Abstract: A method for direct methane (CH4) oxidation (DMTM) to methanol (CH3OH) includes passing an oxygen-containing feed gas stream into a reactor containing a copper-loaded mordenite zeolite (Cu-MOR) catalyst particles such that the oxygen-containing feed gas stream is in contact with the Cu-MOR catalyst particles, at a temperature of 100 to 500° C., to form an oxidized Cu-MOR catalyst. The method further includes displacing oxygen in the reactor by nitrogen purging, and further passing a CH4-containing feed gas stream through the reactor in contact with the oxidized Cu-MOR catalyst at a temperature of 50 to 200° C., thereby converting at least a portion of the CH4 to CH3OH. The method further includes regenerating the Cu-MOR catalyst particles to form a regenerated Cu-MOR catalyst. The CH3OH is adsorbed on surfaces and pores of the regenerated Cu-MOR catalyst.

Abstract: A method of cracking a hydrocarbon including contacting the hydrocarbon with a catalyst; where on the contacting, the hydrocarbon is cracked into a plurality of compounds, each having a smaller number of carbon atoms than the hydrocarbon. The catalyst includes an aluminosilicate zeolite, the aluminosilicate zeolite includes a weight ratio of SiO2 to Al2O3 of 10-200:1. Particles of the aluminosilicate zeolite have a flake shape with an average longest dimension of 10 nanometers (nm) to 50 nm and the flakes are stacked on top of one another.

Abstract: A method for dry reformation of methane (DRM) includes introducing a H2-containing feed gas stream into a reactor, including a nickel-containing fibrous silica zinc oxide (Ni/FSZ) catalyst, passing the H2-containing feed gas stream through the reactor to contact the H2-containing feed gas stream with particles of the Ni/FSZ catalyst at a temperature of from 500 to 900 degrees Celsius (° C.) to form a reduced catalyst; terminating the introduction of the H2-containing feed gas stream and introducing and passing a mixed feed gas stream including CH4 and CO2 through the reactor to contact the mixed feed gas stream with the reduced catalyst at a temperature of from 500 to 1000° C. thereby converting at least a portion of the CH4 and CO2 to H2 and CO; and regenerating the Ni/FSZ catalyst particles to form a regenerated catalyst and producing a residue gas stream leaving the reactor.

Abstract: A sensing device includes a resonant member that is movable in a first mode and a second mode, and an electrode. The resonant member has a capacitive surface portion that faces and is capacitively coupled to a capacitive surface portion of the electrode. Displacement for each point along the capacitive surface portion of the resonant member in the first mode is substantially tangent to the point.

Abstract: A sensing device includes a resonant member that is movable in a first mode and a second mode, and an electrode. The resonant member has a capacitive surface portion that faces and is capacitively coupled to a capacitive surface portion of the electrode. Displacement for each point along the capacitive surface portion of the resonant member in the first mode is substantially tangent to the point.

Abstract: A sensing device includes a resonant member that is movable in a first mode and a second mode, and an electrode. The resonant member has a capacitive surface portion that faces and is capacitively coupled to a capacitive surface portion of the electrode. Displacement for each point along the capacitive surface portion of the resonant member in the first mode is substantially tangent to the point.

Abstract: A device for rapid optical switching includes a membrane having a reflecting surface on at least a portion of an upper surface of the membrane, first and second spacers at opposing ends of the membrane for securing the membrane to a substrate, whereby the membrane is spaced apart from the substrate, and first and second actuation electrodes positioned on the same side of the membrane and spaced a distance from the membrane so as to form a gap therebetween, whereby actuation of the actuation electrodes applies a force to the membrane to tilt the reflective portion of the membrane at an angle with respect to the substrate.

Abstract: A method and apparatus, and product by process, for the production of bulk polysilicon by broad area chemical vapor deposition, consisting of a quartz envelope and base plate forming a reactor enclosure, with external radiant heaters providing the heat source. A thin wall, edge-defined film fed growth (EFG) silicon tube section is used as the deposition casing and reaction chamber wall. The tube is capped at the top and sealed to the base plate to form the reaction chamber. External heaters radiate heat through the quartz enclosure to heat the tube wall to deposition temperature. A through flow of process gas is introduced to initiate the deposition. A uniform wide surface area deposit occurs on the inside surface of the tube, causing the diameter to become increasingly smaller as the yield accumulates.