Patents by Inventor Ilya Lavitsky
Ilya Lavitsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9928997Abstract: Apparatus for physical vapor deposition of dielectric material is provided herein. In some embodiments, a chamber lid of a physical vapor deposition chamber includes an inner magnetron assembly coupled to an inner target assembly, and an outer magnet assembly coupled to an outer target assembly, wherein the inner magnetron assembly and the inner target assembly are electrically isolated from the outer magnet assembly and the outer target assembly.Type: GrantFiled: February 9, 2015Date of Patent: March 27, 2018Assignee: APPLIED MATERIALS, INC.Inventors: Keith A. Miller, Thanh X. Nguyen, Ilya Lavitsky, Randy Schmieding, Prashanth Kothnur
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Patent number: 9564348Abstract: Processing chamber shutter blade and robot blade assemblies are constructed to eliminate thermal effects on the placement of elements in processing chambers. Such blade assemblies may contain at least two parts, which may include a positioning member including a low CTE material and a thermal compensating member including a high CTE material. The positioning member includes a coupling point and a reference point on a reference axis separated by a first distance. The thermal compensating member includes a connection point and a controlled point separated by another distance that is less than the first distance. A distance ratio of the first distance to the other distance is substantially equal to a CTE ratio of the high CTE material to the low CTE material, and the positioning member is joined to the thermal compensating member through the coupling point and the connection point.Type: GrantFiled: March 17, 2014Date of Patent: February 7, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Ilya Lavitsky, Keith A. Miller
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Publication number: 20160172168Abstract: Apparatus for physical vapor deposition of dielectric material is provided herein. In some embodiments, a chamber lid of a physical vapor deposition chamber includes an inner magnetron assembly coupled to an inner target assembly, and an outer magnet assembly coupled to an outer target assembly, wherein the inner magnetron assembly and the inner target assembly are electrically isolated from the outer magnet assembly and the outer target assembly.Type: ApplicationFiled: February 9, 2015Publication date: June 16, 2016Inventors: Keith A. Miller, THANH X. NGUYEN, ILYA LAVITSKY, RANDY SCHMIEDING, PRASHANTH KOTHNUR
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Patent number: 8865602Abstract: Embodiments of the invention generally relate to a support ring to support a substrate in a process chamber. In one embodiment, the support ring comprises an inner ring, an outer ring connecting to an outer perimeter of the inner ring through a flat portion, an edge lip extending radially inwardly from an inner perimeter of the inner ring to form a supporting ledge to support the substrate, and a substrate support formed on a top surface of the edge lip. The substrate support may include multiple projections extending upwardly and perpendicularly from a top surface of the edge lip, or multiple U-shaped clips securable to an edge portion of the edge lip. The substrate support thermally disconnects the substrate from the edge lip to prevent heat loss through the edge lip, resulting in an improved temperature profile across the substrate with a minimum edge temperature gradient.Type: GrantFiled: September 28, 2012Date of Patent: October 21, 2014Assignee: Applied Materials, Inc.Inventors: Joseph M. Ranish, Wolfgang R. Aderhold, Blake Koelmel, Ilya Lavitsky
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Publication number: 20140271081Abstract: Processing chamber shutter blade and robot blade assemblies are constructed to eliminate thermal effects on the placement of elements in processing chambers. Such blade assemblies may contain at least two parts, which may include a positioning member including a low CTE material and a thermal compensating member including a high CTE material. The positioning member includes a coupling point and a reference point on a reference axis separated by a first distance. The thermal compensating member includes a connection point and a controlled point separated by another distance that is less than the first distance. A distance ratio of the first distance to the other distance is substantially equal to a CTE ratio of the high CTE material to the low CTE material, and the positioning member is joined to the thermal compensating member through the coupling point and the connection point.Type: ApplicationFiled: March 17, 2014Publication date: September 18, 2014Applicant: APPLIED MATERIALS, INC.Inventors: Ilya LAVITSKY, Keith A. MILLER
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Patent number: 7670436Abstract: A substrate ring assembly is provided for a substrate support having a peripheral edge. The assembly has an annular band having an inner perimeter that surrounds and at least partially covers the peripheral edge of the substrate support. The assembly also has a clamp to secure the annular band to the peripheral edge of the substrate support.Type: GrantFiled: November 3, 2004Date of Patent: March 2, 2010Assignee: Applied Materials, Inc.Inventors: Keith A. Miller, Ilya Lavitsky
