Abstract: The present inventive concept relates to a method for removing impurities in thin film and a substrate processing apparatus. The method for removing impurities in a thin film includes the steps of: providing a substrate having a thin film formed thereon in a process chamber; supplying a first gas reacting and coupling with impurities contained in the thin film, into the process chamber; exhausting a coupled product of the impurities and the first gas by depressurizing an interior of the process chamber after stopping the supply of the first gas; curing the thin film by supplying a second gas being different from the first gas into the process chamber; and stopping the supply of the second gas and exhausting the remaining second gas from the interior of the process chamber.

Abstract: A semiconductor manufacturing equipment may include a process chamber for treating a substrate; a front-end module including a first transfer robot, wherein the first transfer robot may be configured to transport the substrate received in a container; a transfer chamber between the front-end module and the process chamber, wherein the transfer chamber may be configured to load or unload the substrate into or out of the process chamber; and a cassette capable of receiving a replaceable component capable of being used in the process chamber. The front-end module may include a seat plate configured to move in a sliding manner so as to retract or extend into or from the front-end module. The cassette may be configured to be loaded into the front-end module while the cassette is seated on the seat plate.

Abstract: An organic light emitting device including: a substrate; a first electrode; a second electrode; and an organic layer interposed between the first electrode and the second electrode and including an emission layer, wherein one of the first electrode and the second electrode is a reflective electrode and the other is a semitransparent or transparent electrode, and wherein the organic layer includes a layer having at least one of the compounds having at least one carbazole group, and a flat panel display device including the organic light emitting device. The organic light emitting device has low driving voltage, excellent current density, high brightness, excellent color purity, high efficiency, and long lifetime.

Abstract: A mask device includes a mesh mask and a metal mask disposed under the mesh mask. The mesh mask includes a mesh pattern and a plurality of first blocking portions disposed in the mesh pattern to block portions of the mesh pattern, the metal mask includes a plurality of second blocking portions overlapping the first blocking portions in a plan view, and the metal mask is provided with an accommodation opening defined through in the metal mask, and not overlapping the first blocking portions in a plan view.

Abstract: An optical imaging system includes a first lens, a second lens, a third lens, a fourth lens, and a fifth lens sequentially disposed along an optical axis from an object-side surface of the first lens toward an imaging plane of an image sensor, wherein 3.5?TTL/IMG HT, f1+f2|<2.0 mm, and 0.7?L1S1es/L1S1el<1.0 are satisfied, where TTL is a distance along the optical axis from the object-side surface of the first lens to the imaging plane of the image sensor, IMG HT is one-half of a diagonal length of the imaging plane of the image sensor, f1 is a focal length of the first lens, f2 is a focal length of the second lens, L1S1el is a maximum effective radius of the object-side surface of the first lens, and L1S1es is a minimum effective radius of the object-side surface of the first lens.

Abstract: A capsulorhexis device is inserted into an incision site of a cornea to make an incision in an anterior capsule surrounding a crystalline lens. The capsulorhexis device includes a loop having elasticity and conductivity; a moving member having one end fixed and coupled to the loop; an insertion guide configured so that, while the incision is being made in the crystalline lens capsule, a front end thereof is inserted into the incision site of the cornea; and a housing having one end coupled to a rear end of the insertion guide, wherein the loop is housed in the housing and, to make the incision in the crystalline lens capsule, slides in the housing together with the moving member to pass through the insertion guide and be deployed into an anterior chamber of the eye.

Abstract: The present inventive concept relates to a method for removing impurities in thin film and a substrate processing apparatus. The method for removing impurities in a thin film includes the steps of: providing a substrate having a thin film formed thereon in a process chamber; supplying a first gas reacting and coupling with impurities contained in the thin film, into the process chamber; exhausting a coupled product of the impurities and the first gas by depressurizing an interior of the process chamber after stopping the supply of the first gas; curing the thin film by supplying a second gas being different from the first gas into the process chamber; and stopping the supply of the second gas and exhausting the remaining second gas from the interior of the process chamber.

