Patents by Inventor Ikuo Mori
Ikuo Mori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9922854Abstract: The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.Type: GrantFiled: April 29, 2011Date of Patent: March 20, 2018Assignee: APPLIED MATERIALS, INC.Inventors: Shinichi Kurita, Jozef Kudela, Suhail Anwar, John M. White, Dong-Kil Yim, Hans Georg Wolf, Dennis Zvalo, Makoto Inagawa, Ikuo Mori
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Publication number: 20170084880Abstract: A process chamber for processing a plurality of substrates is provided. The process chamber includes a chamber body having a single substrate transfer opening, a first substrate support mesa disposed in the chamber body, and a second substrate support mesa disposed in the chamber body. Each substrate support mesa is configured to support a substrate during processing. The centers of the first substrate support mesa, the second substrate support mesa, and the opening are linearly aligned.Type: ApplicationFiled: September 22, 2016Publication date: March 23, 2017Inventors: Shinichi KURITA, Ikuo MORI, Robin L. TINER
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Patent number: 9324597Abstract: The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.Type: GrantFiled: April 29, 2011Date of Patent: April 26, 2016Assignee: APPLIED MATERIALS, INC.Inventors: Shinichi Kurita, Jozef Kudela, Suhail Anwar, John M. White, Dong-Kil Yim, Hans Georg Wolf, Dennis Zvalo, Makoto Inagawa, Ikuo Mori
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Patent number: 9045653Abstract: Embodiments relate to printing features from an ink containing a material precursor. In some embodiments, the material includes an electrically active material, such as a semiconductor, a metal, or a combination thereof. In another embodiment, the material includes a dielectric. The embodiments provide improved printing process conditions that allow for more precise control of the shape, profile and dimensions of a printed line or other feature. The composition(s) and/or method(s) improve control of pinning by increasing the viscosity and mass loading of components in the ink. An exemplary method thus includes printing an ink comprising a material precursor and a solvent in a pattern on the substrate; precipitating the precursor in the pattern to form a pinning line; substantially evaporating the solvent to form a feature of the material precursor defined by the pinning line; and converting the material precursor to the patterned material.Type: GrantFiled: August 23, 2013Date of Patent: June 2, 2015Assignee: Thin Film Electronics ASAInventors: Erik Scher, Steven Molesa, Joerg Rockenberger, Arvind Kamath, Ikuo Mori, Wenzhuo Guo, Dmitry Karshtedt, Vladimir K. Dioumaev
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Publication number: 20130344301Abstract: Embodiments relate to printing features from an ink containing a material precursor. In some embodiments, the material includes an electrically active material, such as a semiconductor, a metal, or a combination thereof. In another embodiment, the material includes a dielectric. The embodiments provide improved printing process conditions that allow for more precise control of the shape, profile and dimensions of a printed line or other feature. The composition(s) and/or method(s) improve control of pinning by increasing the viscosity and mass loading of components in the ink. An exemplary method thus includes printing an ink comprising a material precursor and a solvent in a pattern on the substrate; precipitating the precursor in the pattern to form a pinning line; substantially evaporating the solvent to form a feature of the material precursor defined by the pinning line; and converting the material precursor to the patterned material.Type: ApplicationFiled: August 23, 2013Publication date: December 26, 2013Inventors: Erik SCHER, Steven MOLESA, Joerg ROCKENBERGER, Arvind KAMATH, Ikuo MORI, Wenzhuo GUO, Dmitry KARSHTEDT, Vladimir DIOUMAEV
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Patent number: 8530589Abstract: Embodiments relate to printing features from an ink containing a material precursor. In some embodiments, the material includes an electrically active material, such as a semiconductor, a metal, or a combination thereof. In another embodiment, the material includes a dielectric. The embodiments provide improved printing process conditions that allow for more precise control of the shape, profile and dimensions of a printed line or other feature. The composition(s) and/or method(s) improve control of pinning by increasing the viscosity and mass loading of components in the ink. An exemplary method thus includes printing an ink comprising a material precursor and a solvent in a pattern on the substrate; precipitating the precursor in the pattern to form a pinning line; substantially evaporating the solvent to form a feature of the material precursor defined by the pinning line; and converting the material precursor to the patterned material.Type: GrantFiled: May 2, 2008Date of Patent: September 10, 2013Assignee: Kovio, Inc.Inventors: Erik Scher, Steven Molesa, Joerg Rockenberger, Arvind Kamath, Ikuo Mori
