Abstract: A phosphoric acid-free etchant composition and a method of forming a wiring, the composition including about 40 wt % to about 60 wt % of an organic acid compound; about 6 wt % to about 12 wt % of a glycol compound; about 1 wt % to about 10 wt % of nitric acid, sulfuric acid, or hydrochloric acid; about 1 wt % to about 10 wt % of a nitrate salt compound; and water, all wt % being based on a total weight of the phosphoric acid-free etchant composition.

Abstract: A phosphoric acid-free etchant composition and a method of forming a wiring, the composition including about 40 wt % to about 60 wt % of an organic acid compound; about 6 wt % to about 12 wt % of a glycol compound; about 1 wt % to about 10 wt % of nitric acid, sulfuric acid, or hydrochloric acid; about 1 wt % to about 10 wt % of a nitrate salt compound; and water, all wt % being based on a total weight of the phosphoric acid-free etchant composition.

Abstract: A phosphoric acid-free etchant composition and a method of forming a wiring, the composition including about 40 wt % to about 60 wt % of an organic acid compound; about 6 wt % to about 12 wt % of a glycol compound; about 1 wt % to about 10 wt % of nitric acid, sulfuric acid, or hydrochloric acid; about 1 wt % to about 10 wt % of a nitrate salt compound; and water, all wt % being based on a total weight of the phosphoric acid-free etchant composition.

Abstract: A method of etching and cleaning objects contained in a vessel, includes etching the objects by providing etching solution into the vessel, forcing out the etching solution from the vessel by providing pressurized gas into the vessel; cleaning the objects by providing cleaning solution into the vessel; and draining the cleaning solution from the vessel. By forcing out the etching solution with a pressurized gas such as nitrogen gas, there is no density difference of the etching solution in contact with the objects, leading to uniform etching of the objects.

Abstract: A liquid crystal display and a method of fabricating such a liquid crystal display wherein a buffer layer having a hydrophilic property is formed at normal (atmospheric) pressure on the exposed surface of a hydrophobic organic passivation layer. The buffer layer improves the adhesion between an exposed surface and a subsequently formed electrode layer. The buffer layer is beneficially formed from an oxide layer that is induced on the surface of the buffer layer using UV radiation having a wavelength of 100 to 200 nm. Such a buffer layer can eliminate vacuum fabrication and shorten the fabrication time of the liquid crystal display.

Abstract: An integrated etch/strip/clean apparatus is disclosed. The apparatus includes an etching line to etch and clean a substrate, a stripping line to strip the etched substrate, and a cleaning line to clean and dry the substrate. The cleaning line is on the stripping line. Accordingly, etch, strip and cleaning processes is performed by a single equipment. As a result, processing time installation space requirement of the equipment are reduced. Further, contamination of the substrate is prevented.

Abstract: A unified strip/cleaning apparatus wherein a strip device is integrated with a cleaning device. In the apparatus, a strip line removes resin on a substrate and a cleaning line is provided under the strip line to clean and dry the substrate. A loader supplies the substrate to the strip line, and an unloader receives the substrate from the cleaning line. Accordingly, the installation space can be minimized.

Abstract: A unified strip/cleaning apparatus wherein a strip device is integrated with a cleaning device. In the apparatus, a strip line removes resin on a substrate and a cleaning line is provided under the strip line to clean and dry the substrate. Accordingly, the installation space can be minimized.

Abstract: An integrated etch/strip/clean apparatus is disclosed. The apparatus includes an etching line to etch and clean a substrate, a stripping line to strip the etched substrate, and a cleaning line to clean and dry the substrate. The cleaning line is on the stripping line. Accordingly, etch, strip and cleaning processes is performed by a single equipment. As a result, processing time installation space requirement of the equipment are reduced. Further, contamination of the substrate is prevented.

Abstract: A liquid crystal display and a method of fabricating such a liquid crystal display wherein a buffer layer having a hydrophilic property is formed at normal (atmospheric) pressure on the exposed surface of a hydrophobic organic passivation layer. The buffer layer improves the adhesion between an exposed surface and a subsequently formed electrode layer. The buffer layer is beneficially formed from an oxide layer that is induced on the surface of the buffer layer using UV radiation having a wavelength of 100 to 200 nm. Such a buffer layer can eliminate vacuum fabrication and shorten the fabrication time of the liquid crystal display.