Patents by Inventor Ichiro SONE
Ichiro SONE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12244063Abstract: This array antenna is an array antenna to be used for beam forming and includes: a plurality of antenna elements; a ground; a dielectric provided between the plurality of antenna elements and the ground, the dielectric having an electrical length, from the plurality of antenna elements to the ground, of not less than 0.03; and a shield structure provided at least between the plurality of antenna elements and configured to shield a radio wave radiated from each antenna element.Type: GrantFiled: July 29, 2021Date of Patent: March 4, 2025Assignees: Sumitomo Electric Industries, Ltd., AutoNetworks Technologies, Ltd., Sumitomo Wiring Systems, Ltd.Inventors: Yutaro Miki, Suguru Yamagishi, Ichiro Kuwayama, Daisuke Miyawaki, Kosuke Sone
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Patent number: 12218422Abstract: An antenna device includes: a conductive ground conductor plate; a plate-shaped radiating element disposed without being in contact with the ground conductor plate; a feeding line including a conductor and a shield member that surrounds the conductor, the shield member being connected to the ground conductor plate; and a conductive feeding element that includes a facing plate portion that faces the radiating element with an air layer provided therebetween, and is connected to the conductor.Type: GrantFiled: August 3, 2021Date of Patent: February 4, 2025Assignees: AutoNetworks Technologies, Ltd., Sumitomo Wiring Systems, Ltd., Sumitomo Electric Industries, Ltd.Inventors: Shuhei Terada, Norichika Oomi, Kosuke Sone, Yasuyuki Yamamoto, Ai Takehisa, Ichiro Kuwayama, Suguru Yamagishi, Yutaro Miki
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Publication number: 20240339306Abstract: A substrate processing apparatus is provided. The substrate processing apparatus comprise: a first chamber including a sidewall providing an opening, the first chamber further including a movable part movable upward and downward within the first chamber; a substrate support disposed within the first chamber; a second chamber disposed within the first chamber and defining, together with the substrate support, a processing space in which a substrate mounted on the substrate support is processed, the second chamber being separable from the first chamber and transportable between an inner space of the first chamber and the outside of the first chamber via the opening; a clamp releasably fixing the second chamber to the movable part extending above the second chamber; a release mechanism configured to release the fixing of the second chamber by the clamp; and a lift mechanism configured to move the movable part upward and downward.Type: ApplicationFiled: June 18, 2024Publication date: October 10, 2024Applicant: Tokyo Electron LimitedInventors: Atsushi SAWACHI, Jun HIROSE, Takuya NISHIJIMA, Ichiro SONE, Suguru SATO
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Publication number: 20240290591Abstract: A measuring device for a vacuum processing apparatus including a processing chamber having a first gate for loading and unloading a substrate and a second gate different from the first gate is provided. The measuring device includes a case having an opening that is sized to correspond to the second gate of the processing chamber and is airtightly attachable to the second gate, a decompressing mechanism configured to reduce a pressure in the case, and a measuring mechanism accommodated in the case and configured to measure a state in the processing chamber through the opening in a state where the pressure in the case is reduced by the decompressing mechanism.Type: ApplicationFiled: May 6, 2024Publication date: August 29, 2024Applicant: Tokyo Electron LimitedInventors: Atsushi SAWACHI, Ichiro SONE, Takuya NISHIJIMA, Suguru SATO
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Publication number: 20240261918Abstract: A part replacement system includes a part storage device configured to store an unused consumable part, and a replacement device that is connected to a processing device and the part storage device, the replacement device being configured to replace a used consumable part installed in the processing device with the unused consumable part stored in the part storage device. The replacement device is moved to a position of the processing device having the used consumable part that requires replacement, and the replacement device is connected to the processing device, and the part storage device is moved to a position of the replacement device connected to the processing device having the used consumable part that requires replacement, and the part storage device is connected to the replacement device.Type: ApplicationFiled: April 18, 2024Publication date: August 8, 2024Applicant: Tokyo Electron LimitedInventors: Atsushi SAWACHI, Ichiro SONE, Suguru SATO, Takuya NISHIJIMA
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Patent number: 12040166Abstract: A substrate processing apparatus is provided. The substrate processing apparatus comprise: a first chamber including a sidewall providing an opening, the first chamber further including a movable part movable upward and downward within the first chamber; a substrate support disposed within the first chamber; a second chamber disposed within the first chamber and defining, together with the substrate support, a processing space in which a substrate mounted on the substrate support is processed, the second chamber being separable from the first chamber and transportable between an inner space of the first chamber and the outside of the first chamber via the opening; a clamp releasably fixing the second chamber to the movable part extending above the second chamber; a release mechanism configured to release the fixing of the second chamber by the clamp; and a lift mechanism configured to move the movable part upward and downward.Type: GrantFiled: October 19, 2021Date of Patent: July 16, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Atsushi Sawachi, Jun Hirose, Takuya Nishijima, Ichiro Sone, Suguru Sato
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Patent number: 12002666Abstract: A measuring device for a vacuum processing apparatus including a processing chamber having a first gate for loading and unloading a substrate and a second gate different from the first gate is provided. The measuring device includes a case having art opening that is sized to correspond to the second gate of the processing chamber and is airtightly attachable to the second gate, a decompressing mechanism configured to reduce a pressure in the case, and a measuring mechanism accommodated in the case and configured to measure a state in the processing chamber through the opening in a state where the pressure in the case is reduced by the decompressing mechanism.Type: GrantFiled: December 5, 2020Date of Patent: June 4, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Atsushi Sawachi, Ichiro Sone, Takuya Nishijima, Suguru Sato
