Patents by Inventor Ichiro Mikami

Ichiro Mikami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning solution for removing residue
    Patent number: 6949495
    Abstract: A solution for washing away residue, comprising an aqueous solution of a water-soluble high molecular compound in which is dissolved at least one kind of dissolving agent selected from an amine and a fluoride. The washing solution is capable of effectively washing away the residue formed during the production of electronic circuits, is very lowly corrosive to the insulating films, low-dielectric interlayer insulating films and wirings, and offers an advantage of little generating foam.
    Type: Grant
    Filed: August 31, 2001
    Date of Patent: September 27, 2005
    Assignee: Tokuyama Corporation
    Inventors: Mizuki Suto, Ichiro Mikami, Tohru Nonaka, Seiji Tono
  • Cleaning solution for removing residue
    Publication number: 20030004075
    Abstract: A solution for washing away residue, comprising an aqueous solution of a water-soluble high molecular compound in which is dissolved at least one kind of dissolving agent selected from an amine and a fluoride. The washing solution is capable of effectively washing away the residue formed during the production of electronic circuits, is very lowly corrosive to the insulating films, low-dielectric interlayer insulating films and wirings, and offers an advantage of little generating foam.
    Type: Application
    Filed: April 25, 2002
    Publication date: January 2, 2003
    Inventors: Mizuki Suto, Ichiro Mikami, Tohru Nonaka, Seiji Tono
  • Photoresist ashing residue cleaning agent
    Patent number: 6197733
    Abstract: A photoresist ashing residue cleaning agent used after the ashing of the photoresist in the production of a semiconductor circuit pattern. The photoresist ashing residue cleaning agent comprises an aqueous solution containing: a) an ammonium fluoride compound; and b) an amphoteric surfactant of which the cationic group is an ammonium salt and of which the anionic group is a carboxylate.
    Type: Grant
    Filed: September 9, 1999
    Date of Patent: March 6, 2001
    Assignee: Tokuyama Corporation
    Inventors: Ichiro Mikami, Yoshifumi Yamashita, Toru Nonaka
  • Method for producing cyclohexanone and alkyl-substituted or unsubstituted phenol
    Patent number: 4010206
    Abstract: Both cyclohexanone and alkyl-substituted or unsubstituted phenol are simultaneously produced, in a one step reaction, by oxidizing, in the liquid phase, an alkyl-substituted or unsubstituted phenylcyclohexane of the formula (I): ##STR1## wherein R represents either a hydrogen atom or a methyl radical with an oxidizing gas containing molecular oxygen therein in the presence of hydrogen bromide.
    Type: Grant
    Filed: January 22, 1976
    Date of Patent: March 1, 1977
    Assignee: UBE Industries, Ltd.
    Inventors: Ichiro Mikami, Sadao Danno, Izuhiko Uchida, Yasutaka Tasaki, Junichi Kugimoto, Satoru Fujitsu