Patents by Inventor Ignacio Salvador VAZQUEZ RODARTE

Ignacio Salvador VAZQUEZ RODARTE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHODS AND APPARATUS FOR CONTROLLING A LITHOGRAPHIC PROCESS
    Publication number: 20220091514
    Abstract: A method of determining a control parameter for a lithographic process is disclosed, the method includes: defining a substrate model for representing a process parameter fingerprint across a substrate, the substrate model being defined as a combination of basis functions including at least one basis function suitable for representing variation of the process parameter fingerprint between substrates and/or batches of substrates; receiving measurements of the process parameter across at least one substrate; calculating substrate model parameters using the measurements and the basis functions; and determining the control parameter based on the substrate model parameters and the similarity of the at least one basis function to a process parameter fingerprint variation between substrates and/or batches of substrates.
    Type: Application
    Filed: December 18, 2019
    Publication date: March 24, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Roy WERKMAN, David Frans Simon DECKERS, Bijoy RAJASEKHARAN, Ignacio Salvador VAZQUEZ RODARTE, Sarathi ROY