Patents by Inventor In Soo Yun

In Soo Yun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming a mask pattern for a semiconductor device
    Patent number: 7544447
    Abstract: A method of forming a mask pattern from a design pattern. A method may effectively compensate for pattern distortion resulting from an optical proximity effect (OPE). A method may obtain a precise line width. A method includes a first mask design processing and a second mask design processing.
    Type: Grant
    Filed: November 28, 2006
    Date of Patent: June 9, 2009
    Assignee: Dongbu HiTek Co., Ltd.
    Inventors: In Soo Yun, Gab Hwan Cho
  • METHOD OF FORMING A MASK PATTERN FOR A SEMICONDUCTOR DEVICE
    Publication number: 20070124719
    Abstract: A method of forming a mask pattern from a design pattern. A method may effectively compensate for pattern distortion resulting from an optical proximity effect (OPE). A method may obtain a precise line width. A method includes a first mask design processing and a second mask design processing.
    Type: Application
    Filed: November 28, 2006
    Publication date: May 31, 2007
    Inventors: In Soo Yun, Gab Cho