Patents by Inventor In-jun Hwang

In-jun Hwang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140328409
    Abstract: The present invention relates to a video decoding system having a compensation function, the video decoding system comprising: one AD converter; a synchronized signal level detector for detecting a synchronized signal level using a digital signal output from the AD converter; a color burst level detector for detecting a color burst level using the digital signal output from the AD converter; a compensation apparatus for compensating the video level and the high frequency components of an analog signal by using information detected by the synchronized signal level detector and the color burst level detector, and for compensating and transmitting a synchronized signal level to the AD converter; and a decoding apparatus for outputting a digital component image signal (YCrCb) using the digital signal output from the AD converter.
    Type: Application
    Filed: July 12, 2012
    Publication date: November 6, 2014
    Applicant: IDENCORE CO., LTD.
    Inventor: In-Jun Hwang
  • Patent number: 8878246
    Abstract: A High electron mobility transistor (HEMT) includes a source electrode, a gate electrode, a drain electrode, a channel forming layer in which a two-dimensional electron gas (2DEG) channel is induced, and a channel supplying layer for inducing the 2DEG channel in the channel forming layer. The source electrode and the drain electrode are located on the channel supplying layer. A channel increase layer is between the channel supplying layer and the source and drain electrodes. A thickness of the channel supplying layer is less than about 15 nm.
    Type: Grant
    Filed: June 2, 2011
    Date of Patent: November 4, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: In-jun Hwang, Jai-kwang Shin, Jae-joon Oh, Jong-seob Kim, Hyuk-soon Choi, Ki-ha Hong
  • Publication number: 20140291728
    Abstract: According to example embodiments, a power device chip includes a plurality of unit power devices classified into a plurality of sectors, a first pad and a second pad. At least one of the first and second pads is divided into a number of pad parts equal to a number of the plurality of sectors. The first pad is connected to first electrodes of the plurality of unit power devices, and the second pad is connected to second electrodes of the plurality of unit power devices. The unit power devices may be diodes. The power device chip may further include third electrodes in the plurality of unit power devices, and a third pad may be connected to the third electrodes. In this case, the unit power devices may be high electron mobility transistors (HEMTs). Pad parts connected to defective sectors may be excluded from bonding.
    Type: Application
    Filed: March 25, 2014
    Publication date: October 2, 2014
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: In-jun HWANG, Jong-seob KIM, Jae-joon OH
  • Patent number: 8847692
    Abstract: Oscillators and method of operating the same are provided, the oscillators include a magnetic layer, and a magnetization fixing element configured to fix a magnetization direction of the magnetic layer. The oscillators generate a signal by using precession of a magnetic moment of the magnetic layer.
    Type: Grant
    Filed: July 1, 2011
    Date of Patent: September 30, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ung-hwan Pi, Sun-ae Seo, Kee-won Kim, In-jun Hwang, Kwang-seok Kim, Sung-chul Lee
  • Publication number: 20140266400
    Abstract: According to example embodiments, a method of operating a power device includes applying a control voltage to a control electrode of the power device, where the control electrode is electrically separated from a source electrode, a drain electrode, and a gate electrode of the power device. The control voltage is separately applied to the control electrode. The method may include applying a negative control voltage to the control electrode prior to applying a gate voltage to the gate electrode.
    Type: Application
    Filed: August 22, 2013
    Publication date: September 18, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: In-jun HWANG, Jong-seob KIM, Soo-Gine CHONG
  • Patent number: 8835985
    Abstract: According to an example embodiment, a power electronic device includes a first semiconductor layer, a second semiconductor layer on a first surface of the first semiconductor layer, and a source, a drain, and a gate on the second semiconductor layer. The source, drain and gate are separate from one another. The power electronic device further includes a 2-dimensional electron gas (2DEG) region at an interface between the first semiconductor layer and the second semiconductor layer, a first insulating layer on the gate and a second insulating layer adjacent to the first insulating layer. The first insulating layer has a first dielectric constant and the second insulating layer has a second dielectric constant less than the first dielectric constant.
    Type: Grant
    Filed: August 12, 2011
    Date of Patent: September 16, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: In-jun Hwang, Jai-kwang Shin, Jae-joon Oh, Jong-seob Kim, Hyuk-soon Choi, Ki-ha Hong
  • Publication number: 20140241703
    Abstract: The present invention relates to an image quality adaptive video security system, a security camera generating an original video signal from a camera sensor, inserting an image quality discrimination signal including image quality information for video to the original video signal and generating a video signal. A DVR system determines whether a video signal from a security camera is transmitted in an analog transmission scheme or in a digital transmission scheme. In the case of the analog transmission scheme, the DVR system decodes the analog video signal to a first digital component video signal and detects image quality information. In a case of the digital transmission scheme, the DVR system converts the digital video signal to a digital second component video signal and detects image quality information.
    Type: Application
    Filed: August 9, 2012
    Publication date: August 28, 2014
    Applicant: IDENCORE CO., LTD.
