Patents by Inventor Idriss Blakey
Idriss Blakey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230031576Abstract: The present invention relates to compounds that are useful as radioimaging agents and radiopharmaceuticals. The compounds may be coordinated with a radionuclide and may be useful in diagnostic imaging and radiotherapy. The invention also relates to methods of prognosis and therapy utilising the non-coordinated and radiolabelled compounds of the invention.Type: ApplicationFiled: November 6, 2020Publication date: February 2, 2023Inventors: Kristofer James THURECHT, Vanessa SOH YING YI, Idriss BLAKEY, Muneer Ahamed Syed MUSTHAKAHMED, Matthew HARRIS, Ellen VAN DAM
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Publication number: 20180252645Abstract: A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.Type: ApplicationFiled: March 27, 2018Publication date: September 6, 2018Inventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
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Patent number: 9957339Abstract: A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.Type: GrantFiled: August 7, 2015Date of Patent: May 1, 2018Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE UNIVERSITY OF QUEENSLANDInventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
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Patent number: 9815930Abstract: A block copolymer useful in electron beam and extreme ultraviolet photolithography includes a first block with units derived from a base-solubility-enhancing monomer and an out-of-band absorbing monomer, and a second block having a low surface energy. Repeat units derived from the out-of-ban absorbing monomer allow the copolymer to absorb significantly in the wavelength range 150 to 400 nanometers. When incorporated into a photoresist composition with a photoresist random polymer, the block copolymer self-segregates to form a top layer that effectively screens out-of-band radiation.Type: GrantFiled: August 7, 2015Date of Patent: November 14, 2017Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE UNIVERSITY OF QUEENSLANDInventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
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Publication number: 20170261853Abstract: A composite, which is a blend comprising: a nanoparticle comprising a core and a coating surrounding the core; and a polymer, wherein the coating of the nanoparticle comprises a ligand, wherein the ligand is a substituted or unsubstituted C1-C16 carboxylic acid or a salt thereof, a substituted or unsubstituted C1-C16 amino acid or a salt thereof, a substituted or unsubstituted C1-C16 dialkyl phosphonate, or a combination thereof; and wherein the polymer is a polymerization product of a photoacid generator comprising a polymerizable group; at least one unsaturated monomer, which is different from the photoacid generator comprising a polymerizable group; and a chain transfer agent of formula (I); wherein: Z is a y valent C1-20 organic group, x is 0 or 1, and Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl.Type: ApplicationFiled: May 25, 2017Publication date: September 14, 2017Inventors: James W. Thackeray, Meiliana Siauw, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
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Patent number: 9696624Abstract: A composite, which is a blend comprising: a nanoparticle comprising a core and a coating surrounding the core; and a polymer, wherein the coating of the nanoparticle comprises a ligand, wherein the ligand is a substituted or unsubstituted C1-C16 carboxylic acid or a salt thereof, a substituted or unsubstituted C1-C16 amino acid or a salt thereof, a substituted or unsubstituted C1-C16 dialkyl phosphonate, or a combination thereof; and wherein the polymer is a polymerization product of a photoacid generator comprising a polymerizable group; at least one unsaturated monomer, which is different from the photoacid generator comprising a polymerizable group; and a chain transfer agent of formula (I); wherein: Z is a y valent C1-20 organic group, x is 0 or 1, and Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl.Type: GrantFiled: July 29, 2015Date of Patent: July 4, 2017Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE UNIVERSITY OF QUEENSLANDInventors: James W. Thackeray, Meiliana Siauw, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
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Patent number: 9606440Abstract: The present invention relates to a method for modifying line edge roughness on a lithographically-produced feature in a material, the method comprising applying a block copolymer to an area on the feature having line edge roughness, the block copolymer comprising a charged hydrophilic polymer block and a non-charged hydrophilic polymer block.Type: GrantFiled: February 25, 2014Date of Patent: March 28, 2017Assignee: THE UNIVERSITY OF QUEENSLANDInventors: Idriss Blakey, Ya-Mi Chuang, Andrew Keith Whittaker, Kevin Stanley Jack
