Patents by Inventor Ina Hori

Ina Hori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9124822
    Abstract: Disclosed herein is a solid-state image pickup device including a solid-state image pickup element operable to produce an electric charge according to the amount of light received, a lens disposed on the upper side of a pixel of the solid-state image pickup element, a protective film which covers the upper side of the lens and a surface of which is flattened, and a surface film which is formed at the surface of the protective film and which is higher in hydrophilicity than the inside of the protective film.
    Type: Grant
    Filed: April 10, 2013
    Date of Patent: September 1, 2015
    Assignee: SONY CORPORATION
    Inventors: Youichi Otsuka, Kazuaki Ogawa, Taichi Natori, Atsushi Yamamoto, Yasunori Koshino, Hitomi Kamiya, Yoshinori Toumiya, Tadayuki Dofuku, Ina Hori, Takayuki Shoya, Yukihiro Sayama, Masaya Shimoji, Yoshikazu Tanaka
  • Patent number: 8884392
    Abstract: Disclosed herein is a method of manufacturing a solid state imaging device, including the steps of: forming a light receiving portion in a light receiving area of a semiconductor substrate; forming a pad portion in a pad area of the semiconductor substrate; forming a microlens material layer over the light receiving portion and the pad portion; providing the microlens material layer with a microlens corresponding to the light receiving portion; forming a low-reflection material layer on the microlens material layer; etching the microlens material layer and the low-reflection material layer over the pad portion to form an opening; and imparting hydrophilicity to a surface of the low-reflection material layer and an inside portion of the opening by a normal temperature oxygen radical treatment.
    Type: Grant
    Filed: November 22, 2013
    Date of Patent: November 11, 2014
    Assignee: Sony Corporation
    Inventors: Yoshinori Toumiya, Ina Hori, Tadayuki Dofuku, Hitomi Kamiya, Atsushi Yamamoto, Taichi Natori
  • Publication number: 20140084406
    Abstract: Disclosed herein is a method of manufacturing a solid state imaging device, including the steps of: forming a light receiving portion in a light receiving area of a semiconductor substrate; forming a pad portion in a pad area of the semiconductor substrate; forming a microlens material layer over the light receiving portion and the pad portion; providing the microlens material layer with a microlens corresponding to the light receiving portion; forming a low-reflection material layer on the microlens material layer; etching the microlens material layer and the low-reflection material layer over the pad portion to form an opening; and imparting hydrophilicity to a surface of the low-reflection material layer and an inside portion of the opening by a normal temperature oxygen radical treatment.
    Type: Application
    Filed: November 22, 2013
    Publication date: March 27, 2014
    Applicant: Sony Corporation
    Inventors: Yoshinori Toumiya, Ina Hori, Tadayuki Dofuku, Hitomi Kamiya, Atsushi Yamamoto, Taichi Natori
  • Patent number: 8603852
    Abstract: Disclosed herein is a method of manufacturing a solid state imaging device, including the steps of: forming a light receiving portion in a light receiving area of a semiconductor substrate; forming a pad portion in a pad area of the semiconductor substrate; forming a microlens material layer over the light receiving portion and the pad portion; providing the microlens material layer with a microlens corresponding to the light receiving portion; forming a low-reflection material layer on the microlens material layer; etching the microlens material layer and the low-reflection material layer over the pad portion to form an opening; and imparting hydrophilicity to a surface of the low-reflection material layer and an inside portion of the opening by a normal temperature oxygen radical treatment.
    Type: Grant
    Filed: June 2, 2010
    Date of Patent: December 10, 2013
    Assignee: Sony Corporation
    Inventors: Yoshinori Toumiya, Ina Hori, Tadayuki Dofuku, Hitomi Kamiya, Atsushi Yamamoto, Taichi Natori
  • Publication number: 20130235230
    Abstract: Disclosed herein is a solid-state image pickup device including a solid-state image pickup element operable to produce an electric charge according to the amount of light received, a lens disposed on the upper side of a pixel of the solid-state image pickup element, a protective film which covers the upper side of the lens and a surface of which is flattened, and a surface film which is formed at the surface of the protective film and which is higher in hydrophilicity than the inside of the protective film.
    Type: Application
    Filed: April 10, 2013
    Publication date: September 12, 2013
    Applicant: Sony Corporation
    Inventors: Youichi Otsuka, Kazuaki Ogawa, Taichi Natori, Atsushi Yamamoto, Yasunori Koshino, Hitomi Kamiya, Yoshinori Toumiya, Tadayuki Dofuku, Ina Hori, Takayuki Shoya, Yukihiro Sayama, Masaya Shimoji, Yoshikazu Tanaka
  • Patent number: 8432010
    Abstract: Disclosed herein is a solid-state image pickup device including a solid-state image pickup element operable to produce an electric charge according to the amount of light received, a lens disposed on the upper side of a pixel of the solid-state image pickup element, a protective film which covers the upper side of the lens and a surface of which is flattened, and a surface film which is formed at the surface of the protective film and which is higher in hydrophilicity than the inside of the protective film.
    Type: Grant
    Filed: April 29, 2010
    Date of Patent: April 30, 2013
    Assignee: Sony Corporation
    Inventors: Youichi Otsuka, Kazuaki Ogawa, Taichi Natori, Atsushi Yamamoto, Yasunori Koshino, Hitomi Kamiya, Yoshinori Toumiya, Tadayuki Dofuku, Ina Hori, Takayuki Shoya, Yukihiro Sayama, Masaya Shimoji, Yoshikazu Tanaka
  • Publication number: 20100320554
    Abstract: Disclosed herein is a method of manufacturing a solid state imaging device, including the steps of: forming a light receiving portion in a light receiving area of a semiconductor substrate; forming a pad portion in a pad area of the semiconductor substrate; forming a microlens material layer over the light receiving portion and the pad portion; providing the microlens material layer with a microlens corresponding to the light receiving portion; forming a low-reflection material layer on the microlens material layer; etching the microlens material layer and the low-reflection material layer over the pad portion to form an opening; and imparting hydrophilicity to a surface of the low-reflection material layer and an inside portion of the opening by a normal temperature oxygen radical treatment.
    Type: Application
    Filed: June 2, 2010
    Publication date: December 23, 2010
    Applicant: SONY CORPORATION
    Inventors: Yoshinori Toumiya, Ina Hori, Tadayuki Dofuku, Hitomi Kamiya, Atsushi Yamamoto, Taichi Natori
  • Publication number: 20100289100
    Abstract: Disclosed herein is a solid-state image pickup device including a solid-state image pickup element operable to produce an electric charge according to the amount of light received, a lens disposed on the upper side of a pixel of the solid-state image pickup element, a protective film which covers the upper side of the lens and a surface of which is flattened, and a surface film which is formed at the surface of the protective film and which is higher in hydrophilicity than the inside of the protective film.
    Type: Application
    Filed: April 29, 2010
    Publication date: November 18, 2010
    Applicant: SONY CORPORATION
    Inventors: Youichi Otsuka, Kazuaki Ogawa, Taichi Natori, Atsushi Yamamoto, Yasunori Koshino, Hitomi Kamiya, Yoshinori Toumiya, Tadayuki Dofuku, Ina Hori, Takayuki Shoya, Yukihiro Sayama, Masaya Shimoji, Yoshikazu Tanaka