Patents by Inventor II Hwae KU

II Hwae KU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ETHYLENE-BASED POLYMER HAVING EXCELLENT LONG-TERM PRESSURE RESISTANCE CHARACTERISTICS, AND PIPE USING SAME
    Publication number: 20210002463
    Abstract: Provided are an ethylene-based polymer having excellent long-term pressure resistance characteristics and a pipe using the ethylene-based polymer. The ethylene-based polymer satisfies the balance of mechanical characteristics and excellent molding processability, as compared with a conventional ethylene-based polymer. Also provided are an ethylene-based polymer having a wide molecular weight distribution and a small lamellar thickness, thereby increasing tie molecules and obtaining excellent long-term pressure resistance characteristics, and a pipe using the same.
    Type: Application
    Filed: October 11, 2018
    Publication date: January 7, 2021
    Applicant: HANWHA SOLUTIONS CORPORATION
    Inventors: Ui Gab JEON, Hye Ran PARK, Seong Jae LIM, Yu Jeong LIM, Tae Uk JEON, II Hwae KU, Dong Ok KIM, Dong Wook JEONG