Patents by Inventor In Chan Baek

In Chan Baek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7633468
    Abstract: This document relates to a display apparatus, and more particularly, to an image processing apparatus and method of a plasma display panel. An image processing apparatus of a plasma display panel according to an embodiment of the present invention comprises an inverse gamma correction unit that gamma-corrects an image signal through previous stored gamma data, a half-toning unit that adds an error diffusion error value (Ei) of neighboring pixels to a noise value (n(i, j)) of a predetermined pattern and diffuses the added result into the inverse gamma corrected image signal, and a sub-field mapping unit that maps the half-toned image signal to a sub-field mapping table.
    Type: Grant
    Filed: December 29, 2005
    Date of Patent: December 15, 2009
    Assignee: LG Electronics Inc.
    Inventor: Seung Chan Baek
  • Publication number: 20090291044
    Abstract: Provided is a process which includes slowly adding dropwise chilled distilled water to titanium tetrachloride to prepare solution of titanium oxychloride; adding basic solution thereto to maintain pH of the titanium oxychloride solution within a range from 3.5 to 4, thereby providing a suspension of titanium oxyhydroxide precipitate; adding basic solution thereto to adjust the suspension of titanium oxyhydroxide precipitate to be weakly basic, and heating and stirring the mixture at 80 to 100° C.; isolating and collecting dihydroxy-oxotitanium from the heated and stirred suspension of titanium oxyhydroxide precipitate, and washing it with weakly basic aqueous solution; and adding distilled water and 20 to 500 folds of hydrogen peroxide on the basis of 1 mole of Ti4+ in titanium oxyhydroxide to the washed titanium oxyhydroxide, and heat-treating the mixture at a temperature of 90 to 100° C. for 1 to 7 days to prepare titania nanorods having the mean length of 100 nm to 300 nm.
    Type: Application
    Filed: May 26, 2009
    Publication date: November 26, 2009
    Applicant: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY
    Inventors: Sang Il Seok, In Chan Baek, Jeong Ah Chang
  • Patent number: 7397445
    Abstract: The present invention relates to a plasma display panel, and more particularly, to a method of displaying the gray scale in a plasma display panel. According to the present invention, a method of displaying gray scales in a plasma display panel having an inverse gamma correction unit that operates using gamma tables includes the steps of allowing the inverse gamma correction unit to match picture signals, which corresponds to an n number of frames (n is a natural number) respectively, to an n number of previously stored gamma tables, allowing the inverse gamma correction unit to perform an inverse gamma process on the picture signals received according to the matched gamma tables to produce real gray scales every frame, and allowing the inverse gamma correction unit to divide the real gray scales every frame by n and then to produce last real gray scales. More fine gray scales can be represented by extending the number of real gray scales. It is thus possible to remove noise and provide a much smooth image.
    Type: Grant
    Filed: December 28, 2004
    Date of Patent: July 8, 2008
    Assignee: LG Electronics Inc.
    Inventor: Seung Chan Baek
  • Publication number: 20080018561
    Abstract: A driving device of a plasma display panel and a method of driving the plasma display panel are disclosed. A method of driving a plasma display panel receiving a video signal and displaying an image on the screen includes performing an inverse-gamma correction process on the video signal, calculating an occupation proportion of a maximum gray level of the video signal in a histogram of the video signal using location information of an object displayed on the screen, calculating a motion proportion of the video signal, and calculating an average picture level (APL) of the video signal.
    Type: Application
    Filed: July 20, 2007
    Publication date: January 24, 2008
    Inventors: Byungsoo Song, Seung Chan Baek, Tae-Ok Ha, Seonghak Moon
  • Publication number: 20060169201
    Abstract: In a gas supplying apparatus used to form a layer on a substrate, a liquid reactant is introduced into an atomizer through a liquid mass flow controller and an on-off valve. An aerosol mist formed by the atomizer is introduced into a vaporizer and then vaporized. The on-off valve is coupled with the atomizer and controlled by a valve controller of the liquid mass flow controller. The on-off valve is opened to form the layer and closed during downtime of a layer formation apparatus to prevent leakage of the remaining liquid reactant in a connecting conduit between the liquid mass flow controller and the on-off valve.
    Type: Application
    Filed: February 1, 2006
    Publication date: August 3, 2006
    Inventors: Wan-Goo Hwang, Seung-Ki Chae, Myeong-Jin Kim, Seoung-Chang Baek, Sung-Wook Park, Un-Chan Baek, Hyun-Wook Lee, Kyoung-Ho Jang, Seong-Ju Choi, Il-Kyoung Kim
  • Publication number: 20060020458
    Abstract: Disclosed herein is a similar speaker recognition method and system using nonlinear analysis. The recognition method extracts a nonlinear feature of a sound signal through nonlinear analysis of the sound signal and combines the nonlinear feature with a linear feature such as spectrum. The method transforms sound data in a time domain into status vectors in a phase domain and uses a nonlinear time series analysis method capable of representing nonlinear features of the status vectors to extract nonlinear information of a sound. The method can overcome technical limitations of conventional linear algorithms. The recognition method can be applied to sound-related application systems other than speaker recognition systems.
