Patents by Inventor Il-Hwan NAM

Il-Hwan NAM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for measuring thickness of object
    Patent number: 9255789
    Abstract: Methods for measuring a thickness of an object including acquiring at least one of a wavelength domain spectrum for an amplitude ratio (?) and a phase difference (?) of reflected light from a film material, converting the wavelength domain spectrum into a 1/wavelength domain spectrum, acquiring a resulting spectrum by performing fast fourier transform (FFT) on the 1/wavelength domain spectrum, and measuring a thickness of the film material from the resulting spectrum may be provided.
    Type: Grant
    Filed: May 23, 2014
    Date of Patent: February 9, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jang-Ik Park, Il-Hwan Nam, Kwan-Woo Ryu
  • METHOD FOR MEASURING THICKNESS OF OBJECT
    Publication number: 20150029517
    Abstract: Methods for measuring a thickness of an object including acquiring at least one of a wavelength domain spectrum for an amplitude ratio (?) and a phase difference (?) of reflected light from a film material, converting the wavelength domain spectrum into a 1/wavelength domain spectrum, acquiring a resulting spectrum by performing fast fourier transform (FFT) on the 1/wavelength domain spectrum, and measuring a thickness of the film material from the resulting spectrum may be provided.
    Type: Application
    Filed: May 23, 2014
    Publication date: January 29, 2015
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jang-Ik PARK, Il-Hwan NAM, Kwan-Woo RYU