Patents by Inventor In-Pil Cha

In-Pil Cha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mass flow controller
    Patent number: 7131456
    Abstract: A mass flow controller includes a base having a passage that allows a fluid to pass through the passage. A first control valve controls a mass flow of a fluid passing through the passage. A second control valve controls a full scale of the mass flow of the fluid. A bypass portion is disposed in the passage through which the fluid passes. A mass flow sensor measures the mass flow of the fluid passing through the bypass portion. The second control valve is connected to the passage adjacent to the bypass portion for controlling the full scale of the mass flow of the fluid passing through the bypass portion.
    Type: Grant
    Filed: February 24, 2004
    Date of Patent: November 7, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung-Ho Kang, Sung-Wook Jung, In-Pil Cha, Cheol-Kyu Yang
  • Furnace for heating a wafer and chemical vapor deposition apparatus having the same
    Publication number: 20050263073
    Abstract: A furnace for heating a wafer is provided comprising a process chamber including a space for processing a plurality of wafers. A heating member is disposed in the process chamber which generates a light and heat for heating the wafers. Moreover, a light blocking member is disposed in the process chamber for preventing the light from being transmitted onto the wafers but which permits the heat to be transmitted onto the wafers for heating the wafers. The furnace can be employed in an apparatus for chemical vapor deposition.
    Type: Application
    Filed: May 6, 2005
    Publication date: December 1, 2005
    Inventors: Sung-Ho Kang, Jae-Chul Lee, Sang-Cheol Ha, In-Pil Cha, Duk-Young Jang, Sung-Bum Park, Cheol-Kyu Yang
  • Mass flow controller
    Publication number: 20040187927
    Abstract: A mass flow controller includes a base having a passage that allows a fluid to pass through the passage. A first control valve controls a mass flow of a fluid passing through the passage. A second control valve controls a full scale of the mass flow of the fluid. A bypass portion is disposed in the passage through which the fluid passes. A mass flow sensor measures the mass flow of the fluid passing through the bypass portion. The second control valve is connected to the passage adjacent to the bypass portion for controlling the full scale of the mass flow of the fluid passing through the bypass portion.
    Type: Application
    Filed: February 24, 2004
    Publication date: September 30, 2004
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Sung-Ho Kang, Sung-Wook Jung, In-Pil Cha, Cheol-Kyu Yang