Abstract: The present invention provides an exposure apparatus comprising an illumination optical system configured to illuminate a reticle with a light beam from a light source, and a projection optical system configured to project a pattern of the reticle onto a substrate, the illumination optical system including a light amount adjusting unit configured to adjust an amount of the light beam, a polarization adjusting unit configured to adjust a polarization state of the light beam, and a beam splitter configured to split the incident light beam into two light beams, wherein the light amount adjusting unit, the polarization adjusting unit, and the beam splitter are set in an order from the light source side.

Abstract: An adjustment method for adjusting an illumination condition in illuminating an original plate using an illumination optical system and projecting an image of a pattern formed on the original plate onto a substrate through a projection optical system includes measuring a polarization state of light that has passed through the illumination optical system, the original plate, and the projection optical system in a state where the original plate is located on an object plane of the projection optical system, and adjusting the polarization state based on the measured polarization state.

Abstract: An adjustment method for adjusting an illumination condition in illuminating an original plate using an illumination optical system and projecting an image of a pattern formed on the original plate onto a substrate through a projection optical system includes measuring a polarization state of light that has passed through the illumination optical system, the original plate, and the projection optical system in a state where the original plate is located on an object plane of the projection optical system, and adjusting the polarization state based on the measured polarization state.

Abstract: The present invention provides an exposure apparatus comprising an illumination optical system configured to illuminate a reticle with a light beam from a light source, and a projection optical system configured to project a pattern of the reticle onto a substrate, the illumination optical system including a light amount adjusting unit configured to adjust an amount of the light beam, a polarization adjusting unit configured to adjust a polarization state of the light beam, and a beam splitter configured to split the incident light beam into two light beams, wherein the light amount adjusting unit, the polarization adjusting unit, and the beam splitter are set in an order from the light source side.

Abstract: An exposure apparatus for exposing a pattern of a reticle onto an object to be exposed, via a projection optical system, utilizing exposure light, includes an optical element for determining a shape of an effective light source on a predetermined surface that substantially has a Fourier transformation relationship with the reticle, a detector for detecting the shape of the effective light source and a light intensity on the object, and a corrector for correcting a variance of performance of the projection optical system, and a controller for controlling the corrector based on a detection result of the detector.

Abstract: Disclosed is an exposure apparatus and method, and a device manufacturing method using the same. An exposure apparatus according to one preferred form of the invention includes an illumination optical system for illuminating an original with light from a light source, and a projection optical system for projecting a pattern of the original onto a substrate, wherein the illumination optical system includes an optical integrator for forming a secondary light source by use of light from the light source and a condenser optical system for directing light from the optical integrator to the original, and wherein the projection optical system includes an optical element such as a lens, made of a glass material of quartz and being disposed adjacent a pupil plane of the projection optical system.

Abstract: At least one exemplary embodiment is directed to an exposure apparatus which includes an illumination optical system configured to irradiate a mask with light from a light source, and a projecting optical system configured to project a pattern image of the mask onto a substrate. The illumination optical system provides a first light intensity which can be altered by an optical unit forming a second light intensity. The second light intensity can be further altered by an optical unit changing the dimension of the second light intensity forming a third light intensity, where the third light intensity can be used in the lithographic process for forming devices.

Abstract: At least one exemplary embodiment is directed to an exposure apparatus which includes an illumination optical system configured to irradiate a mask with light from a light source, and a projecting optical system configured to project a pattern image of the mask onto a substrate. The illumination optical system provides a first light intensity which can be altered by an optical unit forming a second light intensity. The second light intensity can be further altered by an optical unit changing the dimension of the second light intensity forming a third light intensity, where the third light intensity can be used in the lithographic process for forming devices.

