Abstract: The present invention relates to a composition for treating inflammatory diseases comprising germanium telluride nanosheets coated with polyvinylpyrrolidone, and the nanosheets have excellent anti-inflammatory and thus are excellent in treating inflammatory bowel disease and psoriasis.

Abstract: A method of manufacturing a pellicle for an extreme ultraviolet exposure includes forming a graphite-containing layer on a catalyst substrate; surface-treating a first surface of the graphite-containing layer to form a first treatment layer; and forming a first passivation layer on the first treatment layer, wherein the forming of the first treatment layer includes removing a C—O—C bond included in the graphite-containing layer through the surface-treating of the first surface.

Abstract: A method of fabricating a pellicle structure includes forming a metal layer on a temporary substrate, forming a membrane on the metal layer, exposing a bottom surface of the metal layer by separating the temporary substrate from the metal layer, and exposing a bottom surface of the membrane by etching the exposed bottom surface of the metal layer.

Abstract: A method for manufacturing a pellicle according to the technical idea of the present invention includes preparing a support substrate, forming a catalyst layer including nickel (Ni) in which one selected from a (110) plane and a (100) plane is a dominant crystal plane, on the support substrate, and performing a chemical vapor deposition process on the catalyst layer at about 1050° C. or less to form a membrane having a graphite layer.

Abstract: An image forming apparatus includes a developing device to contain a developer, the developer including a toner; a developer cartridge to supply the developer to the developing device; a toner concentration sensor to sense a toner concentration of the toner included in the developer contained in the developing device; and a controller. The controller controls, during a non-printing operation a sensor control voltage to adjust an output level of the toner concentration sensor, to control an output of the toner concentration sensor to satisfy a controlling condition, and detects an shape of the output of the toner concentration sensor after the controller controls the sensor control voltage to adjust the output level.

Abstract: A method of manufacturing a pellicle includes preparing a pellicle frame having an adhesive layer coated thereon, treating a pellicle membrane with vapor under vapor atmosphere, attaching the pellicle membrane onto the pellicle frame, and drying the pellicle membrane.

Abstract: An image forming apparatus includes a developing device to contain a developer, the developer including a toner; a developer cartridge to supply the developer to the developing device; a toner concentration sensor to sense a toner concentration of the toner included in the developer contained in the developing device; and a controller. The controller controls, during a non-printing operation a sensor control voltage to adjust an output level of the toner concentration sensor, to control an output of the toner concentration sensor to satisfy a controlling condition, and detects an shape of the output of the toner concentration sensor after the controller controls the sensor control voltage to adjust the output level.

Abstract: A method of manufacturing a pellicle includes preparing a pellicle frame having an adhesive layer coated thereon, treating a pellicle membrane with vapor under vapor atmosphere, attaching the pellicle membrane onto the pellicle frame, and drying the pellicle membrane.

Abstract: A method of manufacturing a pellicle includes preparing a pellicle frame having an adhesive layer coated thereon, treating a pellicle membrane with vapor under vapor atmosphere, attaching the pellicle membrane onto the pellicle frame, and drying the pellicle membrane.

Abstract: A dry eye syndrome alert system through posture and work detection, includes: a data collecting unit configured to detect a posture of a user to collect posture data of the user and preprocess the posture data; an eye blink frequency calculating unit configured to identify a posture change of the user on the basis of the posture data, calculate a motion variability on the basis of the posture change, and estimate an eye blink frequency of the user on the basis of the motion variability; and a diagnosis and alert output unit configured to store data regarding the estimated eye blink frequency, compare the estimated eye blink frequency with a preset reference value, and output an alert to the user when the estimated eye blink frequency is less than or equal to the preset reference value.

Abstract: An embodiment of the present invention discloses a method and apparatus for managing display. A method of managing display according to an embodiment of the present invention may include: obtaining display device information including an operation state and a maximum display resolution of each of one or more connection display devices that are sensed to be connected; detecting one or more operation display devices that are operating display devices from among the one or more connection display devices, by referring to the display device information; and determining a resource allocation coefficient of each of the one or more operation display devices, based on at least one of a maximum display resolution of each of the one or more operation display devices and a number of display channels of each of the one or more operation display devices.

Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.

Abstract: A dry eye syndrome alert system through posture and work detection, includes: a data collecting unit configured to detect a posture of a user to collect posture data of the user and preprocess the posture data; an eye blink frequency calculating unit configured to identify a posture change of the user on the basis of the posture data, calculate a motion variability on the basis of the posture change, and estimate an eye blink frequency of the user on the basis of the motion variability; and a diagnosis and alert output unit configured to store data regarding the estimated eye blink frequency, compare the estimated eye blink frequency with a preset reference value, and output an alert to the user when the estimated eye blink frequency is less than or equal to the preset reference value.

Abstract: A method for fabricating a semiconductor device includes forming a pellicle including an amorphous carbon layer, attaching the pellicle onto a reticle, and forming a photoresist pattern by utilizing EUV light transmitted through the pellicle and reflected by the reticle. The forming the pellicle includes forming a first dielectric layer on a first side of the substrate, forming the amorphous carbon layer on the first dielectric layer, forming a second dielectric layer on a second side of the substrate opposite to the first side of the substrate, etching the second dielectric layer overlapping the first region of the substrate to form a mask pattern, and forming a support including the second region of the substrate and the remaining part of the first dielectric layer. The forming the support includes etching the first region of the substrate and the first dielectric layer on the first region.

Abstract: A method of manufacturing a pellicle includes preparing a pellicle frame having an adhesive layer coated thereon, treating a pellicle membrane with vapor under vapor atmosphere, attaching the pellicle membrane onto the pellicle frame, and drying the pellicle membrane.

Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.

Abstract: A method of manufacturing a pellicle assembly, the method including attaching a carbon-containing thin film onto a transfer membrane in a wet atmosphere; attaching the carbon-containing thin film to a pellicle frame in a dry atmosphere while the carbon-containing thin film is attached onto the transfer membrane; and separating the transfer membrane from the carbon-containing thin film while the carbon-containing thin film is attached to the pellicle frame.

Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.

Abstract: An embodiment of the present invention discloses a method and apparatus for managing display. A method of managing display according to an embodiment of the present invention may include: obtaining display device information including an operation state and a maximum display resolution of each of one or more connection display devices that are sensed to be connected; detecting one or more operation display devices that are operating display devices from among the one or more connection display devices, by referring to the display device information; and determining a resource allocation coefficient of each of the one or more operation display devices, based on at least one of a maximum display resolution of each of the one or more operation display devices and a number of display channels of each of the one or more operation display devices.

Abstract: A method for fabricating a semiconductor device includes forming a pellicle including an amorphous carbon layer, attaching the pellicle onto a reticle, and forming a photoresist pattern by utilizing EUV light transmitted through the pellicle and reflected by the reticle. The forming the pellicle includes forming a first dielectric layer on a first side of the substrate, forming the amorphous carbon layer on the first dielectric layer, forming a second dielectric layer on a second side of the substrate opposite to the first side of the substrate, etching the second dielectric layer overlapping the first region of the substrate to form a mask pattern, and forming a support including the second region of the substrate and the remaining part of the first dielectric layer. The forming the support includes etching the first region of the substrate and the first dielectric layer on the first region.