Patents by Inventor IIya MALAKHOVSKY

IIya MALAKHOVSKY has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METROLOGY APPARATUS
    Publication number: 20210165335
    Abstract: Methods and apparatuses for determining in-plane distortion (IPD) across a substrate having a plurality of patterned regions. A method includes obtaining intra-region data indicative of a local stress distribution across one of the plurality of patterned regions; determining, based on the intra-region data, inter-region data indicative of a global stress distribution across the substrate; and determining, based on the inter-region data, the IPD across the substrate.
    Type: Application
    Filed: July 3, 2019
    Publication date: June 3, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Leon Paul VAN DIJK, Richard Johannes Franciscus VAN HAREN, Subodh SINGH, IIya MALAKHOVSKY, Ronald Henricus Johannes OTTEN, Amandev SINGH
  • METHODS AND APPARATUS FOR USE IN A DEVICE MANUFACTURING METHOD
    Publication number: 20200218169
    Abstract: Methods and associated apparatus for reconstructing a free-form geometry of a substrate, the method including: positioning the substrate on a substrate holder configured to retain the substrate under a retaining force that deforms the substrate from its free-form geometry; measuring a height map of the deformed substrate; and reconstructing the free-form geometry of the deformed substrate based on an expected deformation of the substrate by the retaining force and the measured height map.
    Type: Application
    Filed: August 8, 2018
    Publication date: July 9, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Richard Johannes Franciscus VAN HAREN, Leon Paul VAN DIJK, IIya MALAKHOVSKY, Ronald Henricus Johannes OTTEN, Mahdi SADEGHINIA