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Patent number: 7569125Abstract: A one-piece inner shield usable in a plasma sputter reactor and extending from the target to the pedestal with a smooth inner surface and supported by an annular flange in a middle portion of the shield. The shield may be used to support the RF coil used in exciting the plasma. An outer shield includes an outwardly extending flange on its end alignable with the inner shield flange, holes in correspondence to recesses in the inner shield for standoffs for the RF coil, and circumferentially arranged gas flow holes.Type: GrantFiled: May 5, 2005Date of Patent: August 4, 2009Assignee: Applied Materials, Inc.Inventors: Tza-Jing Gung, Xianmin Tang, John Forster, Peijun Ding, Marc Schweitzer, Keith A. Miller, Ilya Lavitsky
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Publication number: 20080116067Abstract: The invention relates to physical vapor deposition (PVD) chambers having a rotatable substrate pedestal and at least one moveable tilted target. Embodiments of the invention facilitate deposition of highly uniform thin films.Type: ApplicationFiled: December 5, 2007Publication date: May 22, 2008Inventors: Ilya Lavitsky, Michael Rosenstein, Goichi Yoshidome, Hougong Wang, Zhendong Liu, Mengqi Ye
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Patent number: 7371285Abstract: A semiconductor processing chamber having a motorized lid is provided. In one embodiment, the semiconductor processing chamber generally includes a chamber body having sidewalls and a bottom defining an interior volume. A lid assembly is coupled to the chamber body and is movable between a first position that encloses the interior volume and a second position. A hinge assembly thereto is coupled between the lid assembly and the chamber body. A motor is coupled to the hinge assembly to facilitate moving the lid assembly between the first position and the second position.Type: GrantFiled: March 19, 2004Date of Patent: May 13, 2008Assignee: Applied Materials, Inc.Inventors: Michael Rosenstein, Alex Shenderovich, Marc O. Schweitzer, Ilya Lavitsky, Alvin Lau, Michael Feltsman
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Publication number: 20070151841Abstract: A magnetron scanning and support mechanism in which the magnetron is partially supported from an overhead scanning mechanism through multiple springs coupled to different horizontal locations on the magnetron and partially supported from below at multiple locations on the target, on which it slides or rolls. In one embodiment, the yoke plate is continuous and uniform. In another embodiment, the magnetron's magnetic yoke is divided into two flexible yokes, for example, of complementary serpentine shape and each supporting magnets of respective polarity. In another embodiment, the target and magnetron are divided into respective strips separated by other structure. Each magnetron strip is supported partially from above from a common scanning plate and partially on a respective target strip. A centering mechanism may align the different magnetron strips.Type: ApplicationFiled: November 17, 2006Publication date: July 5, 2007Applicant: Applied Materials, Inc.Inventors: Makoto Inagawa, Akihiro Hosokawa, Hien-Minh Le, Ilya Lavitsky, John White, Todd Martin, Bradley Stimson
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Publication number: 20060096857Abstract: The invention relates to physical vapor deposition (PVD) chambers having a rotatable substrate pedestal. Embodiments of the invention facilitate deposition of highly uniform thin films. In further embodiments, one or more sputtering targets are movably disposed above the pedestal. The orientation of the targets relative to the pedestal may be adjusted laterally, vertically or angularly. In one embodiment, the target may be adjusted between angles of about 0 to 45 degreees relative to an axis of pedestal rotation.Type: ApplicationFiled: November 8, 2004Publication date: May 11, 2006Inventors: Ilya Lavitsky, Michael Rosenstein, Goichi Yoshidome, Hougong Wang, Zhendong Liu, Mengqi Ye
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Publication number: 20060096851Abstract: The invention relates to physical vapor deposition (PVD) chambers having a rotatable substrate pedestal and at least one moveable tilted target. Embodiments of the invention facilitate deposition of highly uniform thin films.Type: ApplicationFiled: November 8, 2004Publication date: May 11, 2006Inventors: Ilya Lavitsky, Michael Rosenstein, Goichi Yoshidome, Hougong Wang, Zhendong Liu, Mengqi Ye
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Patent number: 7041201Abstract: One aspect of the invention includes an auxiliary magnet ring positioned outside of the chamber wall of a plasma sputter reactor and being disposed at least partially radially outwardly of an RF coil used to inductively generate a plasma, particularly for sputter etching the substrate being sputter deposited. Thereby, a magnetic barrier prevents the plasma from leaking outwardly to the coil and improves the uniformity of sputter etching. The magnetic field also acts as a magnetron when the coil, when made of the same material as the primary target, is being used as a secondary target. Another aspect of the invention includes a one-piece inner shield extending from the target to the pedestal with a smooth inner surface and supported by an annular flange in a middle portion of the shield. The shield may be used to support the RF coil.Type: GrantFiled: June 26, 2003Date of Patent: May 9, 2006Assignee: Applied Materials, Inc.Inventors: Tza-Jing Gung, Xianmin Tang, John Forster, Peijun Ding, Marc Schweitzer, Keith A. Miller, Ilya Lavitsky
