Patents by Inventor Ichiro Nakaso

Ichiro Nakaso has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10395829
    Abstract: A dielectric resin composition for a film capacitor is a mixture containing an organic material A and an organic material B. The organic material A includes at least two kinds of organic material components A1, A2, . . . having reactive groups (for example, OH, NCO) that cross-link each other. The organic material B does not have a reactive site capable of reacting with the organic material A and has a dielectric loss tan ? of 0.3% or less at a temperature of 125° C. The mixture has a glass transition temperature of 130° C. or higher and preferably 280° C. or lower.
    Type: Grant
    Filed: April 17, 2014
    Date of Patent: August 27, 2019
    Assignee: MURATA MANUFACTURING CO., LTD.
    Inventors: Tomomichi Ichikawa, Norihiro Yoshikawa, Ichiro Nakamura, Shinichi Kobayashi, Ichiro Nakaso, Yasunori Hioki, Tomoki Inakura
  • Patent number: 9443655
    Abstract: To increase the heat resistance of a film capacitor, a dielectric resin composition is used as a material for a dielectric resin film used in a film capacitor, the dielectric resin composition being cured by mixing and crosslinking two or more organic materials having functional groups that react with each other to provide a cured article. At least one pair highly cohesive atomic groups which has a molecular cohesive energy equal to or higher than that of a methyl group and capable of cohering with each other due to the molecular cohesive energy is linked to the organic material. The highly cohesive atomic groups form a cohesive portion serving as pseudo-crosslinking.
    Type: Grant
    Filed: September 19, 2011
    Date of Patent: September 13, 2016
    Assignee: MURATA MANUFACTURING CO., LTD.
    Inventors: Tomomichi Ichikawa, Yasunori Hioki, Norihiro Yoshikawa, Ichiro Nakamura, Shinichi Kobayashi, Ichiro Nakaso
  • Patent number: 9416216
    Abstract: To increase the heat resistance of a film capacitor, a cured article obtained by curing a mixed solution of a polyvinyl acetal having a hydroxyl group content of 10% to 38% by weight, the number of backbone carbon atoms of the polyvinyl acetal being 100 or more, and a polyisocyanate having an isocyanate content of 1% to 50% by weight is used as a dielectric resin films material arranged between first and second counter electrodes facing each other. At least the polyvinyl acetal is subjected to high-pressure homogenization in which a shearing force is applied such that a pressure applied to the polyvinyl acetal is 50 MPa or more when the material is passed through a path having a diameter of 0.125 mm and a length of 5 mm, so that the solubility is increased to allow a curing reaction to proceed uniformly. The cured article has a glass transition temperature of 130° C. or higher and a breakdown voltage of 350 V/?m or more.
    Type: Grant
    Filed: August 30, 2011
    Date of Patent: August 16, 2016
    Assignee: MURATA MANUFACTURING CO., LTD.
    Inventors: Yasunori Hioki, Tomomichi Ichikawa, Norihiro Yoshikawa, Ichiro Nakamura, Ichiro Nakaso, Shinichi Kobayashi, Tomoki Inakura
  • Patent number: 9105408
    Abstract: A resin composition constituting dielectric resin films of a film capacitor includes a first atom group including at least one functional group selected from among a methylene group, an aromatic ring and an ether group and having a relatively small molar polarizability, and a second atom group including at least one functional group selected from among a hydroxyl group, an amino group and a carbonyl group and having a relatively large molar polarizability. The resin composition satisfies the condition that a value calculated from the formula (sum of absorption band intensities of first atom group)/(sum of absorption band intensities of second atom group) is 1.0 or more. Herein, as absorption band intensities of the functional groups, peak intensities detected in specific wavenumber ranges are employed.
    Type: Grant
    Filed: August 29, 2014
    Date of Patent: August 11, 2015
    Assignee: MURATA MANUFACTURING CO., LTD.
