Abstract: Provided is an optical axis adjustment device for an X-ray analyzer comprising an incident-side arm, a receiving-side arm, an X-ray source, an incident-side slit, and an X-ray detector, wherein the device comprises a shielding strip disposed at a position blocking X-rays received by the X-ray detector from the X-ray source, and a shielding strip-moving device that rotates the shielding strip around the sample axis relative to the optical axis of X-rays reaching the X-ray detector from the X-ray source to two angle positions, and the amount of deviation in parallelism of the surface of a sample with respect to the optical axis of the X-rays is found on the basis of X-ray intensity values found by the X-ray detector for the two angle positions.

Abstract: An optical axis adjustment method for an X-ray analyzer. In a 2?-adjustment step, a 0° position of the rotation of a receiving-side arm and a 0° position of the angle of diffraction 2? are aligned. In a Zs-axis adjustment step, the position of an incident-side slit along a direction orthogonal to the centerline of the X-rays incident upon a sample from an X-ray source is adjusted. In a ?-adjustment step, the centerline of X-rays incident upon the sample from the X-ray source and the surface of the sample are adjusted so as to be parallel. In the 2?-adjustment step, the Zs-axis adjustment step, and the ?-adjustment step, the capability for X-ray intensity positional resolution upon a straight line possessed by a one-dimensional X-ray detector is used to perform 2?-adjustment, Zs-axis adjustment, and ?-adjustment.

Abstract: An optical axis adjustment method for an X-ray analyzer. In a 2?-adjustment step, a 0° position of the rotation of a receiving-side arm and a 0° position of the angle of diffraction 2? are aligned. In a Zs-axis adjustment step, the position of an incident-side slit along a direction orthogonal to the centerline of the X-rays incident upon a sample from an X-ray source is adjusted. In a ?-adjustment step, the centerline of X-rays incident upon the sample from the X-ray source and the surface of the sample are adjusted so as to be parallel. In the 2?-adjustment step, the Zs-axis adjustment step, and the ?-adjustment step, the capability for X-ray intensity positional resolution upon a straight line possessed by a one-dimensional X-ray detector is used to perform 2?-adjustment, Zs-axis adjustment, and ?-adjustment.

Abstract: Provided is an optical axis adjustment device for an X-ray analyzer comprising an incident-side arm, a receiving-side arm, an X-ray source, an incident-side slit, and an X-ray detector, wherein the device comprises a shielding strip disposed at a position blocking X-rays received by the X-ray detector from the X-ray source, and a shielding strip-moving device that rotates the shielding strip around the sample axis relative to the optical axis of X-rays reaching the X-ray detector from the X-ray source to two angle positions, and the amount of deviation in parallelism of the surface of a sample with respect to the optical axis of the X-rays is found on the basis of X-ray intensity values found by the X-ray detector for the two angle positions.

Abstract: An X-ray shielding member is provided so as to confront an X-ray incident face of a sample, and a gap through which an X-ray emitted from an X-ray source is passed and irradiated to an X-ray incident face of the sample is formed between the X-ray shielding member and the X-ray incident face of the sample. A gap adjusting mechanism for moving the X-ray shielding member is further provided to move the X-ray shielding member in accordance with change of an X-ray incident angle to the sample by a goniometer, whereby the breadth of the gap formed between the X-ray shielding member and the X-ray incident face of the sample can be adjusted.

Abstract: An X-ray shielding member is provided so as to confront an X-ray incident face of a sample, and a gap through which an X-ray emitted from an X-ray source is passed and irradiated to an X-ray incident face of the sample is formed between the X-ray shielding member and the X-ray incident face of the sample. A gap adjusting mechanism for moving the X-ray shielding member is further provided to move the X-ray shielding member in accordance with change of an X-ray incident angle to the sample by a goniometer, whereby the breadth of the gap formed between the X-ray shielding member and the X-ray incident face of the sample can be adjusted.