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Publication number: 20120031335Abstract: The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.Type: ApplicationFiled: April 29, 2011Publication date: February 9, 2012Applicant: APPLIED MATERIALS, INC.Inventors: Shinichi Kurita, Jozef Kudela, Suhail Anwar, John M. White, Dong-Kil Yim, Hans Georg Wolf, Dennis Zvalo, Makoto Inagawa, Ikuo Mori
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Publication number: 20120031333Abstract: The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.Type: ApplicationFiled: April 29, 2011Publication date: February 9, 2012Applicant: APPLIED MATERIALS, INC.Inventors: Shinichi Kurita, Jozef Kudela, Suhail Anwar, John M. White, Dong-Kil Yim, Hans Georg Wolf, Dennis Zvalo, Makoto Inagawa, Ikuo Mori
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Publication number: 20100129790Abstract: It is intended to provide a rapid, simple and noninvasive novel in vivo method for determining phospholipidosis (PLsis) by detecting a PLsis marker gene. More specifically, it is intended to provide a method for determining phospholipidosis in a mammal comprising the step of detecting change in expression of one or more genes whose expression changes correlated with the onset of phospholipidosis in a sample collected from the mammal, in which at least one of the genes comprises a base sequence identical or substantially identical to the base sequence represented by any of SEQ ID NO: n (wherein n is an odd number between 1 and 57, an integer number between 59 and 63, an even number between 64 and 98, 100 or 101.Type: ApplicationFiled: February 16, 2006Publication date: May 27, 2010Applicant: TAKEDA PHARMACEUTICAL LIMITEDInventors: Hiroshi Sawada, Ikuo Mori, Kenji Takami
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Publication number: 20090065776Abstract: Embodiments relate to printing features from an ink containing a material precursor. In some embodiments, the material includes an electrically active material, such as a semiconductor, a metal, or a combination thereof. In another embodiment, the material includes a dielectric. The embodiments provide improved printing process conditions that allow for more precise control of the shape, profile and dimensions of a printed line or other feature. The composition(s) and/or method(s) improve control of pinning by increasing the viscosity and mass loading of components in the ink. An exemplary method thus includes printing an ink comprising a material precursor and a solvent in a pattern on the substrate; precipitating the precursor in the pattern to form a pinning line; substantially evaporating the solvent to form a feature of the material precursor defined by the pinning line; and converting the material precursor to the patterned material.Type: ApplicationFiled: May 2, 2008Publication date: March 12, 2009Inventors: Erik SCHER, Steven Molesa, Joerg Rockenberger, Arvind Kamath, Ikuo Mori
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Patent number: 7399638Abstract: The present invention provides a prediction method for lipidosis caused by a compound, which includes detecting (a) phenylacetylglycine and/or phenylacetylglutamine, or an optionally chosen metabolic intermediate in the metabolic pathway from phenylalanine to phenylacetylglycine or phenylacetylglutamine, and (b) hippuric acid or an optionally chosen metabolic intermediate in the metabolic pathway from phenylalanine to hippuric acid, in a sample collected from a mammal receiving the compound or a mammalian cell or tissue culture exposed to the compound, and predicting the compound's potential for inducing lipidosis with the quantitative ratio of the two as the index. The present invention also provides a diagnostic method for lipidosis and diseases related thereto, including detecting (a) and (b) above in a sample collected from a mammal, and making a diagnosis with the quantitative ratio of the two as the index.Type: GrantFiled: December 24, 2004Date of Patent: July 15, 2008Assignee: Takeda Pharmaceutical Company LimitedInventors: Akira Horinouchi, Ikuo Mori, Mika Murabayashi
