Patents by Inventor In-Tsang Lin

In-Tsang Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250081356
    Abstract: The present disclosure describes a storage device including a top panel, a bottom panel, a back panel, a front panel, and two side panels configured to form an enclosed volume. The storage device further includes multiple slots disposed at inner surfaces of the two side panels and configured to hold a substrate, a gas diffuser disposed at an inner surface of the back panel and configured to provide a purge gas to the enclosed volume, an isolation gas device disposed on an inner surface of the top panel and adjacent to a top portion of the front panel, and an isolation gas line configured to connect the isolation gas device to the gas diffuser. The isolation gas device is configured to inject the purge gas into a front portion of the storage device and in a direction from the top panel toward the bottom panel.
    Type: Application
    Filed: November 20, 2024
    Publication date: March 6, 2025
    Applicant: Semiconductor Manufacturing Co., Lid.
    Inventors: Shen-Min YANG, Pu Kuan FANG, Jyh-Shiou HSU, Mu-Tsang LIN
  • Publication number: 20250069860
    Abstract: A method for manufacturing a semiconductor structure includes disposing a wafer in a processing chamber, in which the wafer is laterally surrounded by a focus ring. A plasma is formed in the processing chamber to process the wafer. A thickness of the focus ring is detected. A plasma direction of the plasma over a peripheral region of the wafer is adjusted according to the thickness of the focus ring.
    Type: Application
    Filed: November 5, 2024
    Publication date: February 27, 2025
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yu-Lun KE, Yu-Chi LIN, Yi-Tsang HSIEH, Yu-Hsi TANG, Chih-Teng LIAO
  • Patent number: 12237354
    Abstract: Chip packages and methods for forming the same are provided. The method includes providing a substrate having upper and lower surfaces, and having a chip region and a scribe-line region surrounding the chip region. The substrate has a dielectric layer on its upper surface. A masking layer is formed over the substrate to cover the dielectric layer. The masking layer has a first opening exposing the dielectric layer and extending in the extending direction of the scribe-line region to surround the chip region. An etching process is performed on the dielectric layer directly below the first opening, to form a second opening that is in the dielectric layer directly below the first opening. The masking layer is removed to expose the dielectric layer having the second opening. A dicing process is performed on the substrate through the second opening.
    Type: Grant
    Filed: March 1, 2022
    Date of Patent: February 25, 2025
    Assignee: Xintec Inc.
    Inventors: Tsang-Yu Liu, Shu-Ming Chang, Chaung-Lin Lai
  • Patent number: 12193164
    Abstract: The present disclosure describes a storage device including a top panel, a bottom panel, a back panel, a front panel, and two side panels configured to form an enclosed volume. The storage device further includes multiple slots disposed at inner surfaces of the two side panels and configured to hold a substrate, a gas diffuser disposed at an inner surface of the back panel and configured to provide a purge gas to the enclosed volume, an isolation gas device disposed on an inner surface of the top panel and adjacent to a top portion of the front panel, and an isolation gas line configured to connect the isolation gas device to the gas diffuser. The isolation gas device is configured to inject the purge gas into a front portion of the storage device and in a direction from the top panel toward the bottom panel.
    Type: Grant
    Filed: June 21, 2023
    Date of Patent: January 7, 2025
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shen-Min Yang, Pu Kuan Fang, Jyh-Shiou Hsu, Mu-Tsang Lin
  • Patent number: 12096369
    Abstract: A power setting method and an electronic device are provided. The power setting method includes: determining in a situation that, according to an enable signal corresponding to a network sharing function of the electronic device, the network sharing function is enabled; and in response to the network sharing function being enabled, setting an output power of the electronic device according to a first setting mode.
    Type: Grant
    Filed: November 18, 2022
    Date of Patent: September 17, 2024
    Assignee: WISTRON CORPORATION
    Inventors: Jyun-Nian Lin, Po-Tsang Lin
  • Patent number: 12078701
    Abstract: Methods of fingerprinting a specific molecule in a composition using nuclear magnetic resonance (NMR) is disclosed. The disclosed NMR methods provide several modifications and improvements over existing NMR techniques. In some embodiments, the methods include applying a cycle of signal processing steps, including applying a radio frequency (RF) pulse, applying a gradient pulse having a pulse length less than or equal to 1000 ?s, and applying a water suppression technique (WET). In some embodiments, the methods further include repeating the cycle for at least 3 times to acquire an enhanced signal of the composition. In some embodiments, the methods further include fingerprinting the specific molecule based on the enhanced signal of the composition.
    Type: Grant
    Filed: March 26, 2020
    Date of Patent: September 3, 2024
    Assignee: Amgen Inc.