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Patent number: 11992912Abstract: A part replacement system includes a part storage device configured to store an unused consumable part, and a replacement device that is connected to a processing device and the part storage device, the replacement device being configured to replace a used consumable part installed in the processing device with the unused consumable part stored in the part storage device. The replacement device is moved to a position of the processing device having the used consumable part that requires replacement, and the replacement device is connected to the processing device, and the part storage device is moved to a position of the replacement device connected to the processing device having the used consumable part that requires replacement, and the part storage device is connected to the replacement device.Type: GrantFiled: April 30, 2021Date of Patent: May 28, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Atsushi Sawachi, Ichiro Sone, Suguru Sato, Takuya Nishijima
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Publication number: 20220230856Abstract: According to an aspect of the present disclosure, there is provided a plasma processing system for performing plasma processing on a substrate, the plasma processing system including: a chamber to which a consumable member is attached inside; a vacuum transfer chamber connected to the chamber; a transfer device provided in the vacuum transfer chamber and configured to transfer the consumable member between the chamber and the transfer device; a measuring instrument provided outside the chamber in the plasma processing system and configured to detect a state of the consumable member; and a controller configured to control each element of the plasma processing system.Type: ApplicationFiled: January 20, 2022Publication date: July 21, 2022Applicant: Tokyo Electron LimitedInventors: Ichiro SONE, Hideaki NAGASAKI
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Publication number: 20220122818Abstract: A substrate processing apparatus is provided. The substrate processing apparatus comprise: a first chamber including a sidewall providing an opening, the first chamber further including a movable part movable upward and downward within the first chamber; a substrate support disposed within the first chamber; a second chamber disposed within the first chamber and defining, together with the substrate support, a processing space in which a substrate mounted on the substrate support is processed, the second chamber being separable from the first chamber and transportable between an inner space of the first chamber and the outside of the first chamber via the opening; a clamp releasably fixing the second chamber to the movable part extending above the second chamber; a release mechanism configured to release the fixing of the second chamber by the clamp; and a lift mechanism configured to move the movable part upward and downward.Type: ApplicationFiled: October 19, 2021Publication date: April 21, 2022Applicant: Tokyo Electron LimitedInventors: Atsushi SAWACHI, Jun HIROSE, Takuya NISHIJIMA, Ichiro SONE, Suguru SATO
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Publication number: 20210407768Abstract: A substrate processing apparatus includes a first chamber having an inner space and an opening, a substrate support disposed in the inner space of the first chamber, an actuator configured to move the substrate support between a first position and a second position, a second chamber that is disposed in the inner space of the first chamber and defines a substrate processing space together with the substrate support when the substrate support is located at the first position, and at least one fixing mechanism configured to detachably fix the second chamber to the first chamber in the inner space of the first chamber. The second chamber is transferred between the inner space of the first chamber and an outside of the first chamber through the opening when the substrate support is located at the second position.Type: ApplicationFiled: June 24, 2021Publication date: December 30, 2021Applicant: TOKYO ELECTRON LIMITEDInventors: Atsushi SAWACHI, Jun HIROSE, Takuya NISHIJIMA, Ichiro SONE, Suguru SATO
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Publication number: 20210339350Abstract: A part replacement system includes a part storage device configured to store an unused consumable part, and a replacement device that is connected to a processing device and the part storage device, the replacement device being configured to replace a used consumable part installed in the processing device with the unused consumable part stored in the part storage device. The replacement device is moved to a position of the processing device having the used consumable part that requires replacement, and the replacement device is connected to the processing device, and the part storage device is moved to a position of the replacement device connected to the processing device having the used consumable part that requires replacement, and the part storage device is connected to the replacement device.Type: ApplicationFiled: April 30, 2021Publication date: November 4, 2021Applicant: TOKYO ELECTRON LIMITEDInventors: Atsushi Sawachi, Ichiro Sone, Suguru Sato, Takuya Nishijima
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Publication number: 20210175055Abstract: A measuring device for a vacuum processing apparatus including a processing chamber having a first gate for loading and unloading a substrate and a second gate different from the first gate is provided. The measuring device includes a case having art opening that is sized to correspond to the second gate of the processing chamber and is airtightly attachable to the second gate, a decompressing mechanism configured to reduce a pressure in the case, and a measuring mechanism accommodated in the case and configured to measure a state in the processing chamber through the opening in a state where the pressure in the case is reduced by the decompressing mechanism.Type: ApplicationFiled: December 5, 2020Publication date: June 10, 2021Applicant: TOKYO ELECTRON LIMITEDInventors: Atsushi SAWACHI, Ichiro SONE, Takuya NISHIJIMA, Suguru SATO