    Inventors: Tomomichi Ichikawa, Norihiro Yoshikawa, Shinichi Kobayashi, Yasunori Hioki, Ichiro Nakaso, Tomoki Inakura
  • Publication number: 20140368970
    Abstract: A resin composition constituting dielectric resin films of a film capacitor includes a first atom group including at least one functional group selected from among a methylene group, an aromatic ring and an ether group and having a relatively small molar polarizability, and a second atom group including at least one functional group selected from among a hydroxyl group, an amino group and a carbonyl group and having a relatively large molar polarizability. The resin composition satisfies the condition that a value calculated from the formula (sum of absorption band intensities of first atom group)/(sum of absorption band intensities of second atom group) is 1.0 or more. Herein, as absorption band intensities of the functional groups, peak intensities detected in specific wavenumber ranges are employed.
    Type: Application
    Filed: August 29, 2014
    Publication date: December 18, 2014
    Inventors: Tomomichi Ichikawa, Norihiro Yoshikawa, Shinichi Kobayashi, Yasunori Hioki, Ichiro Nakaso, Tomoki Inakura
  • Publication number: 20140226256
    Abstract: A dielectric resin composition for a film capacitor is a mixture containing an organic material A and an organic material B. The organic material A includes at least two kinds of organic material components A1, A2, . . . having reactive groups (for example, OH, NCO) that cross-link each other. The organic material B does not have a reactive site capable of reacting with the organic material A and has a dielectric loss tan ? of 0.3% or less at a temperature of 125° C. The mixture has a glass transition temperature of 130° C. or higher and preferably 280° C. or lower.
    Type: Application
    Filed: April 17, 2014
    Publication date: August 14, 2014
    Applicant: MURATA MANUFACTURING CO., LTD.
    Inventors: Tomomichi Ichikawa, Norihiro Yoshikawa, Ichiro Nakamura, Shinichi Kobayashi, Ichiro Nakaso, Yasunori Hioki, Tomoki Inakura
  • Publication number: 20120008250
    Abstract: To increase the heat resistance of a film capacitor, a dielectric resin composition is used as a material for a dielectric resin film used in a film capacitor, the dielectric resin composition being cured by mixing and crosslinking two or more organic materials having functional groups that react with each other to provide a cured article. At least one pair highly cohesive atomic groups which has a molecular cohesive energy equal to or higher than that of a methyl group and capable of cohering with each other due to the molecular cohesive energy is linked to the organic material. The highly cohesive atomic groups form a cohesive portion serving as pseudo-crosslinking.
    Type: Application
    Filed: September 19, 2011
    Publication date: January 12, 2012
    Applicant: MURATA MANUFACTURING CO., LTD.
    Inventors: Tomomichi Ichikawa, Yasunori Hioki, Norihiro Yoshikawa, Ichiro Nakamura, Shinichi Kobayashi, Ichiro Nakaso
  • Publication number: 20110310527
    Abstract: To increase the heat resistance of a film capacitor, a cured article obtained by curing a mixed solution of a polyvinyl acetal having a hydroxyl group content of 10% to 38% by weight, the number of backbone carbon atoms of the polyvinyl acetal being 100 or more, and a polyisocyanate having an isocyanate content of 1% to 50% by weight is used as a dielectric resin films material arranged between first and second counter electrodes facing each other. At least the polyvinyl acetal is subjected to high-pressure homogenization in which a shearing force is applied such that a pressure applied to the polyvinyl acetal is 50 MPa or more when the material is passed through a path having a diameter of 0.125 mm and a length of 5 mm, so that the solubility is increased to allow a curing reaction to proceed uniformly. The cured article has a glass transition temperature of 130° C. or higher and a breakdown voltage of 350 V/?m or more.
    Type: Application
    Filed: August 30, 2011
    Publication date: December 22, 2011
    Applicant: MURATA MANUFACTURING CO., LTD.
    Inventors: Yasunori Hioki, Tomomichi Ichikawa, Norihiro Yoshikawa, Ichiro Nakamura, Ichiro Nakaso, Shinichi Kobayashi, Tomoki Inakura