Patents by Inventor Ihsan Simms

Ihsan Simms has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200066509
    Abstract: A processing method is disclosed that enables an improved directed self-assembly (DSA) processing scheme by allowing the formation of improved guide strips in the DSA template that may enable the formation of sub-30 nm features on a substrate. The improved guide strips may be formed by improving the selectivity of wet chemical processing between different organic layers or films. In one embodiment, treating the organic layers with one or more wavelengths of ultraviolet light may improve selectivity. The first wavelength of UV light may be less than 200 nm and the second wavelength of UV light may be greater than 200 mn.
    Type: Application
    Filed: November 1, 2019
    Publication date: February 27, 2020
    Inventors: Mark H. Somervell, Ian J. Brown, Ihsan Simms, Ainhoa Negreira, Kathleen Nafus
  • Publication number: 20200027891
    Abstract: A method of etching a substrate includes providing an etching solution in a tank of an etch processing system, where the etch processing system is configured to control temperature of the etching solution, a concentration of the etching solution, and flow of the etching solution within the tank. The substrate contains micro-fabricated structures that have alternating layers of a first material and a second material, and the etching solution including an acid that etches the first material and results in an etch product to be moved from the substrate. The method further includes monitoring a concentration of the etch product within the etching solution, and maintaining the concentration of the etch product within the etching solution below a predetermined value to prevent deposition of the etch product on the second material in an amount that blocks etching of the first material by the etching solution.
    Type: Application
    Filed: July 19, 2019
    Publication date: January 23, 2020
    Inventors: Derek Bassett, Antonio Rotondaro, Ihsan Simms, Trace Hurd
  • Patent number: 10490402
    Abstract: A processing method is disclosed that enables an improved directed self-assembly (DSA) processing scheme by allowing the formation of improved guide strips in the DSA template that may enable the formation of sub-30 nm features on a substrate. The improved guide strips may be formed by improving the selectivity of wet chemical processing between different organic layers or films. In one embodiment, treating the organic layers with one or more wavelengths of ultraviolet light may improve selectivity. The first wavelength of UV light may be less than 200 nm and the second wavelength of UV light may be greater than 200 nm.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: November 26, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Mark Somervell, Ian Brown, Ihsan Simms, Ainhoa Negreira, Kathleen Nafus
  • Publication number: 20150064917
    Abstract: A processing method is disclosed that enables an improved directed self-assembly (DSA) processing scheme by allowing the formation of improved guide strips in the DSA template that may enable the formation of sub-30 nm features on a substrate. The improved guide strips may be formed by improving the selectivity of wet chemical processing between different organic layers or films. In one embodiment, treating the organic layers with one or more wavelengths of ultraviolet light may improve selectivity. The first wavelength of UV light may be less than 200 nm and the second wavelength of UV light may be greater than 200 nm.
    Type: Application
    Filed: August 22, 2014
    Publication date: March 5, 2015
    Inventors: Mark Somervell, Ian Brown, Ihsan Simms, Ainhoa Negreira, Kathleen Nafus