Abstract: There is provided an alarm apparatus for checking an amount of electric current supplied to each of the lamps of a wafer etching equipment and timely exchanging defective lamps if the amount of the current is less than a predetermined level, thereby minimizing process failures. The alarm apparatus includes a plurality of lamps provided above a dome cover of a reaction chamber to uniformly maintain a constant temperature of the dome cover, current quantity detecting devices provided on each of electric lines supplying electric power to each of the lamps, a controller for checking the amount of electric current through each of the current quantity detecting devices to compare the detected amount of electric current with a predetermined amount of electric current, and an alarm indicating a proper time to exchange lamps having an amount of electric current less than the predetermined amount of electric current in response to a comparison result from the controller.

Abstract: There is provided an alarm apparatus for checking an amount of electric current supplied to each of the lamps of a wafer etching equipment and timely exchanging defective lamps if the amount of the current is less than a predetermined level, thereby minimizing process failures. The alarm apparatus includes a plurality of lamps provided above a dome cover of a reaction chamber to uniformly maintain a constant temperature of the dome cover, current quantity detecting devices provided on each of electric lines supplying electric power to each of the lamps, a controller for checking the amount of electric current through each of the current quantity detecting devices to compare the detected amount of electric current with a predetermined amount of electric current, and an alarm indicating a proper time to exchange lamps having an amount of electric current less than the predetermined amount of electric current in response to a comparison result from the controller.