    Inventor: In-Jun Hwang
  • Patent number: 8816396
    Abstract: According to an example embodiment, a high electron mobility transistor (HEMT) includes a substrate, a buffer layer on the substrate, a channel layer on the buffer layer, and a barrier structure on the channel layer. The buffer layer includes a 2-dimensional electron gas (2DEG). A polarization of the barrier structure varies in a region corresponding to a gate electrode. The HEMT further includes and the gate electrode, a source electrode, and a drain electrode on the barrier structure.
    Type: Grant
    Filed: August 31, 2011
    Date of Patent: August 26, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: In-jun Hwang, Jong-seob Kim, Hyuk-soon Choi, Ki-ha Hong, Jai-kwang Shin, Jae-joon Oh
  • Patent number: 8803565
    Abstract: A power device includes a switching device having a control terminal and an output terminal; and a driving circuit configured to provide a driving voltage to the control terminal such that a voltage between the control terminal and the output terminal remains less than or equal to a critical voltage. A rise time required for the driving voltage to reach a target level is determined according to current-voltage characteristics of the switching device. And, when the voltage between the control terminal and the output terminal exceeds the critical voltage, leakage current is generated between the control terminal and the output terminal.
    Type: Grant
    Filed: March 15, 2011
    Date of Patent: August 12, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ho-jung Kim, Jae-kwang Shin, Jae-joon Oh, Jong-seob Kim, Hyuk-soon Choi, In-jun Hwang, Ki-ha Hong
  • Patent number: 8796737
    Abstract: High electron mobility transistors (HEMTs) and methods of manufacturing the same. A HEMT may include a channel layer and a channel supply layer, and the channel supply layer may be a multilayer structure. The channel supply layer may include an etch stop layer and an upper layer on the etch stop layer. A recess region may be in the upper layer. The recess region may be a region recessed to an interface between the upper layer and the etch stop layer. A gate electrode may be on the recess region.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: August 5, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: In-jun Hwang, Jai-kwang Shin, Jae-joon Oh, Jong-bong Ha, Hyuk-soon Choi, Ki-ha Hong
  • Patent number: 8785944
    Abstract: A high electron mobility transistor (HEMT) according to example embodiments includes a first semiconductor layer, a second semiconductor layer on the first semiconductor layer, and a reverse diode gate structure on the second semiconductor layer. A source and a drain may be on at least one of the first semiconductor layer and the second semiconductor layer. A gate electrode may be on the reverse diode gate structure.
    Type: Grant
    Filed: December 6, 2012
    Date of Patent: July 22, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: In-jun Hwang, Jae-joon Oh, Jae-won Lee, Hyo-ji Choi, Jong-bong Ha
  • Publication number: 20140151749
    Abstract: According to example embodiments, a high electron mobility transistor (HEMT) includes a channel layer; a channel supply layer on the channel layer; a source electrode and a drain electrode spaced apart from each other on one of the channel layer and the channel supply layer; a gate electrode on a part of the channel supply layer between the source electrode and the drain electrode; a first depletion-forming layer between the gate electrode and the channel supply layer; and a at least one second depletion-forming layer on the channel supply layer between the gate electrode and the drain electrode. The at least one second depletion-forming layer is electrically connected to the source electrode.
    Type: Application
    Filed: November 27, 2013
    Publication date: June 5, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Woo-chul JEON, Jong-seob KIM, Ki-yeol PARK, Young-hwan PARK, Jai-kwang SHIN, Jae-joon OH, Hyuk-soon CHOI, In-jun HWANG
  • Publication number: 20140147973
    Abstract: A method of packaging power devices at a wafer level is disclosed. The method includes preparing a wafer having a plurality of nitride power devices thereon, each of the plurality of nitride power devices having a plurality of electrodes thereon; forming a polymer layer on the plurality of nitride power devices; exposing each of the electrodes from the polymer layer; forming a solder bump on the exposed electrodes; forming a molding layer covering the solder bump on the polymer layer; and removing the wafer and exposing the solder bump.
    Type: Application
    Filed: July 10, 2013
    Publication date: May 29, 2014
    Inventors: Hyuk-soon CHOI, Hong-Pyo HEO, Jong-seob KIM, Jai-kwang SHIN, Jae-joon OH, In-jun HWANG
  • Publication number: 20140097470
    Abstract: According to example embodiments, a HEMT includes a channel supply layer on a channel layer, a p-type semiconductor structure on the channel supply layer, a gate electrode on the p-type semiconductor structure, and source and drain electrodes spaced apart from two sides of the gate electrode respectively. The channel supply layer may have a higher energy bandgap than the channel layer. The p-type semiconductor structure may have an energy bandgap that is different than the channel supply layer. The p-type semiconductor structure may include a hole injection layer (HIL) on the channel supply layer and be configured to inject holes into at least one of the channel layer and the channel supply in an on state. The p-type semiconductor structure may include a depletion forming layer on part of the HIL. The depletion forming layer may have a dopant concentration that is different than the dopant concentration of the HIL.
