Patents by Inventor Ilker Durukan
Ilker Durukan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240061409Abstract: A method includes identifying sets of part data associated with substrate processing equipment. Each of the sets of part data includes corresponding part values and a corresponding part identifier. Each of the sets of part data is associated with hardware parameters of a corresponding equipment part of substrate processing equipment. The method further includes generating sets of aggregated data. Each of the sets of aggregated data includes a corresponding set of part data of the sets of part data and a corresponding set of additional non-part data of sets of non-part data. The method further includes causing, based on the sets of aggregated data, performance of a corrective action associated with the substrate processing equipment.Type: ApplicationFiled: October 26, 2023Publication date: February 22, 2024Inventors: Garrett Ho-Yee Sin, Sidharth Bhatia, Katty Marie Lydia Gamon Guyomard, Shawyon Jafari, Heng-Cheng Pai, Pramod Nambiar, Paul Lukas Brillhart, Ilker Durukan
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Patent number: 11853042Abstract: A method includes receiving part data associated with a corresponding part of substrate processing equipment, sensor data associated with one or more corresponding substrate processing operations performed by the substrate processing equipment to produce one or more corresponding substrates, and metrology data associated with the one or more corresponding substrates produced by the one or more corresponding substrate processing operations performed by the substrate processing equipment that includes the corresponding part. The method further includes generating sets of aggregated part-sensor-metrology data including a corresponding set of part data, a corresponding set of sensor data, and a corresponding set of metrology data. The method further includes causing analysis of the sets of aggregated part-sensor-metrology data to generate one or more outputs to perform a corrective action associated with the corresponding part of the substrate processing equipment.Type: GrantFiled: February 17, 2021Date of Patent: December 26, 2023Assignee: Applied Materials, Inc.Inventors: Garrett Ho-Yee Sin, Sidharth Bhatia, Katty Marie Lydia Gamon Guyomard, Shawyon Jafari, Heng-Cheng Pai, Pramod Nambiar, Paul Lukas Brillhart, Ilker Durukan
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Publication number: 20230125613Abstract: Embodiments of the present disclosure generally relate to an apparatus for improving the film thickness on a substrate when using a heated substrate support. A cover plate to be placed over the top surface of a heated substrate support is disclosed. The cover plate includes a pocket formed in the middle thereof for the placement of a substrate. The cover plate may include a variety of features including a plurality of dimples, a plurality of radially disposed grooves, a plurality of annular grooves, lift pin holes, pin slots, and gas exhaust holes.Type: ApplicationFiled: December 20, 2022Publication date: April 27, 2023Inventors: Muhammad M. RASHEED, Ilker DURUKAN
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Patent number: 11566327Abstract: Methods and apparatus to reduce pressure fluctuations in a chemical delivery system for a process chamber are provided herein. In some embodiments, a chemical delivery system for a process chamber, includes: a carrier gas supply; an ampoule fluidly coupled to the carrier gas supply via a first supply line, wherein the ampoule is configured to supply one or more process gases to the process chamber via a second supply line; an inlet valve disposed in line with the first supply line to control a flow of a carrier gas from the carrier gas supply to the ampoule; and a first control valve disposed in line with a pressure regulation line, wherein the pressure regulation line is fluidly coupled to the first supply line at a tee location between the carrier gas supply and the inlet valve.Type: GrantFiled: November 20, 2020Date of Patent: January 31, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Ilker Durukan, Muhammad M. Rasheed, Kenric Choi, Tatsuya Sato
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Patent number: 11562914Abstract: Embodiments of the present disclosure generally relate to an apparatus for improving the film thickness on a substrate when using a heated substrate support. A cover plate to be placed over the top surface of a heated substrate support is disclosed. The cover plate includes a pocket formed in the middle thereof for the placement of a substrate. The cover plate may include a variety of features including a plurality of dimples, a plurality of radially disposed grooves, a plurality of annular grooves, lift pin holes, pin slots, and gas exhaust holes.Type: GrantFiled: April 12, 2021Date of Patent: January 24, 2023Assignee: Applied Materials, Inc.Inventors: Muhammad M. Rasheed, Ilker Durukan