Abstract: Disclosed is an exposure apparatus and method, and a device manufacturing method using the same. An exposure apparatus according to one preferred form of the invention includes an illumination optical system for illuminating an original with light from a light source, and a projection optical system for projecting a pattern of the original onto a substrate, wherein the illumination optical system includes an optical integrator for forming a secondary light source by use of light from the light source and a condenser optical system for directing light from the optical integrator to the original, and wherein the projection optical system includes an optical element such as a lens, made of a glass material of quartz and being disposed adjacent a pupil plane of the projection optical system.

Abstract: A blood test container 1 having a closed-bottom tubular container 2, a closed-bottom second tubular container having a diameter smaller than that of the tubular container 2 for accommodation therein, and a blood test reagent 3 secured onto at least one of an inner face of the tubular container and an outer face of the second tubular container. A blood test method comprising, in sequence, introducing blood into any one of the aforementioned blood test containers 1 and allowing the blood or its component to contact the blood test reagent 3.

Abstract: An exposure apparatus for exposing a pattern of a reticle onto an object to be exposed, via a projection optical system, utilizing exposure light, includes an optical element for determining a shape of an effective light source on a predetermined surface that substantially has a Fourier transformation relationship with the reticle, a detector for detecting the shape of the effective light source and a light intensity on the object, and a corrector for correcting a variance of performance of the projection optical system, and a controller for controlling the corrector based on a detection result of the detector.

Abstract: A blood test container which facilitate the procedures starting from blood collection and ending with measurement of various components present in the blood while eliminating a risk for a tester to come into contact with the blood. A blood test container 1 having a closed-bottom tubular container 2, a closed-bottom second tubular container having a diameter smaller than that of the tubular container 2 for accommodation therein, and a blood test reagent 3 secured onto at least one of an inner face of the tubular container and an outer face of the second tubular container.

Abstract: A blood test container and a blood test method are provided which facilitate the procedures starting from blood collection and ending with measurement of various components present in the blood while eliminating a risk for a tester to come into contact with the blood.

Abstract: An optical system includes an internal reflection type optical member for changing a direction of advancement of an approximately linearly polarized light on the basis of total reflection and a depolarizing member for dissolving linear polarization of light emitted from the optical member.

Abstract: A blood test container and a blood test method are provided which facilitate the procedures starting from blood collection and ending with measurement of various componens present in the blood while eliminating a risk for a tester to come into contact with the blood.

Abstract: An illumination optical system includes an optical integrator for forming a secondary light source by use of light from a light source, an optical system for directing light from the light source toward the integrator, and a condensing optical system for condensing light from the optical integrator upon a surface to be illuminated.

Abstract: Disclosed is an optical system including an internal reflection type optical member effective to change a direction of advancement of an approximately linearly polarized light on the basis of total reflection, and a depolarizing member for dissolving linear polarization of light emitted from the optical member.

Abstract: A demodulated data storage buffer is stored with bar width data sets obtained by scanning a coupon code with a scan optical system. A CPU first executes a demodulating process on these bar width data sets in accordance with a demodulation algorithm in a WPC code system. If an end guard bar (RGB) of the WPC code is contained in the demodulated data by the demodulating process, the demodulating process is executed on the same bar width data sets in accordance with a demodulation algorithm in a CODE 128 code system.

Abstract: Disclosed is an illumination optical system including an optical integrator for forming a secondary light source by use of light from a light source, and a condenser optical system for condensing light from the optical integrator upon a surface to be illuminated, wherein the condenser optical system is arranged to change, independently of each other, an illuminance distribution and an angular distribution of the light incident on the surface illuminated.

Abstract: A proximity sensor receives light beams reflected from a goods. A proximity sensor control unit determines that the goods exists when a light quantity of the reflected light received by the proximity sensor exceeds a determination threshold value. The determination threshold value increases as elapsed time since the bar code was read last time becomes longer, and, as a result, a detection sensitivity decreases. A CPU restores a duty of irradiation of the laser beam back to 100% and resumes rotations of a motor for driving an operation optical system when the proximity sensor control unit determines that the goods exists.