Patents by Inventor Ikuo Mukai

Ikuo Mukai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110081520
    Abstract: An optical member for a touch panel of the invention includes a rubber elastic material film 1, in which one surface or both surfaces of the rubber elastic material have an irregular shape. The optical member for a touch panel of the invention can provide a touch panel that reduces errors even in environments having weak external light, enables input without using a special pen, and enables input even when an image in an LCD is displayed as the color black.
    Type: Application
    Filed: March 13, 2009
    Publication date: April 7, 2011
    Inventors: Takeshi Nojiri, Takeshi Yoshida, Ikuo Mukai, Keiko Funyu
  • Publication number: 20110063257
    Abstract: An optical member 1 for a touch panel having a pair of opposite main surfaces S1 and S2. The optical member 1 includes a first layer 11 and a second layer 12 laminated over the first layer 11. The surface 11a of the first layer 11, adjacent to the second layer 12, has an irregular shape, and the surface 11a of the first layer 11 and the surface 12a of the second layer 12 are partially or completely separated from each other. When the optical member is pressed from one main surface S2, the surface of at least one of the first layer 11 and/or the second layer 12 is reversibly deformed, thereby changing the reflection state of reflected light L2, which is incident from the other main surface S1.
    Type: Application
    Filed: March 13, 2009
    Publication date: March 17, 2011
    Inventors: Takeshi Nojiri, Takeshi Yoshida, Ikuo Mukai, Keiko Funyu
  • Publication number: 20030090193
    Abstract: Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9×L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4×L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.
    Type: Application
    Filed: June 11, 2002
    Publication date: May 15, 2003
    Inventors: Takeshi Nojiri, Hideyasu Tsuiki, Hiroyuki Tanaka, Yumiko Wada, Seiji Tai, Seikichi Tanno, Hajime Kakumaru, Kazuya Sato, Naoki Kimura, Ikuo Mukai
  • Patent number: 6416931
    Abstract: Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9×L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4×L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.
    Type: Grant
    Filed: August 13, 2001
    Date of Patent: July 9, 2002
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Takeshi Nojiri, Hideyasu Tsuiki, Hiroyuki Tanaka, Yumiko Wada, Seiji Tai, Seikichi Tanno, Hajime Kakumaru, Kazuya Sato, Naoki Kimura, Ikuo Mukai
  • Publication number: 20020018946
    Abstract: Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9×L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4×L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.
    Type: Application
    Filed: August 13, 2001
    Publication date: February 14, 2002
    Inventors: Takeshi Nojiri, Hideyasu Tsuiki, Hiroyuki Tanaka, Yumiko Wada, Seiji Tai, Seikichi Tanno, Hajime Kakumaru, Kazuya Sato, Naoki Kimura, Ikuo Mukai
  • Patent number: 6329111
    Abstract: Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9×L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4×L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.
    Type: Grant
    Filed: January 22, 1997
    Date of Patent: December 11, 2001
    Assignee: Hitachi Chemical Company
    Inventors: Takeshi Nojiri, Hideyasu Tsuiki, Hiroyuki Tanaka, Yumiko Wada, Seiji Tai, Seikichi Tanno, Hajime Kakumaru, Kazuya Sato, Naoki Kimura, Ikuo Mukai
  • Patent number: 6194826
    Abstract: Disclosed are a process for preparing a phosphor pattern of the present invention comprises the steps of: (I) forming a phosphor-containing photosensitive resin composition layer (A) on a substrate having unevenness, (II) irradiating a scattered light to the layer (A) imagewisely, (III) developing the layer (A) by removing the portion to which the scattered light is imagewisely irradiated to form a pattern, and (IV) calcinating the formed pattern to remove an unnecessary portion from the pattern formed in the step (III) to form a phosphor pattern, a phosphor pattern produced by the above process and a back plate for the plasma display panel provided with the phosphor pattern on a substrate for a plasma display panel.
    Type: Grant
    Filed: March 11, 1998
    Date of Patent: February 27, 2001
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Kazuya Satou, Hiroyuki Tanaka, Takeshi Nojiri, Naoki Kimura, Toranosuke Ashizawa, Seiji Tai, Ikuo Mukai, Seikichi Tanno