Patents by Inventor INES WYRSTA

INES WYRSTA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210286109
    Abstract: A liquid lens article includes: a first substrate comprising a glass composition; a first electrode disposed on a first primary surface of the first substrate; and a second electrode disposed on a second primary surface of the first substrate, the second primary surface opposing the first primary surface. Each of the first electrode and the second electrode comprises an outer edge that is substantially covered by an edge barrier layer. Each electrode comprises a metal. Further, the edge barrier layer comprises an electrically insulating metal oxide or oxynitride.
    Type: Application
    Filed: March 12, 2021
    Publication date: September 16, 2021
    Inventor: INES WYRSTA
  • Publication number: 20210255370
    Abstract: A method of fabricating a liquid lens or an array of liquid lenses, and the corresponding liquid lens or array of lenses is disclosed. The method includes patterning an insulative layer (132) by photolithographic techniques to expose a portion of the conductive layer (124) and a portion of the insulative layer (132) having a surface energy below 40 mJ/m2. In further embodiments, the liquid lens includes an interface (110) forming a lens between a polar liquid (106) and a non-polar liquid (108) disposed within a cavity (104). The interface intersects a surface of the insulative layer (132) having a surface energy below 40 mJ/m2.
    Type: Application
    Filed: May 15, 2019
    Publication date: August 19, 2021
    Inventors: Michael Anzlowar, Robert Alan Bellman, Shiwen Liu, Ines Wyrsta
  • Patent number: 9746776
    Abstract: A fluoropolymer-photoresist composition containing fluorinated polymer for containment of liquid inks in the printing of electronic devices. Methods of applying and treating the fluoropolymer-photoresist composition containing fluorinated polymer to provide low surface energy before and after processing and development of the photoresist.
    Type: Grant
    Filed: November 24, 2015
    Date of Patent: August 29, 2017
    Assignee: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Hjalti Skulason, Raia Finc, Ines Wyrsta, Smita Dayal, Steven Donald Dascomb
  • Publication number: 20160149136
    Abstract: A fluoropolymer-photoresist composition containing fluorinated polymer for containment of liquid inks in the printing of electronic devices. Methods of applying and treating the fluoropolymer-photoresist composition containing fluorinated polymer to provide low surface energy before and after processing and development of the photoresist.
    Type: Application
    Filed: November 24, 2015
    Publication date: May 26, 2016
    Inventors: HJALTI SKULASON, RAIA FINC, INES WYRSTA, SMITA DAYAL, STEVEN DONALD DASCOMB