Abstract: An amine oxide type surfactant, which has excellent compatibility with an anionic or non-ionic surfactant having excellent detergency and shows excellent detergency and softening effect, is represented by the following formula 1: wherein R1 and R2 are the same or different, and each independently represents a C8˜C22 linear or branched alkyl or alkenyl group; A represents a C1˜C4 alkyl, alkenyl or hydroxyalkyl group; X represents OH, a C1˜C4 alkyl, hydroxyalkyl, (CH2CH2O)nH, (CHCH3CH2O)nH or a combination of (CH2CH2O)nH and (CHCH3CH2O)nH; and n is a number of 1˜30.

Abstract: The present invention provides a bleach activator which is at least one macrocyclic manganese complex selected from the group consisting of [MnIII(rac-14-decane)X2]Y, [MnIII(mes-14-decane)X2]Y.H2O and [MnIII(mes-14-decane)X2]Y represented by Formulas 1-3, as well as a preparation method thereof. Also, the invention provides a bleaching composition and bleaching detergent composition comprising the bleach activator. The bleach activator comprising the manganese complex is used in a granulated form. wherein X is at least one selected from chlorine (—Cl) and acetate (—OOCCH3), and Y is an anion selected from Cl?, Br?, F?, NO3?, ClO4?, OH?, NCS?, N3?, and PF6?.

Abstract: Methods for manufacturing a semiconductor device are disclosed. One example method includes transferring and loading a substrate with a photoresist pattern thereon in an etching apparatus; setting the temperature of the substrate to a temperature suitable for an etching process by passing the substrate through at least one predetermined chamber; and loading the substrate in an etching chamber and performing an etching process.