Abstract: An analysis apparatus includes a plasma generation unit and an optical analysis unit. The plasma generation unit generates initial plasma by momentarily energizing a target substance to be turned into a plasma state, and maintains the target substance in the plasma state by irradiating the initial plasma with an electromagnetic wave for a predetermined period of time. The optical analysis unit identifies the target substance based on information with respect to emission intensity during a period from when the emission intensity reaches a peak due to the initial plasma until when the emission intensity increases and reaches approximately a constant value due to electromagnetic wave plasma maintained by the electromagnetic wave, or information with respect to emission intensity after the electromagnetic wave irradiation is terminated.

Abstract: The analysis apparatus 10 includes a plasma generation device 11 and an optical analysis device 13. The plasma generation device 11 generates initial plasma by energizing a substance in space to be turned into a plasma state, and maintains the plasma state by irradiating the initial plasma with electromagnetic wave for a predetermined period of time. Then, the optical analysis device 13 analyzes the target substance 15 based on a time integral value of intensity of emission from the target substance 15 in an electromagnetic wave plasma region, which is maintained by the electromagnetic wave.

Abstract: The plasma generation device 30 is provided with a high frequency generation device 37 that generates a high frequency wave, and a high frequency radiator 15 that radiates the high frequency wave outputted from the high frequency generation device 37 to a target space 10, and generates plasma by supplying energy of the high frequency wave to the target space 10. In the plasma generation device 30, the high frequency generation device 37 is provided with an oscillator 41 that oscillates a high frequency wave, and an amplifier 42 that amplifies and outputs the high frequency wave oscillated by the oscillator 41 to the high frequency radiator 15. In the high frequency generating device 37 the amplifier 42 alone is integrated with the high frequency radiator 15, from among the oscillator 41 and the amplifier 42.

Abstract: In order to provide an ignition control device 30 which can efficiently control timing of thermal ignition of gaseous mixture in a combustion region 10, the peak estimation part 32, the ignition timing determination part 33, the control timing determination part 34, and the plasma control part 35 control timing of thermal ignition of the gaseous mixture in the combustion region 10 by controlling the pulse generator 36, the electromagnetic wave oscillator 37, the mixer circuit 38, and the spark plug 15 so as to increase the amount of OH radicals in the combustion region 10 during a low-temperature oxidation preparation period that occurs prior to a peak of a heat release rate before the thermal ignition of the gaseous mixture.