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Publication number: 20170037178Abstract: A block copolymer useful in electron beam and extreme ultraviolet photolithography includes a first block with units derived from a base-solubility-enhancing monomer and an out-of-band absorbing monomer, and a second block having a low surface energy. Repeat units derived from the out-of-ban absorbing monomer allow the copolymer to absorb significantly in the wavelength range 150 to 400 nanometers. When incorporated into a photoresist composition with a photoresist random polymer, the block copolymer self-segregates to form a top layer that effectively screens out-of-band radiation.Type: ApplicationFiled: August 7, 2015Publication date: February 9, 2017Inventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
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Publication number: 20170037171Abstract: A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.Type: ApplicationFiled: August 7, 2015Publication date: February 9, 2017Inventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
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Publication number: 20170031244Abstract: A composite, which is a blend comprising: a nanoparticle comprising a core and a coating surrounding the core; and a polymer, wherein the coating of the nanoparticle comprises a ligand, wherein the ligand is a substituted or unsubstituted C1-C16 carboxylic acid or a salt thereof, a substituted or unsubstituted C1-C16 amino acid or a salt thereof, a substituted or unsubstituted C1-C16 dialkyl phosphonate, or a combination thereof; and wherein the polymer is a polymerization product of a photoacid generator comprising a polymerizable group; at least one unsaturated monomer, which is different from the photoacid generator comprising a polymerizable group; and a chain transfer agent of formula (I); wherein: Z is a y valent C1-20 organic group, x is 0 or 1, and Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl.Type: ApplicationFiled: July 29, 2015Publication date: February 2, 2017Inventors: James W. Thackeray, Meiliana Siauw, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
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Publication number: 20160004163Abstract: The present invention relates to a method for modifying line edge roughness on a lithographically-produced feature in a material, the method comprising applying a block copolymer to an area on the feature having line edge roughness, the block copolymer comprising a charged hydrophilic polymer block and a non-charged hydrophilic polymer block.Type: ApplicationFiled: February 25, 2014Publication date: January 7, 2016Inventors: Idriss BLAKEY, Ya-Mi CHUANG, Andrew Keith WHITTAKER, Kevin Stanley JACK
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Patent number: 6858309Abstract: The present invention provides improved methods for conducting living/controlled polymerization on polymeric solid supports. The improved methods allow polymerization to occur directly from the non-functionalized surface of a bulk support. In addition, polymerization may be re-initiated to provide co-polymers. The disclosed methods may employ the non-nitroxide-based RAFT and ATRP control agents that allow controlled polymerization to proceed at relatively low temperatures (<80° C.). Furthermore, these improved methods may provide graft polymers with decreased levels of “in-growth” of the bulk solid support. The invention also provides substrate polymers, with improved properties for solid phase synthesis and diagnostic applications, which may be made by the disclosed methods.Type: GrantFiled: March 28, 2002Date of Patent: February 22, 2005Assignee: Polymerat Pty. Ltd.Inventors: Peter Kambouris, Michael Whittaker, Tom Davis, Idriss Blakey, Gary M. Day
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Publication number: 20030088028Abstract: The present invention provides improved methods for conducting living/controlled polymerization on polymeric solid supports. The improved methods allow polymerization to occur directly from the non-functionalized surface of a bulk support. In addition, polymerization may be re-initiated to provide co-polymers. The disclosed methods may employ the non-nitroxide-based RAFT and ATRP control agents that allow controlled polymerization to proceed at relatively low temperatures (<80° C.). Furthermore, these improved methods may provide graft polymers with decreased levels of “in-growth” of the bulk solid support. The invention also provides substrate polymers, with improved properties for solid phase synthesis and diagnostic applications, which may be made by the disclosed methods.Type: ApplicationFiled: March 28, 2002Publication date: May 8, 2003Inventors: Peter Kambouris, Michael Whittaker, Tom Davis, Idriss Blakey, Gary M. Day