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Patent number: 7276385Abstract: Methods for repairing an electrical circuit; compositions, inks and equipment for making such repairs; and repair structures formed by the methods. The method generally includes the steps of: (a) depositing a composition comprising nanoparticles of an electrically functional material such that it contacts first and second elements of the circuit; and (b) sufficiently irradiating at least part of the composition with light to fuse or bind the nanoparticles to each other. The composition and ink generally comprise such nanoparticles and a sensitizer having a light absorption maximum at a wavelength different from that of the nanoparticles. The apparatus comprises: (1) a deposition apparatus configured to deposit a liquid film of an electrically functional material on the circuit; (2) a light source configured to irradiate at least part of the thin film; and (3) a table configured to secure the substrate.Type: GrantFiled: November 24, 2003Date of Patent: October 2, 2007Assignee: Kovio, Inc.Inventors: J. Devin MacKenzie, Ikuo Mori
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Publication number: 20070166829Abstract: The present invention provides a prediction method for lipidosis caused by a compound, which comprises detecting (a) phenylacetylglycine and/or phenylacetylglutamine, or an optionally chosen metabolic intermediate in the metabolic pathway from phenylalanine to phenylacetylglycine or phenylacetylglutamine, and (b) hippuric acid or an optionally chosen metabolic intermediate in the metabolic pathway from phenylalanine to hippuric acid, in a sample collected from a mammal receiving the compound or a mammalian cell or tissue culture exposed to the compound, and predicting the compound's potential for inducing lipidosis with the quantitative ratio of the two as the index. The present invention also provides a diagnostic method for lipidosis and diseases related thereto, comprising detecting (a) and (b) above in a sample collected from a mammal, and making a diagnosis with the quantitative ratio of the two as the index.Type: ApplicationFiled: December 24, 2004Publication date: July 19, 2007Applicant: Takeda Pharmaceutical Company LimitedInventors: Akira Horinouchi, Ikuo Mori, Mika Murabayashi
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Patent number: 6861675Abstract: An optically coupled semiconductor device according to the present invention comprises a mount electrode and a wire electrode which are formed on a top main face of the first wiring substrate, a light-emitting element is electrically connected to the mount electrode and the wire electrode, a first electrode pad and a second electrode pad which are provided on the top main face of the second wiring substrate in such a manner as to sandwich the opening formed in the second wiring substrate, a photo-receptor element which is arranged in such a manner as to block the opening formed in the second wiring substrate and which is connected to the first electrode pad so as to face the light-emitting element, and a switching element which is connected to the second electrode pad so as to face the wire.Type: GrantFiled: June 27, 2003Date of Patent: March 1, 2005Assignee: Kabushiki Kaisha ToshibaInventors: Taizo Tomioka, Ikuo Mori, Kenji Ito, Mutsumi Suematsu, Yasuhito Saito, Masayuki Arakawa
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Patent number: 6797530Abstract: A semiconductor device-manufacturing method includes a laminated wafer formation step and a dicing step. In the laminated wafer formation step, a metal plate is first laid on one side of a wafer with a solder material interposed, and then the metal plate and the wafer are subjected to decompression pressing to form a one-piece structure. As a result, a laminated wafer is obtained. In the dicing step, the laminated wafer is diced into laminated chips.Type: GrantFiled: September 25, 2002Date of Patent: September 28, 2004Assignee: Kabushiki Kaisha ToshibaInventors: Yasunari Ukita, Naotake Watanabe, Ikuo Mori
