Patents by Inventor Ii: Haruo

Ii: Haruo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for fabricating phase shift mask and process of semiconductor integrated circuit device
    Patent number: 5441834
    Abstract: When the data of a mask pattern of a phase shift mask is to be made, the pattern data is separated into a real pattern data layer having the data of real patterns and a phase shift pattern data layer having the data of phase shift patterns. After this, it is verified whether or not the mask pattern satisfies the regulation of the gap of in-phase patterns, in which lights having transmitted through patterns adjacent to each other are in phase. It is also verified whether or not the mask pattern satisfies the regulation of the gap of out-of-phase patterns, in which lights having transmitted through patterns adjacent to each other are out of phase.
    Type: Grant
    Filed: September 10, 1992
    Date of Patent: August 15, 1995
    Assignees: Hatachi, Ltd., Hatachi VLSI Engineering Corp.
    Inventors: Toshitsugu Takekuma, Ii: Haruo, Kazuya Ito