    Inventors: Tsang-Lin Hwang, Mats H. Wikstroem
  • Publication number: 20240087935
    Abstract: A closed gas circulation system may include a sealed plenum, circulation fans, and a fan filter unit (FFU) inlet to contain, filter, condition, and re-circulate a gas through a chamber of an interface tool. The gas provided to the chamber is maintained in a conditioned environment in the closed gas circulation system as opposed to introducing external air into the chamber through the FFU inlet. This enables precise control over the relative humidity and oxygen concentration of the gas used in the chamber, which reduces the oxidation of semiconductor wafers that are transferred through the chamber. The closed gas circulation system may also include an air-flow rectifier, a return vent, and one or more vacuum pumps to form a downflow of collimated gas in the chamber and to automatically control the feed-forward pressure and flow of gas through the chamber and the sealed plenum.
    Type: Application
    Filed: November 21, 2023
    Publication date: March 14, 2024
    Inventors: Jyh-Shiou HSU, Chyi-Tsong NI, Mu-Tsang LIN, Su-Horng LIN
  • Patent number: 11870151
    Abstract: An antenna array includes a first antenna unit, a second antenna unit, a third antenna unit, a fourth antenna unit, a first auxiliary metal element, a second auxiliary metal element, a third auxiliary metal element, and a fourth auxiliary metal element. The first auxiliary metal element is adjacent to the first antenna unit. The second auxiliary metal element is adjacent to the second antenna unit. The third auxiliary metal element is adjacent to the third antenna unit. The fourth auxiliary metal element is adjacent to the fourth antenna unit. The first auxiliary metal element, the second auxiliary metal element, the third auxiliary metal element, and the fourth auxiliary metal element are configured to increase the radiation gain of the antenna array.
    Type: Grant
    Filed: December 24, 2021
    Date of Patent: January 9, 2024
    Assignee: WISTRON CORP.
    Inventor: Po-Tsang Lin
  • Patent number: 11854851
    Abstract: A closed gas circulation system may include a sealed plenum, circulation fans, and a fan filter unit (FFU) inlet to contain, filter, condition, and re-circulate a gas through a chamber of an interface tool. The gas provided to the chamber is maintained in a conditioned environment in the closed gas circulation system as opposed to introducing external air into the chamber through the FFU inlet. This enables precise control over the relative humidity and oxygen concentration of the gas used in the chamber, which reduces the oxidation of semiconductor wafers that are transferred through the chamber. The closed gas circulation system may also include an air-flow rectifier, a return vent, and one or more vacuum pumps to form a downflow of collimated gas in the chamber and to automatically control the feed-forward pressure and flow of gas through the chamber and the sealed plenum.
    Type: Grant
    Filed: March 5, 2021
    Date of Patent: December 26, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Jyh-Shiou Hsu, Chyi-Tsong Ni, Mu-Tsang Lin, Su-Horng Lin
  • Publication number: 20230397120
    Abstract: A power setting method and an electronic device are provided. The power setting method includes: determining in a situation that, according to an enable signal corresponding to a network sharing function of the electronic device, the network sharing function is enabled; and in response to the network sharing function being enabled, setting an output power of the electronic device according to a first setting mode.
    Type: Application
    Filed: November 18, 2022
    Publication date: December 7, 2023
    Inventors: Jyun-Nian Lin, Po-Tsang Lin
  • Publication number: 20230337365
    Abstract: The present disclosure describes a storage device including a top panel, a bottom panel, a back panel, a front panel, and two side panels configured to form an enclosed volume. The storage device further includes multiple slots disposed at inner surfaces of the two side panels and configured to hold a substrate, a gas diffuser disposed at an inner surface of the back panel and configured to provide a purge gas to the enclosed volume, an isolation gas device disposed on an inner surface of the top panel and adjacent to a top portion of the front panel, and an isolation gas line configured to connect the isolation gas device to the gas diffuser. The isolation gas device is configured to inject the purge gas into a front portion of the storage device and in a direction from the top panel toward the bottom panel.
    Type: Application
    Filed: June 21, 2023
    Publication date: October 19, 2023
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shen-Min YANG, Pu Kuan FANG, Jyh-Shiou HSU, Mu-Tsang LIN
  • Patent number: 11777210
    Abstract: A mobile device includes a ground element, a first radiation element, a second radiation element, and a dielectric substrate. The first radiation element has a feeding point. The first radiation element includes a meandering portion. The second radiation element is coupled to the feeding point, and is at least partially surrounded by the first radiation element. A coupling gap is formed between the first radiation element and the second radiation element. The ground element, the first radiation element, and the second radiation element are all disposed on the dielectric substrate. A planar antenna structure is formed by the first radiation element and the second radiation element. The planar antenna structure covers a TETRA (Terrestrial Trunked Radio) frequency band and a GPS (Global Positioning System) frequency band.
    Type: Grant
    Filed: March 31, 2022
    Date of Patent: October 3, 2023
    Assignee: WISTRON CORP.
