Abstract: A static random access memory (SRAM) cell includes a first well region of a first conductivity type, a second well region of the first conductivity type, formed in a location different from a location where the first well region is formed, and a third well region of a second conductivity type, which is located between the first well region and the second well region. The memory cell further includes a first tap diffused layer of the first conductivity type for supplying a potential to the first well region, a second tap diffused layer of the first conductivity type for supplying the potential to the second well region, the first and second tap diffused layers being arranged substantially on a diagonal line in the layout of the SRAM cell, and a metal interconnection connected to the first and second tap diffused layers, the metal interconnection passing on the third well region in the SRAM cell.

Abstract: A semiconductor integrated circuit device includes a first chip, a second chip to transmit and receive data to and from the first chip, and a through circuit provided in the first chip to transfer a clock signal and a test signal to the second chip. The clock signal and the test signal is inputted from an external device. The through circuit adjusts timing relation between the clock signal and the test signal based on a timing adjust signal. The timing adjust signal is inputted from the external device.

Abstract: A first mathematical expression indicating a dependence of SER on an information storage node diffusion layer area at the same information storage node voltage Vn is derived with a use of a result of measuring a relationship between SER and the information storage node diffusion layer area of a storage circuit or an information holding circuit composed of MISFET using a plurality of information storage node voltages Vn as a parameter. Then, a second mathematical expression is derived from the measurement result by substituting a relationship indicating a dependence of SER on an information storage node voltage at the same information storage node diffusion layer area Sc into the first mathematical expression. SER can be calculated by substituting a desired information storage node diffusion layer area and a desired information storage node voltage of a storage circuit or an information holding circuit into the second mathematical expression.

Abstract: A static random access memory (SRAM) cell includes a first well region of a first conductivity type, a second well region of the first conductivity type, formed in a location different from a location where the first well region is formed, and a third well region of a second conductivity type, which is located between the first well region and the second well region. The memory cell further includes a first tap diffused layer of the first conductivity type for supplying a potential to the first well region, a second tap diffused layer of the first conductivity type for supplying the potential to the second well region, the first and second tap diffused layers being arranged substantially on a diagonal line in the layout of the SRAM cell, and a metal interconnection connected to the first and second tap diffused layers, the metal interconnection passing on the third well region in the SRAM cell.

Abstract: A semiconductor integrated circuit device includes a first chip, a second chip to transmit and receive data to and from the first chip, and a through circuit provided in the first chip to transfer a clock signal and a test signal to the second chip. The clock signal and the test signal is inputted from an external device. The through circuit adjusts timing relation between the clock signal and the test signal based on a timing adjust signal. The timing adjust signal is inputted from the external device.

Abstract: A first mathematical expression indicating a dependence of SER on an information storage node diffusion layer area at the same information storage node voltage Vn is derived with a use of a result of measuring a relationship between SER and the information storage node diffusion layer area of a storage circuit or an information holding circuit composed of MISFET using a plurality of information storage node voltages Vn as a parameter. Then, a second mathematical expression is derived from the measurement result by substituting a relationship indicating a dependence of SER on an information storage node voltage at the same information storage node diffusion layer area Sc into the first mathematical expression. SER can be calculated by substituting a desired information storage node diffusion layer area and a desired information storage node voltage of a storage circuit or an information holding circuit into the second mathematical expression.

Abstract: A semiconductor device that operates at high speed using a low voltage power source, in which the output of each gate in the standby state is stable, and which has a delay time that is not affected by the frequency of the input signal. TrQ1 to TrQ8, which form multiple stages of the inverters are designed to have a low threshold voltage in order to accomplish low voltage operation. When input node A is at “L” in the standby state, TrQ2, Q3, Q6, and Q8 which cut-off are connected to high threshold voltage TrQn1 and Qp1. In the standby state, power cutting TrQn1 and Qp1 cut off in accordance with chip selecting signals CS, /CS, thereby blocking the flow of sub-threshold current to TrQ1˜Q8. Since TrQ1, Q4, Q5 and Q8 are not cut off at this time, the output potential of each inverter is stable.