Patents by Inventor Idriss Blakey

Idriss Blakey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180252645
    Abstract: A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.
    Type: Application
    Filed: March 27, 2018
    Publication date: September 6, 2018
    Inventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Patent number: 9957339
    Abstract: A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.
    Type: Grant
    Filed: August 7, 2015
    Date of Patent: May 1, 2018
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE UNIVERSITY OF QUEENSLAND
    Inventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Patent number: 9815930
    Abstract: A block copolymer useful in electron beam and extreme ultraviolet photolithography includes a first block with units derived from a base-solubility-enhancing monomer and an out-of-band absorbing monomer, and a second block having a low surface energy. Repeat units derived from the out-of-ban absorbing monomer allow the copolymer to absorb significantly in the wavelength range 150 to 400 nanometers. When incorporated into a photoresist composition with a photoresist random polymer, the block copolymer self-segregates to form a top layer that effectively screens out-of-band radiation.
    Type: Grant
    Filed: August 7, 2015
    Date of Patent: November 14, 2017
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE UNIVERSITY OF QUEENSLAND
    Inventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Publication number: 20170261853
    Abstract: A composite, which is a blend comprising: a nanoparticle comprising a core and a coating surrounding the core; and a polymer, wherein the coating of the nanoparticle comprises a ligand, wherein the ligand is a substituted or unsubstituted C1-C16 carboxylic acid or a salt thereof, a substituted or unsubstituted C1-C16 amino acid or a salt thereof, a substituted or unsubstituted C1-C16 dialkyl phosphonate, or a combination thereof; and wherein the polymer is a polymerization product of a photoacid generator comprising a polymerizable group; at least one unsaturated monomer, which is different from the photoacid generator comprising a polymerizable group; and a chain transfer agent of formula (I); wherein: Z is a y valent C1-20 organic group, x is 0 or 1, and Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl.
    Type: Application
    Filed: May 25, 2017
    Publication date: September 14, 2017
    Inventors: James W. Thackeray, Meiliana Siauw, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Patent number: 9696624
    Abstract: A composite, which is a blend comprising: a nanoparticle comprising a core and a coating surrounding the core; and a polymer, wherein the coating of the nanoparticle comprises a ligand, wherein the ligand is a substituted or unsubstituted C1-C16 carboxylic acid or a salt thereof, a substituted or unsubstituted C1-C16 amino acid or a salt thereof, a substituted or unsubstituted C1-C16 dialkyl phosphonate, or a combination thereof; and wherein the polymer is a polymerization product of a photoacid generator comprising a polymerizable group; at least one unsaturated monomer, which is different from the photoacid generator comprising a polymerizable group; and a chain transfer agent of formula (I); wherein: Z is a y valent C1-20 organic group, x is 0 or 1, and Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl.
    Type: Grant
    Filed: July 29, 2015
    Date of Patent: July 4, 2017
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE UNIVERSITY OF QUEENSLAND
    Inventors: James W. Thackeray, Meiliana Siauw, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Patent number: 9606440
    Abstract: The present invention relates to a method for modifying line edge roughness on a lithographically-produced feature in a material, the method comprising applying a block copolymer to an area on the feature having line edge roughness, the block copolymer comprising a charged hydrophilic polymer block and a non-charged hydrophilic polymer block.
    Type: Grant
    Filed: February 25, 2014
    Date of Patent: March 28, 2017
    Assignee: THE UNIVERSITY OF QUEENSLAND
    Inventors: Idriss Blakey, Ya-Mi Chuang, Andrew Keith Whittaker, Kevin Stanley Jack
  • Publication number: 20170037178
    Abstract: A block copolymer useful in electron beam and extreme ultraviolet photolithography includes a first block with units derived from a base-solubility-enhancing monomer and an out-of-band absorbing monomer, and a second block having a low surface energy. Repeat units derived from the out-of-ban absorbing monomer allow the copolymer to absorb significantly in the wavelength range 150 to 400 nanometers. When incorporated into a photoresist composition with a photoresist random polymer, the block copolymer self-segregates to form a top layer that effectively screens out-of-band radiation.
    Type: Application
    Filed: August 7, 2015
    Publication date: February 9, 2017
    Inventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Publication number: 20170037171
    Abstract: A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.
    Type: Application
    Filed: August 7, 2015
    Publication date: February 9, 2017
    Inventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Publication number: 20170031244
    Abstract: A composite, which is a blend comprising: a nanoparticle comprising a core and a coating surrounding the core; and a polymer, wherein the coating of the nanoparticle comprises a ligand, wherein the ligand is a substituted or unsubstituted C1-C16 carboxylic acid or a salt thereof, a substituted or unsubstituted C1-C16 amino acid or a salt thereof, a substituted or unsubstituted C1-C16 dialkyl phosphonate, or a combination thereof; and wherein the polymer is a polymerization product of a photoacid generator comprising a polymerizable group; at least one unsaturated monomer, which is different from the photoacid generator comprising a polymerizable group; and a chain transfer agent of formula (I); wherein: Z is a y valent C1-20 organic group, x is 0 or 1, and Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl.
    Type: Application
    Filed: July 29, 2015
    Publication date: February 2, 2017
    Inventors: James W. Thackeray, Meiliana Siauw, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Publication number: 20160004163
    Abstract: The present invention relates to a method for modifying line edge roughness on a lithographically-produced feature in a material, the method comprising applying a block copolymer to an area on the feature having line edge roughness, the block copolymer comprising a charged hydrophilic polymer block and a non-charged hydrophilic polymer block.
    Type: Application
    Filed: February 25, 2014
    Publication date: January 7, 2016
    Inventors: Idriss BLAKEY, Ya-Mi CHUANG, Andrew Keith WHITTAKER, Kevin Stanley JACK
  • Patent number: 6858309
    Abstract: The present invention provides improved methods for conducting living/controlled polymerization on polymeric solid supports. The improved methods allow polymerization to occur directly from the non-functionalized surface of a bulk support. In addition, polymerization may be re-initiated to provide co-polymers. The disclosed methods may employ the non-nitroxide-based RAFT and ATRP control agents that allow controlled polymerization to proceed at relatively low temperatures (<80° C.). Furthermore, these improved methods may provide graft polymers with decreased levels of “in-growth” of the bulk solid support. The invention also provides substrate polymers, with improved properties for solid phase synthesis and diagnostic applications, which may be made by the disclosed methods.
    Type: Grant
    Filed: March 28, 2002
    Date of Patent: February 22, 2005
    Assignee: Polymerat Pty. Ltd.
    Inventors: Peter Kambouris, Michael Whittaker, Tom Davis, Idriss Blakey, Gary M. Day
  • Publication number: 20030088028
    Abstract: The present invention provides improved methods for conducting living/controlled polymerization on polymeric solid supports. The improved methods allow polymerization to occur directly from the non-functionalized surface of a bulk support. In addition, polymerization may be re-initiated to provide co-polymers. The disclosed methods may employ the non-nitroxide-based RAFT and ATRP control agents that allow controlled polymerization to proceed at relatively low temperatures (<80° C.). Furthermore, these improved methods may provide graft polymers with decreased levels of “in-growth” of the bulk solid support. The invention also provides substrate polymers, with improved properties for solid phase synthesis and diagnostic applications, which may be made by the disclosed methods.
    Type: Application
    Filed: March 28, 2002
    Publication date: May 8, 2003
    Inventors: Peter Kambouris, Michael Whittaker, Tom Davis, Idriss Blakey, Gary M. Day