Patents by Inventor Inno Lee

Inno Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7384846
    Abstract: A method of fabricating semiconductor devices. Upon formation of a trench for isolation in a cell region, a hard mask film is used as an etch mask. It is thus possible to prevent attacks of a lower layer due to deformation or loss of the etch mask.
    Type: Grant
    Filed: June 28, 2005
    Date of Patent: June 10, 2008
    Assignee: Hynix Semiconductor Inc.
    Inventor: Inno Lee
  • Publication number: 20060258098
    Abstract: A method of fabricating semiconductor devices. Upon formation of a trench for isolation in a cell region, a hard mask film is used as an etch mask. It is thus possible to prevent attacks of a lower layer due to deformation or loss of the etch mask.
    Type: Application
    Filed: June 28, 2005
    Publication date: November 16, 2006
    Inventor: Inno Lee