reacting a 2-hydroxy cyclic ether, represented by formula (1), with hydrogen in the presence of a catalyst.

Abstract: A method for producing a cyclic ether represented by formula (2) includes reacting a 2-hydroxy cyclic ether, represented by formula (1), with hydrogen in the presence of a catalyst.

Abstract: A polymer compound for a photoresist composition (a) having a high dissolution rate in a developing solution after exposure and (b) exhibiting little swelling during development. A tertiary alcohol derivative that is a raw material for the polymer compound. A tertiary alcohol that is an intermediate of the tertiary alcohol derivative. The tertiary alcohol is represented by formula (3): wherein R1 and R2 individually represent a linear, branched or cyclic alkylene group having 2 to 9 carbon atoms, which may contain an oxygen atom, and wherein R1 and R2 may together form a ring with a carbon atom to which R1 and R2 are bonded.

Abstract: To provide an acrylamide derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition, a polymer produced through polymerization of a raw material containing the acrylamide derivative, and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. The invention provides an acrylamide derivative represented by the following formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; W represents a C1 to C10 alkylene group or a C3 to C10 cycloalkylene group; R2 represents a cyclic group having 3 to 20 ring-forming atoms and represented by the following formula (2): wherein X represents an oxygen atom or >N—R3; R3 represents a hydrogen atom or a C1 to C5 alkyl group; Y represents >C?O or >S(?O)n; and n is an integer of 0 to 2.

Abstract: A polymer compound for a photoresist composition (a) having a high dissolution rate in a developing solution after exposure and (b) exhibiting little swelling during development. A tertiary alcohol derivative that is a raw material for the polymer compound. A tertiary alcohol that is an intermediate of the tertiary alcohol derivative. The tertiary alcohol is represented by formula (3): wherein R1 and R2 individually represent a linear, branched or cyclic alkylene group having 2 to 9 carbon atoms, which may contain an oxygen atom, and wherein R1 and R2 may together form a ring with a carbon atom to which R1 and R2 are bonded.

Abstract: (1) A polymer compound for photoresist composition which is high in dissolution rate in a developing solution after exposure and small swelling at the development and (2) a compound which is a raw material for such a polymer compound are provided. Furthermore, (3) a photoresist composition containing the subject polymer compound is provided. In detail, a tertiary alcohol derivative represented by the following general formula (1) is provided. (In the formula, R1 and R2 are taken together to form a ring together with a carbon atom to which R1 and R2 are bonded, and R1 and R2 as taken represent a linear, branched or cyclic alkylene group having from 2 to 9 carbon atoms, which may contain an oxygen atom at an arbitrary position; R3 represents a hydrogen atom or a methyl group; W represents a linear, branched or cyclic alkylene group having from 1 to 10 carbon atoms; and n represents 0 or 1.

Abstract: (1) A polymer compound for photoresist compositions which is high in storage stability and small swelling at the development and (2) a compound which is a raw material for such a polymer compound are provided; and (3) a photoresist composition with improved LWR containing the subject polymer compound are further provided. In detail, [1] a tertiary alcohol derivative represented by the following general formula (1) is provided. (In the formula, wherein R1 represents a linear alkyl group having from 1 to 6 carbon atoms, a branched alkyl group having from 3 to 6 carbon atoms or a cyclic alkyl group having from 3 to 6 carbon atoms; R2 represents a hydrogen atom or a methyl group; W represents a linear alkylene group having from 1 to 10 carbon atoms, a branched alkylene group having from 3 to 10 carbon atoms or a cyclic alkylene group having from 3 to 10 carbon atoms; n represents 0 or 1; and p represents 1 or 2.

Abstract: (1) A polymer compound for photoresist compositions which is high in storage stability and small swelling at the development and (2) a compound which is a raw material for such a polymer compound are provided; and (3) a photoresist composition with improved LWR containing the subject polymer compound are further provided. In detail, [1] a tertiary alcohol derivative represented by the following general formula (1) is provided. (In the formula, wherein R1 represents a linear alkyl group having from 1 to 6 carbon atoms, a branched alkyl group having from 3 to 6 carbon atoms or a cyclic alkyl group having from 3 to 6 carbon atoms; R2 represents a hydrogen atom or a methyl group; W represents a linear alkylene group having from 1 to 10 carbon atoms, a branched alkylene group having from 3 to 10 carbon atoms or a cyclic alkylene group having from 3 to 10 carbon atoms; n represents 0 or 1; and p represents 1 or 2.

Abstract: (1) A polymer compound for photoresist composition which is high in dissolution rate in a developing solution after exposure and small swelling at the development and (2) a compound which is a raw material for such a polymer compound are provided. Furthermore, (3) a photoresist composition containing the subject polymer compound is provided. In detail, a tertiary alcohol derivative represented by the following general formula (1) is provided. (In the formula, R1 and R2 are taken together to form a ring together with a carbon atom to which R1 and R2 are bonded, and R1 and R2 as taken represent a linear, branched or cyclic alkylene group having from 2 to 9 carbon atoms, which may contain an oxygen atom at an arbitrary position; R3 represents a hydrogen atom or a methyl group; w represents a linear, branched or cyclic alkylene group having from 1 to 10 carbon atoms; and n represents 0 or 1.