Abstract: A method for manufacturing a white LED is disclosed. The method for manufacturing a white LED comprises a die bonding step in which a blue chip is mounted on a lead frame; a wire bonding step in which the blue chip and lead frame both mounted on the lead frame in the die bonding step are electrically connected by a wire; a first lamp molding step in which a first lamp is formed on the blue chip which is electrically connected with the lead frame in the wire bonding step; a phosphorous material coating step in which a phosphorous material is coated on the first lamp formed in the first lamp molding step; and a second lamp molding step in which a second lamp is formed on the first lamp which is previously coated with the phosphorous material in the phosphorous material coating step.

Abstract: A transfer apparatus installed in a transfer chamber of substrate processing equipment can be precisely calibrated with respect to a substrate support of a process chamber. Also, the calibration can be performed while a vacuum pressure is maintained in the transfer chamber. The tool for calibrating the transfer apparatus includes a base plate and a light source mounted to the base plate. The base plate is mounted to the process chamber, and the light source is positioned and oriented to direct a beam of light onto a reference mark on the substrate support. Then, an end effecter of the transfer apparatus is moved to a transfer position over the substrate support. The end effecter has a reference hole that is aligned with the reference mark when the end effecter is in a centered state relative to the substrate support. The beam of light is used to determine whether the reference hole is aligned with the reference mark.

Abstract: A mask assembly for a color cathode ray tube, has an amount of tension applied to a shadow mask thereof reduced by preventing a main frame for applying tension in the shadow mask from deformation due to creeping during a high temperature process, by regulating the ratios of thickness, width, and height of the main frame to the thickness of the shadow mask. The color cathode ray tube comprises a frame composed of a main frame welded to the shadow mask for supporting the shadow mask toward the panel and a sub-frame supporting said main frame, wherein relations T/t≧45, W/t≧270, and H/t≧270 are satisfied, where t is a thickness of the shadow mask, T is the thickness of part where a main frame is welded to a shadow mask, W is a width of part attached to a sub-frame of a frame, and H is a length of main frame from said shadow mask to the sub-frame.

Abstract: A Cathode Ray Tube (hereinafter, CRT), includes a mask assembly which is composed of a main frame for supporting the shadow mask and a sub frame for supporting the main frame. When the minimum distance between the flat surface extended from the upper surface of the main frame and the flat surface extended from the lower surface of the sub frame is Lb, the height of the sub frame is Ls and the minimum distance between the flat surface extended from the upper surface of the main frame and the flat surface extended from the lower surface of the sub frame, in case the mask is attached to the mask assembly, is La, the following equation, 0.40≦Ls/Lb≦0.55 or 0.45≦(Ls−Lm)/Lb≦0.59 is satisfied and after compression, the following equation, 0.08≦(La−Lb)/(Lb-Lm)≦0.17 is satisfied.

Abstract: A Cathode Ray Tube (hereinafter, CRT), includes a mask assembly which is composed of a main frame for supporting the shadow mask and a sub frame for supporting the main frame. When the minimum distance between the flat surface extended from the upper surface of the main frame and the flat surface extended from the lower surface of the sub frame is Lb, the height of the sub frame is Ls and the minimum distance between the flat surface extended from the upper surface of the main frame and the flat surface extended from the lower surface of the sub frame, in case the mask is attached to the mask assembly, is La, the following equation, 0.40≦Ls/Lb≦0.55 or 0.45≦(Ls−Lm)/Lb≦0.59 is satisfied and after compression, the following equation, 0.08≦(La−Lb)/(Lb-Lm)≦0.17 is satisfied.

Abstract: The present invention relates to a mask assembly for color cathode ray tube (CRT). And, more particularly, the present invention is directed to an mask assembly for color cathode ray tube, wherein a reduction amount of tension applied to a shadow mask is made small by preventing a main frame for applying tension in the shadow mask from deformation due to creeping during a high temperature process, by regulating the ratios of thickness, width, and height of the main frame to the thickness of shadow mask.