Abstract: An antenna structure according to an embodiment includes an antenna device including an antenna unit, a circuit board electrically connected to the antenna unit, an insulating layer covering the antenna device and a portion of the circuit board, and an air layer formed between the antenna device and the insulating layer to partially cover the antenna unit.

Abstract: An antenna device according to an aspect includes a dielectric layer, a radiator formed on the dielectric layer, and a transmission line connected to the radiator on the dielectric layer and formed in a mesh structure which is a set of unit cells defined by a plurality of conductive lines. A width of the transmission line may be an integer multiple of the width of the unit cell, and may be within an allowable error range.

Abstract: An antenna structure according to an embodiment of the present invention includes a first antenna unit including a first radiator, a first transmission line connected to the first radiator, and a guide pattern disposed around the first transmission line and separated from the first transmission line, a second antenna unit at least partially covered by the guide pattern of the first antenna unit in a plan view, and a dielectric layer interposed between the first antenna unit and the second antenna unit. An antenna structure implementing low-frequency and high-frequency properties with high reliability is provided.

Abstract: The present disclosure relates to an antenna element including: a dielectric layer; a radiation electrode arranged on an upper surface of the dielectric layer and including a first mesh structure; and a dummy electrode arranged on the upper surface of the dielectric layer and including a second mesh structure, in which at least one of the radiation electrode and the dummy electrode satisfies Equation 1, and an image display device including the same.

Abstract: A thinner composition includes propyleneglycol alkylether acetate, cycloketone, and methyl 2-hydroxy isobutyrate. The thinner composition has excellent EBR, RRC, and rework properties, as well as effects of improving photoresist application uniformity, and in particular, exhibiting excellent solubility to photoresist having a high polarity, so as to be applicable to various photoresists.

Abstract: A thinner composition includes propyleneglycol C1-C10 alkylether, C1-C10 alkyl C1-C10 alkoxy propionate, and C1-C10 alkyl lactate, thereby is it possible to improve applicability of a photoresist while remarkably reducing an amount of the used photoresist, as well as having excellent solubility and EBR property to various photoresists, BARCs and underlayers.

Abstract: A thinner composition includes propyleneglycol alkylether acetate, cycloketone, and methyl 2-hydroxy isobutyrate. The thinner composition has excellent EBR, RRC, and rework properties, as well as effects of improving photoresist application uniformity, and in particular, exhibiting excellent solubility to photoresist having a high polarity, so as to be applicable to various photoresists.

Abstract: Provided are a thinner composition for improving coating property of a resist and for removing the same, which includes 10 to 80 wt. % of alkyl (with 1 to 5 carbon atoms) 2-hydroxyisobutyrate, 20 to 90 wt. % of propyleneglycol alkyl (with 1 to 5 carbon atoms)ether acetate, and 10 to 1000 ppm of a surfactant represented by Formula 1 to a total weight of the alkyl 2-hydroxyisobutyrate and propyleneglycol alkylether acetate, so as to achieve excellent solubility to various photoresists and bottom anti-reflective coatings (BARC) and high edge bead removing (EBR) performance, possibly be employed in a process for recycling photoresist-coated wafers, and remarkably improve coating property of the photoresist, and a method for manufacturing a semiconductor device or a thin film transistor liquid crystal display device including removal of the photoresist by using the above-described thinner composition.

Abstract: A thinner composition includes propyleneglycol C1-C10 alkylether, C1-C10 alkyl C1-C10 alkoxy propionate, and C1-C10 alkyl lactate, thereby is it possible to improve applicability of a photoresist while remarkably reducing an amount of the used photoresist, as well as having excellent solubility and EBR property to various photoresists, BARCs and underlayers.

Abstract: Provided are a thinner composition for improving coating property of a resist and for removing the same, which includes 10 to 80 wt. % of alkyl (with 1 to 5 carbon atoms) 2-hydroxyisobutyrate, 20 to 90 wt. % of propyleneglycol alkyl (with 1 to 5 carbon atoms)ether acetate, and 10 to 1000 ppm of a surfactant represented by Formula 1 to a total weight of the alkyl 2-hydroxyisobutyrate and propyleneglycol alkylether acetate, so as to achieve excellent solubility to various photoresists and bottom anti-reflective coatings (BARC) and high edge bead removing (EBR) performance, possibly be employed in a process for recycling photoresist-coated wafers, and remarkably improve coating property of the photoresist, and a method for manufacturing a semiconductor device or a thin film transistor liquid crystal display device including removal of the photoresist by using the above-described thinner composition.

Abstract: An ink composition, and a method of forming a pattern, a color filter and a method of manufacturing the color filter using the same. The ink composition includes a binder resin, a multifunctional monomer having an ethylenic unsaturated double bond, a coloring agent, a polymerization initiator containing a certain positive ion and a solvent. Therefore, the composition has excellent coating property and chemical resistance and also an improved adhesion to a printing member, and thus the ink composition may be useful in forming a precise micropattern using a roll printing method, particularly a reversed printing method.

Abstract: An ink composition, and a method of forming a pattern, a color filter and a method of manufacturing the color filter using the same. The ink composition includes a binder resin, a multifunctional monomer having an ethylenic unsaturated double bond, a coloring agent, a polymerization initiator containing a certain positive ion and a solvent. Therefore, the composition has excellent coating property and chemical resistance and also an improved adhesion to a printing member, and thus the ink composition may be useful in forming a precise micropattern using a roll printing method, particularly a reversed printing method.