    Inventors: Shih-Ting Huang, Chia-Wei Su, Po-Tsang Lin
  • Publication number: 20230261378
    Abstract: A mobile device includes a ground element, a first radiation element, a second radiation element, and a dielectric substrate. The first radiation element has a feeding point. The first radiation element includes a meandering portion. The second radiation element is coupled to the feeding point, and is at least partially surrounded by the first radiation element. A coupling gap is formed between the first radiation element and the second radiation element. The ground element, the first radiation element, and the second radiation element are all disposed on the dielectric substrate. A planar antenna structure is formed by the first radiation element and the second radiation element. The planar antenna structure covers a TETRA (Terrestrial Trunked Radio) frequency band and a GPS (Global Positioning System) frequency band.
    Type: Application
    Filed: March 31, 2022
    Publication date: August 17, 2023
    Inventors: Shih-Ting HUANG, Chia-Wei SU, Po-Tsang LIN
  • Patent number: 11721746
    Abstract: A semiconductor device includes a fin projecting upwardly from a substrate; a gate stack engaging the fin; a gate spacer on a sidewall of the gate stack and in contact with the gate stack; and a dielectric layer on the sidewall of the gate stack and in contact with the gate stack, the dielectric layer being vertically between the fin and the gate spacer, wherein the dielectric layer has a thickness small than the gate spacer.
    Type: Grant
    Filed: August 17, 2020
    Date of Patent: August 8, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Che-Cheng Chang, Jr-Jung Lin, Shih-Hao Chen, Chih-Han Lin, Mu-Tsang Lin, Yung Jung Chang
  • Patent number: 11723152
    Abstract: The present disclosure describes a storage device including a top panel, a bottom panel, a back panel, a front panel, and two side panels configured to form an enclosed volume. The storage device further includes multiple slots disposed at inner surfaces of the two side panels and configured to hold a substrate, a gas diffuser disposed at an inner surface of the back panel and configured to provide a purge gas to the enclosed volume, an isolation gas device disposed on an inner surface of the top panel and adjacent to a top portion of the front panel, and an isolation gas line configured to connect the isolation gas device to the gas diffuser. The isolation gas device is configured to inject the purge gas into a front portion of the storage device and in a direction from the top panel toward the bottom panel.
    Type: Grant
    Filed: July 23, 2020
    Date of Patent: August 8, 2023
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shen-Min Yang, Pu Kuan Fang, Jyh-Shiou Hsu, Mu-Tsang Lin
  • Publication number: 20230182257
    Abstract: An apparatus for chemical mechanical polishing of a wafer includes a process chamber and a rotatable platen disposed inside the process chamber. A polishing pad is disposed on the platen and a wafer carrier is disposed on the platen. A slurry supply port is configured to supply slurry on the platen. A process controller is configured to control operation of the apparatus. A set of microphones is disposed inside the process chamber. The set of microphones is arranged to detect sound in the process chamber during operation of the apparatus and transmit an electrical signal corresponding to the detected sound. A signal processor is configured to receive the electrical signal from the set of microphones, process the electrical signal to enable detection of an event during operation of the apparatus, and in response to detecting the event, transmit a feedback signal to the process controller.
    Type: Application
    Filed: January 30, 2023
    Publication date: June 15, 2023
    Inventors: Chih-Yu WANG, Tien-Wen WANG, In-Tsang LIN, Hsin-Hui CHOU
  • Publication number: 20230147065
    Abstract: An antenna array includes a first antenna unit, a second antenna unit, a third antenna unit, a fourth antenna unit, a first auxiliary metal element, a second auxiliary metal element, a third auxiliary metal element, and a fourth auxiliary metal element. The first auxiliary metal element is adjacent to the first antenna unit. The second auxiliary metal element is adjacent to the second antenna unit. The third auxiliary metal element is adjacent to the third antenna unit. The fourth auxiliary metal element is adjacent to the fourth antenna unit. The first auxiliary metal element, the second auxiliary metal element, the third auxiliary metal element, and the fourth auxiliary metal element are configured to increase the radiation gain of the antenna array.
    Type: Application
    Filed: December 24, 2021
    Publication date: May 11, 2023
    Inventor: Po-Tsang LIN
  • Patent number: D988616
    Type: Grant
    Filed: October 30, 2020
    Date of Patent: June 6, 2023
    Assignee: WAHL CLIPPER CORPORATION
    Inventors: Connor Brandt, Robert Snell, Jeff Fleming, Chad Aulwes, Jui-Tsang Lin
  • Patent number: D988617
    Type: Grant
    Filed: October 30, 2020
    Date of Patent: June 6, 2023
    Assignee: WAHL CLIPPER CORPORATION
    Inventors: Connor Brandt, Robert Snell, Jeff Fleming, Chad Aulwes, Jui-Tsang Lin
  • Patent number: D1038567
    Type: Grant
    Filed: April 25, 2022
    Date of Patent: August 6, 2024
    Assignee: YEOU GHI INDUSTRY CO., LTD.
    Inventors: Ming-Hsien Lin, Ho-Tsang Lin, Guan-Ting Lin