    Type: Application
    Filed: December 10, 2004
    Publication date: January 26, 2006
    Inventors: Young-Hun Kwon, Kun-Sang Lee, Sung-Il Yang, Sung-Wook Chang, Jung-Pa Seo, Min-Su Kim, In-Chan Baek
  • Publication number: 20050206587
    Abstract: The present invention relates to a plasma display apparatus, and more particularly, to a plasma display apparatus for expressing images by processing input image signals and an image processing method thereof. The plasma display apparatus for expressing images by processing image signals comprises: an inverse gamma correction unit linearly transforming a luminance value depending on the gray scale of an image signal by inverse gamma correction of input image signal data; and a halftoning unit masking at least two dither mask patterns in random order with respect to the inverse gamma corrected image signal data.
    Type: Application
    Filed: March 15, 2005
    Publication date: September 22, 2005
    Inventor: Seung Chan Baek
  • Patent number: 6808652
    Abstract: A modified ⊖-Al2O3-supported nickel reforming catalyst and its use for producing synthesis gas from natural gas, more specifically to a nickel reforming catalyst expressed by the following formula 1, having improved coke resistance, high-temperature catalysis stability and catalytic activity, which is prepared by coating nickel or mixture of nickel and cocatalyst (M1-M2-Ni) on a Al2O3 support modified with metal (M3-M4-ZrO2/⊖-Al2O3), and its use for producing synthesis gas from natural gas through steam reforming, oxygen reforming or steam-oxygen reforming, M1-M2-Ni/M3-M4-ZrO2/⊖-Al2O3  (1) wherein M1 is an alkali metal; each of M2 and M3 is an alkaline earth metal; and M4 is a IIIB element or a lanthanide.
    Type: Grant
    Filed: January 5, 2004
    Date of Patent: October 26, 2004
    Assignees: Korea Research Institute of Chemical Technology, Korea Gas Corporation, Kyoungdong Citygas Co., Ltd.
    Inventors: Sang-Eon Park, Ki-Won Jun, Hyun-Seog Roh, Seung-Chan Baek, Young-Sam Oh, Young-Soon Baek, Ri-Sang Choi, Taek-Yong Song
  • Publication number: 20040142817
    Abstract: The present invention relates to a modified &thgr;-Al2O3-supported nickel reforming catalyst and its use for producing synthesis gas from natural gas, more specifically to a nickel reforming catalyst expressed by the following formula 1, having improved coke resistance, high-temperature catalysis stability and catalytic activity, which is prepared by coating nickel or mixture of nickel and cocatalyst (M1-M2-Ni) on a &thgr;-Al2O3 support modified with metal (M3-M4-ZrO2/&thgr;-Al2O3), and its use for producing synthesis gas from natural gas through steam reforming, oxygen reforming, or steam-oxygen reforming,
    Type: Application
    Filed: January 5, 2004
    Publication date: July 22, 2004
    Applicants: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY, KOREA GAS CORPORATION, KYUNGDONG CITYGAS CO., LTD.
    Inventors: Sang-Eon Park, Ki-Won Jun, Hyun-Seog Roh, Seung-Chan Baek, Young-Sam Oh, Young-Soon Baek, Ri-Sang Choi, Taek-Yong Song
  • Patent number: 6693060
    Abstract: A modified &thgr;-Al2O3-supported nickel reforming catalyst and its use for producing synthesis gas from natural gas, more specifically to a nickel reforming catalyst expressed by the following formula 1, having improved coke resistance, high-temperature catalysis stability and catalytic activity, which is prepared by coating nickel or mixture of nickel and cocatalyst (M1—M2—Ni) on a &thgr;-Al2O3 support modified with metal (M3—M4—ZrO2/&thgr;-Al2O3), and its use for producing synthesis gas from natural gas through steam reforming, oxygen reforming or steam-oxygen reforming, M1—M2—Ni/M3—M4—ZrO2/&thgr;-Al2O3  (1) wherein M1 is an alkali metal, each of M2 and M3 is an alkaline earth metal; and M4 is a IIIB element or a lanthanide.
    Type: Grant
    Filed: May 13, 2002
    Date of Patent: February 17, 2004
    Assignees: Korea Research Institute of Chemical Technology, Korea Gas Corporation, Kyungdong City Gas Co., Ltd.
    Inventors: Sang-Eon Park, Ki-Won Jun, Hyun-Seog Roh, Seung-Chan Baek, Young-Sam Oh, Young-Soon Baek, Ri-Sang Choi, Taek-Yong Song
  • Publication number: 20030032554
    Abstract: The present invention relates to a modified &thgr;-Al2O3-supported nickel reforming catalyst and its use for producing synthesis gas from natural gas, more specifically to a nickel reforming catalyst expressed by the following formula 1, having improved coke resistance, high-temperature catalysis stability and catalytic activity, which is prepared by coating nickel or mixture of nickel and cocatalyst (M1—M2—Ni) on a &thgr;m-Al2O3 support modified with metal (M3—M4—ZrO2/&thgr;-Al2O3), and its use for producing synthesis gas from natural gas through steam reforming, oxygen reforming or steam-oxygen reforming,
    Type: Application
    Filed: May 13, 2002
    Publication date: February 13, 2003
    Applicant: Korea Research Institute Of Chemical Technology
    Inventors: Sang-Eon Park, Ki-Won Jun, Hyun-Seog Roh, Seung-Chan Baek, Young-Sam Oh, Young-Soon Baek, Ri-Sang Choi, Taek-Yong Song