Abstract: A selecting method includes the steps of receiving pattern-forming area 100% region data and unit price data from a mask manufacturer's computer, extracting a 100% code that matches a condition based on the pattern-forming area 100% region data if data are received from computers of at least a predetermined number of mask manufacturers, calculating a pattern-forming area ratio based on a pattern-forming 100% region of the extracted 100% code and a pattern-forming region of the pattern-forming area data, calculating a unit price from a pattern-forming area ratio based on the unit price data and pattern-forming area ratio, and determining a mask manufacturer to which an order is sent based on the calculated unit price.

Abstract: A level F.sub.A at a shot center of a specified shot is measured. A level F.sub.B is measured at a nonexposure region. A level difference .DELTA.F is calculated based on the level F.sub.A at the shot center and the level F.sub.B at the nonexposure region. After the level difference .DELTA.F is calculated for all the specified shots, an average value .DELTA.F.sub.ave of level differences .DELTA.F is calculated. Thereafter, focusing based on the average value .DELTA.F.sub.ave and subsequent exposure are executed for the respective shots in a step-and-repeat manner. Thereby, a focusing method in photolithography enables formation of elements having good pattern configuration even if the pattern is miniaturized to a higher extent in accordance with high integration.

Abstract: A hydraulic variable damping device for installation in the frame of a structure to control vibrations while evaluating the damping property of the structure during seismic disturbances. Control means for this device include a command value judging circuit for comparing the plus or minus sign of a differential pressure value between hydraulic chambers within the device with that of a generated damping force command value to output a valve opening command value for fully opening a flow regulating valve when the signs of the command value and the differential pressure value are different from each other. A pressure controller is provided for making a correction based on the feedback of the pressure valve when the signs of the damping force command value and the differential pressure value are the same to generate a valve opening command value.

Abstract: A LOCOS isolation film is formed on a major surface of a semiconductor substrate. Thereafter, a new surface of the semiconductor substrate is exposed by wet etching. A resist pattern is formed on the exposed new surface. A part of the LOCOS isolation film is removed using this resist pattern, to expose the surface of the semiconductor substrate. This unsymmetrical LOCOS isolation film increases the effective area of the surface of the semiconductor substrate and preserves predetermined dielectric resistance.

Abstract: A LOCOS isolation film is formed on a major surface of a semiconductor substrate. Thereafter, a new surface of the semiconductor substrate is exposed by wet etching. A resist pattern is formed on the exposed new surface. A part of the LOCOS isolation film is removed using this resist pattern, to expose the surface of the semiconductor substrate. This unsymmetrical LOCOS isolation film increases the effective area of the surface of the semiconductor substrate and preserves predetermined dielectric resistance.