Patents by Inventor Ik-Jin Choi

Ik-Jin Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250042070
    Abstract: A mold for manufacturing a crash pad including a lower mold, the lower mold configured to receive a scrim and having grooves formed thereon to correspond to a shape of an inner surface of the crash pad and a shape of an airbag chute, an upper mold configured to be received by the lower mold and formed to correspond to a shape of an outer surface of the crash pad, and scrim fixing cores configured to be received by the lower mold, the lower mold including a scrim seating portion on which the scrim is seated, the scrim fixing cores being configured to be disposed on both side surfaces of the scrim seating portion when received by the lower mold, and the scrim fixing cores being configured to fix the scrim while at least partially adjoining the scrim seating portion in being received by the lower mold.
    Type: Application
    Filed: February 7, 2024
    Publication date: February 6, 2025
    Applicant: HYUNDAI MOBIS CO., LTD.
    Inventors: Ik Keun CHOI, Young Jin YOU, Chang Wan SON
  • Publication number: 20250033645
    Abstract: An off-road travel assistive device includes a receiver configured to receive travel data of a vehicle, and an estimator. The estimator includes a road surface severity estimator configured to estimate road surface severity data based on the travel data of the vehicle. The device also includes a stuck probability determiner configured to determine probability of a stuck state of the vehicle occurring using the travel data and the road surface severity data. The stuck probability determiner determines stuck probability using a meta-model.
    Type: Application
    Filed: November 30, 2023
    Publication date: January 30, 2025
    Applicants: HYUNDAI MOTOR COMPANY, KIA CORPORATION, IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)
    Inventors: Jun Han Kang, Ik Jin Um, Ji Hun Byun, Man Dong Kim, Jung Ho Park, Jin Soo Seo, Chan Uk Yang, Seung Won Choi, Hyuk Ju Shon, Kun Soo Huh
  • Patent number: 11978576
    Abstract: A method for preparing a sintered magnet is provided according to one embodiment of the present disclosure. The method includes preparing a mixed powder by coating fluorides on a surface of magnetic powder, adding heavy rare earth hydrides to the mixed powder, and heating the mixed powder, wherein the magnetic powder includes rare earth element-iron-boron-based powder, and the fluorides include at least one of an organic fluoride or an inorganic fluoride.
    Type: Grant
    Filed: October 21, 2019
    Date of Patent: May 7, 2024
    Assignee: LG Chem, Ltd.
    Inventors: In Gyu Kim, Soon Jae Kwon, Ik Jin Choi, Jung Goo Lee, Hyounsoo Uh
  • Patent number: 11721460
    Abstract: A method for preparing a metal powder includes preparing a mixture by mixing a fluoride of a group 1 element, a fluoride of a group 2 element or a transition metal fluoride, with neodymium oxide, boron, iron, and a reducing agent; and heating the mixture at a temperature of 800° C. to 1100° C.
    Type: Grant
    Filed: October 18, 2017
    Date of Patent: August 8, 2023
    Inventors: June Ho In, Soon Jae Kwon, Ik Jin Choi, Hyoun Soo Uh, Jung Won Park, Byung Kyu Lim, Pum Suk Park
  • Publication number: 20210225587
    Abstract: A method for preparing a sintered magnet is provided according to one embodiment of the present disclosure. The method includes preparing a mixed powder by coating fluorides on a surface of magnetic powder, adding heavy rare earth hydrides to the mixed powder, and heating the mixed powder, wherein the magnetic powder includes rare earth element-iron-boron-based powder, and the fluorides include at least one of an organic fluoride or an inorganic fluoride.
    Type: Application
    Filed: October 21, 2019
    Publication date: July 22, 2021
    Applicant: LG Chem, Ltd.
    Inventors: In Gyu Kim, Soon Jae Kwon, Ik Jin Choi, Jung Goo Lee, Hyounsoo Uh
  • Patent number: 10563919
    Abstract: An embodiment includes an apparatus for controlling temperature of a substrate, an apparatus for treating a substrate comprising the same, and a method of controlling the same, which may control the temperature of the substrate by each area and not increasing the volume of the apparatus. The substrate temperature control apparatus comprises: a support plate for supporting a substrate; a plurality of heating units placed in different area of the substrate and controlling a temperature of the substrate by each area; a power supply unit for providing a power to control the temperature of the substrate; a switch unit connected between the plurality of heating units and the power supply unit, and obtaining one or more of a transistor device; and a controller for controlling a power which is supplied to each heating units by controlling unit.
    Type: Grant
    Filed: March 20, 2017
    Date of Patent: February 18, 2020
    Assignee: SEMES CO., LTD.
    Inventors: Jung Min Won, Ik-Jin Choi, Hyo Seong Seong, Shin-Woo Nam
  • Publication number: 20190292635
    Abstract: A method for preparing a metal powder includes preparing a mixture by mixing a fluoride of a group 1 element, a fluoride of a group 2 element or a transition metal fluoride, with neodymium oxide, boron, iron, and a reducing agent; and heating the mixture at a temperature of 800° C. to 1100° C.
    Type: Application
    Filed: October 18, 2017
    Publication date: September 26, 2019
    Applicant: LG Chem, Ltd.
    Inventors: June Ho In, Soon Jae Kwon, Ik Jin Choi, Hyoun Soo Uh, Jung Won Park, Byung Kyu Lim, Pum Suk Park
  • Publication number: 20170318627
    Abstract: An embodiment includes an apparatus for controlling temperature of a substrate, an apparatus for treating a substrate comprising the same, and a method of controlling the same, which may control the temperature of the substrate by each area and not increasing the volume of the apparatus. The substrate temperature control apparatus comprises: a support plate for supporting a substrate; a plurality of heating units placed in different area of the substrate and controlling a temperature of the substrate by each area; a power supply unit for providing a power to control the temperature of the substrate; a switch unit connected between the plurality of heating units and the power supply unit, and obtaining one or more of a transistor device; and a controller for controlling a power which is supplied to each heating units by controlling unit.
    Type: Application
    Filed: March 20, 2017
    Publication date: November 2, 2017
    Applicant: SEMES CO., LTD.
    Inventors: Jung Min WON, Ik-Jin CHOI, Hyo Seong SEONG, Shin-Woo NAM
  • Publication number: 20100282711
    Abstract: Provided are a process monitoring apparatus and method. The process monitoring apparatus includes a process chamber in which a process is performed, a probe assembly disposed on the process chamber, and comprising a probe electrode, a plasma generator generating plasma around the probe assembly, and a drive processor applying an alternating current (AC) voltage having at least 2 fundamental frequencies to the probe assembly, and extracting process monitoring parameters.
    Type: Application
    Filed: December 12, 2008
    Publication date: November 11, 2010
    Inventors: Chin-Wook Chung, Minhyong Lee, Sung-Ho Jang, Ik-Jin Choi, Jung-Hyung Kim, Yong-Hyeon Shin