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Publication number: 20220260978Abstract: A method includes receiving part data associated with a corresponding part of substrate processing equipment, sensor data associated with one or more corresponding substrate processing operations performed by the substrate processing equipment to produce one or more corresponding substrates, and metrology data associated with the one or more corresponding substrates produced by the one or more corresponding substrate processing operations performed by the substrate processing equipment that includes the corresponding part. The method further includes generating sets of aggregated part-sensor-metrology data including a corresponding set of part data, a corresponding set of sensor data, and a corresponding set of metrology data. The method further includes causing analysis of the sets of aggregated part-sensor-metrology data to generate one or more outputs to perform a corrective action associated with the corresponding part of the substrate processing equipment.Type: ApplicationFiled: February 17, 2021Publication date: August 18, 2022Inventors: Garrett Ho-Yee Sin, Sidharth Bhatia, Katty Marie Lydia Gamon Guyomard, Shawyon Jafari, Heng-Cheng Pai, Pramod Nambiar, Paul Lukas Brillhart, Ilker Durukan
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Publication number: 20220162752Abstract: Methods and apparatus to reduce pressure fluctuations in a chemical delivery system for a process chamber are provided herein. In some embodiments, a chemical delivery system for a process chamber, includes: a carrier gas supply; an ampoule fluidly coupled to the carrier gas supply via a first supply line, wherein the ampoule is configured to supply one or more process gases to the process chamber via a second supply line; an inlet valve disposed in line with the first supply line to control a flow of a carrier gas from the carrier gas supply to the ampoule; and a first control valve disposed in line with a pressure regulation line, wherein the pressure regulation line is fluidly coupled to the first supply line at a tee location between the carrier gas supply and the inlet valve.Type: ApplicationFiled: November 20, 2020Publication date: May 26, 2022Inventors: Ilker DURUKAN, Muhammad M. RASHEED, Kenric CHOI, Tatsuya SATO
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Publication number: 20210343557Abstract: Embodiments of the present disclosure generally relate to an apparatus for improving the film thickness a substrate when using a heated substrate support. A cover plate to be placed over the top surface of a heated substrate support is disclosed. The cover plate includes a pocket formed in the middle thereof for the placement of a substrate. The cover plate may include a variety of features including a plurality of dimples, a plurality of radially disposed grooves, a plurality of annular grooves, lift pin holes, pin slots, and gas exhaust holes.Type: ApplicationFiled: April 12, 2021Publication date: November 4, 2021Inventors: Muhammad M. RASHEED, Ilker DURUKAN
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Patent number: 10879090Abstract: Lid assemblies for processing chamber and processing chambers including the lid assemblies are described. The lid assemblies include a high temperature lid module and a housing. The high temperature lid module being positioned adjacent a process liner of a processing chamber. The flexible housing positioned around the high temperature lid module and joined to the high temperature lid module with an elastomeric ring.Type: GrantFiled: October 27, 2017Date of Patent: December 29, 2020Assignee: Applied Materials, Inc.Inventors: Ilker Durukan, Joel M. Huston, Dien-Yeh Wu, Chien-Teh Kao, Mei Chang
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Patent number: 10519546Abstract: Outer distribution rings and gas distribution apparatus with outer distribution rings to deliver a gas flow to a process region of a process chamber are described. The outer distribution rings include at least one plenum in fluid communication with a plurality of openings forming a plurality of trenches to allow gas to flow from the plenum through the openings and down an inner peripheral face of the outer distribution ring.Type: GrantFiled: November 9, 2018Date of Patent: December 31, 2019Assignee: Applied Materials, Inc.Inventors: Ravi Jallepally, Muhammad M. Rasheed, Ilker Durukan
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Publication number: 20190078205Abstract: Outer distribution rings and gas distribution apparatus with outer distribution rings to deliver a gas flow to a process region of a process chamber are described. The outer distribution rings include at least one plenum in fluid communication with a plurality of openings forming a plurality of trenches to allow gas to flow from the plenum through the openings and down an inner peripheral face of the outer distribution ring.Type: ApplicationFiled: November 9, 2018Publication date: March 14, 2019Inventors: Ravi Jallepally, Muhammad M. Rasheed, Ilker Durukan