    Type: Application
    Filed: June 5, 2013
    Publication date: April 10, 2014
    Inventors: Jong-seob KIM, Kyoung-yeon KIM, Joon-yong KIM, Jai-kwang SHIN, Jae-joon OH, Hyuk-soon CHOI, Jong-bong HA, Sun-kyu HWANG, In-jun HWANG
  • Patent number: 8681542
    Abstract: A magnetic memory device includes: a free layer for storing information; and a reference layer disposed on a first surface of the free layer. The reference layer includes at least two magnetic domains and a magnetic domain wall between the at least two magnetic domains. The reference layer extends past both ends of the free layer. The magnetic memory device further includes a switching element connected to a second surface of the free layer. Another magnetic memory device includes: a first reference layer having a first magnetic domain wall; a second reference layer having a second magnetic domain wall; and a memory structure between the first and second reference layers. The memory structure includes: a first free layer adjacent to the first reference layer; a second free layer adjacent to the second reference layer; and a switching element between the first and second free layers.
    Type: Grant
    Filed: July 11, 2013
    Date of Patent: March 25, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: In-jun Hwang
  • Publication number: 20140027779
    Abstract: According to example embodiments, a high electron mobility transistor includes: a channel layer including a 2-dimensional electron gas (2DEG); a contact layer on the channel layer; a channel supply layer on the contact layer; a gate electrode on a portion of the channel layer; and source and drain electrodes on at least one of the channel layer, the contact layer, and the channel supply layer. The contact layer is configured to form an ohmic contact on the channel layer. The contact layer is n-type doped and contains a Group III-V compound semiconductor. The source electrode and the drain electrode are spaced apart from opposite sides of the gate electrode.
    Type: Application
    Filed: July 29, 2013
    Publication date: January 30, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: In-jun HWANG, Hyo-ji CHOI, Jong-seob KIM, Jae-joon OH
  • Publication number: 20140021511
    Abstract: A high electron mobility transistor (HEMT) according to example embodiments includes a channel layer, a channel supply layer on the channel layer, a source electrode and a drain electrode on at least one of the channel layer and the channel supply layer, a gate electrode between the source electrode and the drain electrode, and a Schottky electrode forming a Schottky contact with the channel supply layer. An upper surface of the channel supply layer may define a Schottky electrode accommodation unit. At least part of the Schottky electrode may be in the Schottky electrode accommodation unit. The Schottky electrode is electrically connected to the source electrode.
    Type: Application
    Filed: March 14, 2013
    Publication date: January 23, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Woo-chul JEON, Kyoung-yeon KIM, Jong-seob KIM, Joon-yong KIM, Ki-yeol PARK, Young-hwan PARK, Jai-kwang SHIN, Jae-joon OH, Hyuk-soon CHOI, Jong-bong HA, Sun-kyu HWANG, In-jun HWANG
  • Publication number: 20130307026
    Abstract: According to example embodiments, High electron mobility transistors (HEMTs) may include a discontinuation region in a channel region. The discontinuation region may include a plurality of 2DEG unit regions that are spaced apart from one another. The discontinuation region may be formed at an interface between two semiconductor layers or adjacent to the interface. The discontinuation region may be formed by an uneven structure or a plurality of recess regions or a plurality of ion implantation regions. The plurality of 2DEG unit regions may have a nanoscale structure. The plurality of 2DEG unit regions may be formed in a dot pattern, a stripe pattern, or a staggered pattern.
    Type: Application
    Filed: January 29, 2013
    Publication date: November 21, 2013
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sun-kyu HWANG, Jai-kwang SHIN, Hyuk-soon CHOI, Jong-seob KIM, Jae-joon OH, Jong-bong HA, In-jun HWANG, Kyoung-yeon KIM
  • Publication number: 20130294151
    Abstract: A magnetic memory device includes: a free layer for storing information; and a reference layer disposed on a first surface of the free layer. The reference layer includes at least two magnetic domains and a magnetic domain wall between the at least two magnetic domains. The reference layer extends past both ends of the free layer. The magnetic memory device further includes a switching element connected to a second surface of the free layer. Another magnetic memory device includes: a first reference layer having a first magnetic domain wall; a second reference layer having a second magnetic domain wall; and a memory structure between the first and second reference layers. The memory structure includes: a first free layer adjacent to the first reference layer; a second free layer adjacent to the second reference layer; and a switching element between the first and second free layers.
    Type: Application
    Filed: July 11, 2013
    Publication date: November 7, 2013
    Inventor: In-jun HWANG
  • Patent number: 8569769
    Abstract: An Enhancement-mode (E-mode) high electron mobility transistor (HEMT) includes a channel layer with a 2-Dimensional Electron Gas (2DEG), a barrier layer inducing the 2DEG in the channel layer, source and drain electrodes on the barrier layer, a depletion layer on the barrier layer between the source and drain electrodes, and a gate electrode on the depletion layer. The barrier layer is recessed below the gate electrode and the depletion layer covers a surface of the recess and extends onto the barrier layer around the recess.
    Type: Grant
    Filed: July 11, 2011
    Date of Patent: October 29, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: In-jun Hwang, Ki-ha Hong, Jong-seob Kim, Jae-Kwang Shin, Jae-joon Oh, Jong-bong Ha, Hyuk-soon Choi