Patents by Inventor Iho Kamimura

Iho Kamimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220041856
    Abstract: These vinyl-based polymerizable group-containing silane compounds may be used alone, or two or more thereof may be used in combination. The content of the vinyl-based polymerizable group-containing silane compound is 1% by mass or more and 10% by mass or less, and preferably 1% by mass or more and 5% by mass or less, in 100% by mass of the organosiloxane mixture. When the amount of the vinyl-based polymerizable group-containing silane compound is the lower limit value or more, the peeling force and impact resistance of the obtained cured product tend to be high. When the amount of the vinyl-based polymerizable group-containing silane compound is the upper limit value or less, the peeling force and impact resistance of the obtained cured product tend to be high.
    Type: Application
    Filed: October 14, 2021
    Publication date: February 10, 2022
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Hiroshi ONOMOTO, Kazuyoshi ODAKA, Go OTANI, Iho KAMIMURA
  • Patent number: 9960092
    Abstract: To provide an interlayer filler composition which, in 3D lamination of semiconductor device chips, forms a highly thermally conductive filling interlayer simultaneously with the bonding of solder bumps or the like and lands between semiconductor device chips, a coating fluid and a process for producing a three-dimensional integrated circuit. An interlayer filler composition for a three-dimensional integrated circuit, which comprises a resin (A) having a melt viscosity at 120° C. of at most 100 Pa·s and a flux (B), the content of the flux (B) being at least 0.1 part by weight and at most 10 parts by weight per 100 parts by weight of the resin (A).
    Type: Grant
    Filed: April 18, 2013
    Date of Patent: May 1, 2018
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Makoto Ikemoto, Yasuhiro Kawase, Tomohide Murase, Makoto Takahashi, Takayoshi Hirai, Iho Kamimura
  • Publication number: 20140030848
    Abstract: To provide an interlayer filler composition which, in 3D lamination of semiconductor device chips, forms a highly thermally conductive filling interlayer simultaneously with the bonding of solder bumps or the like and lands between semiconductor device chips, a coating fluid and a process for producing a three-dimensional integrated circuit. An interlayer filler composition for a three-dimensional integrated circuit, which comprises a resin (A) having a melt viscosity at 120° C. of at most 100 Pa·s and a flux (B), the content of the flux (B) being at least 0.1 part by weight and at most 10 parts by weight per 100 parts by weight of the resin (A).
    Type: Application
    Filed: April 18, 2013
    Publication date: January 30, 2014
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Makoto IKEMOTO, Yasuhiro Kawase, Tomohide Murase, Makoto Takahashi, Takayoshi Hirai, Iho Kamimura