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Patent number: 10167553Abstract: Outer distribution rings and gas distribution apparatus with outer distribution rings to deliver a gas flow to a process region of a process chamber are described. The outer distribution rings include at least one plenum in fluid communication with a plurality of openings forming a plurality of trenches to allow gas to flow from the plenum through the openings and down an inner peripheral face of the outer distribution ring.Type: GrantFiled: March 30, 2017Date of Patent: January 1, 2019Assignee: Applied Materials, Inc.Inventors: Muhammad M. Rasheed, Ravi Jallepally, Ilker Durukan
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Patent number: 9914632Abstract: Methods and apparatus for delivering precursor materials derived from liquid chemicals to a process chamber are provided herein. In some embodiments, a liquid chemical delivery apparatus includes: a body having an inner volume to hold a liquid chemical, an inlet to receive a carrier gas into the inner volume, and an outlet to flow the carrier gas from the inner volume, wherein a bottom of the inner volume includes a reduced volume portion; and a level sensor configured to detect a level of the liquid chemical in the reduced volume portion.Type: GrantFiled: October 23, 2014Date of Patent: March 13, 2018Assignee: APPLIED MATERIALS, INC.Inventors: Ilker Durukan, Muhammad M. Rasheed, Paul F. Ma
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Publication number: 20180053667Abstract: Lid assemblies for processing chamber and processing chambers including the lid assemblies are described. The lid assemblies include a high temperature lid module and a housing. The high temperature lid module being positioned adjacent a process liner of a processing chamber. The flexible housing positioned around the high temperature lid module and joined to the high temperature lid module with an elastomeric ring.Type: ApplicationFiled: October 27, 2017Publication date: February 22, 2018Inventors: Ilker Durukan, Joel M. Huston, Dien-Yeh Wu, Chien-Teh Kao, Mei Chang
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Patent number: 9831109Abstract: Lid assemblies for processing chamber and processing chambers including the lid assemblies are described. The lid assemblies include a high temperature lid module and a housing. The high temperature lid module being positioned adjacent a process liner of a processing chamber. The flexible housing positioned around the high temperature lid module and joined to the high temperature lid module with an elastomeric ring.Type: GrantFiled: March 11, 2014Date of Patent: November 28, 2017Assignee: Applied Materials, Inc.Inventors: Ilker Durukan, Joel M. Huston, Dien-Yeh Wu, Chien-Teh Kao, Mei Chang
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Publication number: 20170283947Abstract: Outer distribution rings and gas distribution apparatus with outer distribution rings to deliver a gas flow to a process region of a process chamber are described. The outer distribution rings include at least one plenum in fluid communication with a plurality of openings forming a plurality of trenches to allow gas to flow from the plenum through the openings and down an inner peripheral face of the outer distribution ring.Type: ApplicationFiled: March 30, 2017Publication date: October 5, 2017Inventors: Muhammad M. Rasheed, Ravi Jallepally, Ilker Durukan
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Publication number: 20160052772Abstract: Methods and apparatus for delivering precursor materials derived from liquid chemicals to a process chamber are provided herein. In some embodiments, a liquid chemical delivery apparatus includes: a body having an inner volume to hold a liquid chemical, an inlet to receive a carrier gas into the inner volume, and an outlet to flow the carrier gas from the inner volume, wherein a bottom of the inner volume includes a reduced volume portion; and a level sensor configured to detect a level of the liquid chemical in the reduced volume portion.Type: ApplicationFiled: October 23, 2014Publication date: February 25, 2016Inventors: ILKER DURUKAN, MUHAMMAD M. RASHEED, PAUL F. MA
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Publication number: 20140252015Abstract: Lid assemblies for processing chamber and processing chambers including the lid assemblies are described. The lid assemblies include a high temperature lid module and a housing. The high temperature lid module being positioned adjacent a process liner of a processing chamber. The flexible housing positioned around the high temperature lid module and joined to the high temperature lid module with an elastomeric ring.Type: ApplicationFiled: March 11, 2014Publication date: September 11, 2014Inventors: Ilker Durukan, Joel M. Huston, Dien-Yeh Wu, Chien-Teh Kao, Mei Chang