Patents by Inventor Imran Hasim

Imran Hasim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pressure modulation method to obtain improved step coverage of seed layer
    Publication number: 20030066747
    Abstract: A multi-step process for the deposition of a material into high aspect ratio features on a substrate surface is provided. The process involves depositing a material on the substrate at a first pressure for a first period of time and then depositing the material on the substrate at a second pressure for a second period of time. Modulation of the pressure influences the ionization and trajectory of the particles, which are ionized in a plasma environment. The method of the invention in one aspect allows for optimum deposition at the bottom of a high aspect ratio feature during a high pressure step and increased deposition on the sidewalls of the feature during at least a low pressure step.
    Type: Application
    Filed: September 30, 2002
    Publication date: April 10, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Arvind Sundarrajan, Darryl Angelo, Peiijun Ding, Barry Chin, Imran Hasim
  • Pressure modulation method to obtain improved step coverage of seed layer
    Patent number: 6458251
    Abstract: A multi-step process for the deposition of a material into high aspect ratio features on a substrate surface is provided. The process involves depositing a material on the substrate at a first pressure for a first period of time and then depositing the material on the substrate at a second pressure for a second period of time. Modulation of the pressure influences the ionization and trajectory of the particles, which are ionized in a plasma environment. The method of the invention in one aspect allows for optimum deposition at the bottom of a high aspect ratio feature during a high pressure step and increased deposition on the sidewalls of the feature during at least a low pressure step.
    Type: Grant
    Filed: November 16, 1999
    Date of Patent: October 1, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Arvind Sundarrajan, Darryl Angelo, Peijun Ding, Barry Chin, Imran Hasim