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Publication number: 20060090706Abstract: A substrate ring assembly is provided for a substrate support having a peripheral edge. The assembly has an annular band having an inner perimeter that surrounds and at least partially covers the peripheral edge of the substrate support. The assembly also has a clamp to secure the annular band to the peripheral edge of the substrate support.Type: ApplicationFiled: November 3, 2004Publication date: May 4, 2006Inventors: Keith Miller, Ilya Lavitsky
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Publication number: 20050199491Abstract: A one-piece inner shield usable in a plasma sputter reactor and extending from the target to the pedestal with a smooth inner surface and supported by an annular flange in a middle portion of the shield. The shield may be used to support the RF coil used in exciting the plasma. An outer shield includes an outwardly extending flange on its end alignable with the inner shield flange, holes in correspondence to recesses in the inner shield for standoffs for the RF coil, and circumferentially arranged gas flow holes.Type: ApplicationFiled: May 5, 2005Publication date: September 15, 2005Inventors: Tza-Jing Gung, Xianmin Tang, John Forster, Peijun Ding, Marc Schweitzer, Keith Miller, Ilya Lavitsky
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Publication number: 20040173162Abstract: A semiconductor processing chamber having a motorized lid is provided. In one embodiment, the semiconductor processing chamber generally includes a chamber body having sidewalls and a bottom defining an interior volume. A lid assembly is coupled to the chamber body and is movable between a first position that encloses the interior volume and a second position. A hinge assembly thereto is coupled between the lid assembly and the chamber body. A motor is coupled to the hinge assembly to facilitate moving the lid assembly between the first position and the second position.Type: ApplicationFiled: March 19, 2004Publication date: September 9, 2004Applicant: Applied Materials, Inc.Inventors: Michael Rosenstein, Alex Shenderovich, Marc O. Schweitzer, Ilya Lavitsky, Alvin Lau, Michael Feltsman
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Patent number: 6776848Abstract: A semiconductor processing chamber having a motorized lid is provided. In one embodiment, the semiconductor processing chamber generally includes a chamber body having sidewalls and a bottom defining an interior volume. A lid assembly is coupled to the chamber body and is movable between a first position that encloses the interior volume and a second position. A hinge assembly thereto is coupled between the lid assembly and the chamber body. A motor is coupled to the hinge assembly to facilitate moving the lid assembly between the first position and the second position.Type: GrantFiled: January 17, 2002Date of Patent: August 17, 2004Assignee: Applied Materials, Inc.Inventors: Michael Rosenstein, Alex Shenderovich, Marc O. Schweitzer, Ilya Lavitsky, Alvin Lau, Michael Feltsman
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Patent number: 6730174Abstract: An apparatus for replacing consumables of a vacuum chamber. A unitary removable shield assembly is provided to quickly replace consumables such as a shield. The shield assembly can include an upper adapter assembly, at least one shield member, a cover ring and an insulator member. The shield assembly is designed so that the consumables can be replaced in one step and allows the chamber to continue with its maintenance cycle.Type: GrantFiled: March 6, 2002Date of Patent: May 4, 2004Assignee: Applied Materials, Inc.Inventors: Alan B. Liu, Ilya Lavitsky, Michael Rosenstein
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Publication number: 20040055880Abstract: One aspect of the invention includes an auxiliary magnet ring positioned outside of the chamber wall of a plasma sputter reactor and being disposed at least partially radially outwardly of an RF coil used to inductively generate a plasma, particularly for sputter etching the substrate being sputter deposited. Thereby, a magnetic barrier prevents the plasma from leaking outwardly to the coil and improves the uniformity of sputter etching. The magnetic field also acts as a magnetron when the coil, when made of the same material as the primary target, is being used as a secondary target. Another aspect of the invention includes a one-piece inner shield extending from the target to the pedestal with a smooth inner surface and supported by an annular flange in a middle portion of the shield. The shield may be used to support the RF coil.Type: ApplicationFiled: June 26, 2003Publication date: March 25, 2004Applicant: APPLIED MATERIALS, INC.Inventors: Tza-Jing Gung, Xianmin Tang, John Forster, Peijun Ding, Marc Schweitzer, Keith A. Miller, Ilya Lavitsky
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Patent number: 6688838Abstract: A cleanroom lift for maneuvering large objects such as turbomolecular pumps utilized in semiconductor processing applications is provided. In one embodiment, the lift includes a vertically movable carriage coupled to a linkage assembly. The linkage assembly has a first link and a second link. Each link has one piece construction to minimize deflection under load. The first link is coupled to the carriage by a carriage shaft assembly and to the second link by a linkage shaft assembly. The second link is coupled to the linkage shaft assembly and a gripper assembly. Optionally, a third link and second shaft assembly may be disposed between the gripper assembly and the second link to minimize the weight of the links to facilitate assembly in cleanroom environments.Type: GrantFiled: March 4, 2002Date of Patent: February 10, 2004Assignee: Applied Materials, Inc.Inventors: Ilya Lavitsky, Michael Rosenstein