Patents by Inventor Il-Ho Noh

Il-Ho Noh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240121809
    Abstract: A method of a first terminal may include: identifying first RB set(s) to be used for SL communication among consecutive RB sets through an LBT procedure; identifying a first subchannel group included in the first RB set(s) and a second subchannel group including a first PRB in the first RB set(s), the first PRB being not included in the first subchannel group; configuring the first PRB within the second subchannel group as an SL communication resource; and transmitting, to a second terminal, control information indicating that the first PRB is configured as the SL communication resource.
    Type: Application
    Filed: September 27, 2023
    Publication date: April 11, 2024
    Inventors: Jun Hyeong KIM, Go San NOH, Il Gyu KIM, Man Ho PARK, Nak Woon SUNG, Jae Su SONG, Nam Suk LEE, Hee Sang CHUNG, Min Suk CHOI
  • Publication number: 20240096954
    Abstract: A semiconductor device includes an active pattern including: a lower pattern extending in a first direction, and a plurality of sheet patterns spaced apart from the lower pattern in a second direction; a gate structure on the lower pattern and including a gate electrode and a gate insulating film including an interfacial insulating film including a first vertical portion and a horizontal portion. A dimension in a third direction of the first vertical portion is greater than a dimension in the second direction of the horizontal portion. The first vertical portion includes: a first area contacting a source/drain pattern; and a second area provided between the first area and the gate electrode. The interfacial insulating film includes a first element other than silicon, wherein a concentration of the first element in the first area is greater than a concentration of the first element in the second area.
    Type: Application
    Filed: August 8, 2023
    Publication date: March 21, 2024
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Il Gyou SHIN, Hyun Ho NOH, Sang Yong KIM, You Bin KIM
  • Patent number: 10418589
    Abstract: A substrate processing system and substrate processing method. The substrate processing system includes: a chamber; a susceptor disposed inside the chamber and allowing a substrate to be seated thereon; a mask member disposed over the substrate; and a controller for controlling an arrangement height of the mask member with respect to the substrate. Here, an encapsulation layer covering a device formed on the substrate is formed using the mask member adjusted in height by the controller. The substrate processing method includes disposing a substrate inside a chamber; disposing a mask member over the substrate inside the chamber; and forming an encapsulation layer covering a device formed on the substrate by adjusting an arrangement height of the mask member with respect to the substrate.
    Type: Grant
    Filed: May 31, 2017
    Date of Patent: September 17, 2019
    Assignee: WONIK IPS CO., LTD.
    Inventors: Il Ho Noh, Seung Duk Bang, Beom Jun Kim, Soo Ho Oh, Sin Pyoung Kim
  • Publication number: 20180019441
    Abstract: A substrate processing system and substrate processing method. The substrate processing system includes: a chamber; a susceptor disposed inside the chamber and allowing a substrate to be seated thereon; a mask member disposed over the substrate; and a controller for controlling an arrangement height of the mask member with respect to the substrate. Here, an encapsulation layer covering a device formed on the substrate is formed using the mask member adjusted in height by the controller. The substrate processing method includes disposing a substrate inside a chamber; disposing a mask member over the substrate inside the chamber; and forming an encapsulation layer covering a device formed on the substrate by adjusting an arrangement height of the mask member with respect to the substrate.
    Type: Application
    Filed: May 31, 2017
    Publication date: January 18, 2018
    Applicant: WONIK IPS Co., Ltd.
    Inventors: IL HO NOH, SEUNG DUK BANG, BEOM JUN KIM, SOO HO OH, SIN PYOUNG KIM
  • Patent number: 7918940
    Abstract: In a substrate processing apparatus for forming thin layers on a substrate used for an organic light emitting diode, the apparatus includes a mask attaching chamber, a deposition chamber and a mask detaching chamber. The mask attaching chamber, the deposition chamber and the mask detaching chamber are provided with a transferring guide installed thereinside, and a substrate supporter for supporting the substrate moves along the transferring guide in or between the chambers. Thus, a time for processing the substrate and an area for the apparatus may be reduced. Also, the chambers are grouped in one or more, and a gate valve is installed between the grouped chambers for opening and closing a path between the grouped chambers. Accordingly, the chambers may be continuously maintained in a vacuum state when any one of the chambers is repaired.
    Type: Grant
    Filed: January 31, 2006
    Date of Patent: April 5, 2011
    Assignee: Semes Co., Ltd.
    Inventors: Ki-Choul An, Young-Chul Joung, Tae-Young Ha, Jung-Won Chang, Il-Ho Noh, Seung-Bae Lee
  • Publication number: 20070272156
    Abstract: Provided is a linear evaporator for manufacturing a thin film of an organic light emitting device using a plurality of crucibles. The evaporator includes: a housing formed in a long cylinder shape and having an open top surface; a crucible fixing unit covering the housing and having a plurality of holes therein; a plurality of crucibles inserted in the housing through the plurality of holes, each of the crucibles having an open top surface and containing depositing materials therein; and a plurality of heating units, each of which is connected to the outer wall of each of the crucibles for heating each of the crucibles.
    Type: Application
    Filed: May 14, 2007
    Publication date: November 29, 2007
    Inventor: Il-Ho Noh
  • Publication number: 20060174829
    Abstract: In a substrate processing apparatus for forming thin layers on a substrate used for an organic light emitting diode, the apparatus includes a mask attaching chamber, a deposition chamber and a mask detaching chamber. The mask attaching chamber, the deposition chamber and the mask detaching chamber are provided with a transferring guide installed thereinside, and a substrate supporter for supporting the substrate moves along the transferring guide in or between the chambers. Thus, a time for processing the substrate and an area for the apparatus may be reduced. Also, the chambers are grouped in one or more, and a gate valve is installed between the grouped chambers for opening and closing a path between the grouped chambers. Accordingly, the chambers may be continuously maintained in a vacuum state when any one of the chambers is repaired.
    Type: Application
    Filed: January 31, 2006
    Publication date: August 10, 2006
    Inventors: Ki-Choul An, Young-Chul Joung, Tae-Young Ha, Jung-Won Chang, Il-Ho Noh, Seung-Bae Lee