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Publication number: 20040000674Abstract: An optically coupled semiconductor device according to the present invention comprises a mount electrode and a wire electrode which are formed on a top main face of the first wiring substrate, a light-emitting element is electrically connected to the mount electrode and the wire electrode, a first electrode pad and a second electrode pad which are provided on the top main face of the second wiring substrate in such a manner as to sandwich the opening formed in the second wiring substrate, a photo-receptor element which is arranged in such a manner as to block the opening formed in the second wiring substrate and which is connected to the first electrode pad so as to face the light-emitting element, and a switching element which is connected to the second electrode pad so as to face the wire.Type: ApplicationFiled: June 27, 2003Publication date: January 1, 2004Inventors: Taizo Tomioka, Ikuo Mori, Kenji Ito, Mutsumi Suematsu, Yasuhito Saito, Masayuki Arakawa
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Publication number: 20030059979Abstract: A semiconductor device-manufacturing method includes a laminated wafer formation step and a dicing step. In the laminated wafer formation step, a metal plate is first laid on one side of a wafer with a solder material interposed, and then the metal plate and the wafer are subjected to decompression pressing to form a one-piece structure. As a result, a laminated wafer is obtained. In the dicing step, the laminated wafer is diced into laminated chips.Type: ApplicationFiled: September 25, 2002Publication date: March 27, 2003Inventors: Yasunari Ukita, Naotake Watanabe, Ikuo Mori
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Patent number: 5839808Abstract: A projection system is disclosed including a light source for producing an illumination light flux, and a light valve for converting the illumination light flux incident on the light valve into a modulated light flux. The projection system also includes a front lens system having a front optical axis. The front lens system is disposed relative to the light source and the light valve to transmit the illumination light flux to the light valve, and to transmit the modulated light flux toward a rear lens system having a rear optical axis that is displaced from but parallel to the front optical axis. The rear lens system is disposed relative to the front lens system to transmit the modulated light flux from the front lens system onto a suitable surface for viewing.Type: GrantFiled: July 26, 1996Date of Patent: November 24, 1998Assignees: Nikon Corporation, Nippon Hoso KyokiInventors: Motoo Koyama, Yuji Manabe, Ikuo Mori
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Patent number: 5482471Abstract: A socket for testing integrated circuit (IC) packages (100) has a lower block (10) with a plurality of contact elements (11) movable between open and closed positions mounted therein, an upper block (20) fixed on the lower bock (10) and formed with a lead insertion hole (21) for the insertion of each lead (101) of the IC package (100), a cover member (30) adapted for vertical, up and down movement relative to the upper block (20), and a spring biased slide block (40) mounted to slidably reciprocate in a recess formed between the upper and lower blocks (10,20) in a direction which crosses, at approximately a right angle, the direction in which a lead (101) of an IC package (100) would be inserted into an opened contact element (11). The slide block (40) has a plurality of apertures (41) for opening and closing contact elements (11) upon movement of the cover member (30) by the use of a contact part opening and closing element (50) converting movement of the cover (30) to sliding action of the slide block (40).Type: GrantFiled: February 16, 1994Date of Patent: January 9, 1996Assignee: Texas Instruments IncorporatedInventors: Ikuo Mori, Kiyokazu Ikeya
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Patent number: 5357118Abstract: In a radiation image read-out apparatus, a phosphor sheet (70), represented by the formula Gd.sub.2 O.sub.2 S:Tb.sup.3+, is located facing a stimulable phosphor sheet (10) in such a manner that when it is exposed to x-rays (44) it produces fluorescence (71) having a wavelength that fall within the stimulation wavelength range of the stimulable phosphor. When the stimulable phosphor sheet (10) is exposed to the fluorescence (71), part of the energy stored on the layer of stimulable phosphor during its exposure to the x-rays (44) is released. In this manner, the stimulable phosphor sheet (10) is approximately simultaneously subjected to the operation for recording the radiation image and the operation for slightly erasing the energy store thereon during its exposure to the x-rays (44).Type: GrantFiled: April 4, 1994Date of Patent: October 18, 1994Assignee: Fuji Photo Film Co., Ltd.Inventors: Takayoshi Fukuoka, Satoshi Arakawa, Ikuo Mori