Abstract: A seal for use in a vacuum pump comprises a seal element positioned between inner and outer seal carriers located at the inner and outer surfaces of the seal element. Each of the seal element and carriers is substantially toroidal in shape. The outer carrier comprises retention means to hold the seal element in position. The inner carrier comprises at least one recess located in a surface adjacent to the seal element, and the seal element comprises at least one protrusion on an inner surface, which extends into the at least one recess of the inner carrier. A seal system comprises the described seal and first and second flanges. Methods for enhancing the chemical resistance of a seal system for use in a vacuum pump, and the use of the seal or seal system to connect pipework, are also provided.

Abstract: A seal for use in a vacuum pump comprises a seal element positioned between inner and outer seal carriers located at the inner and outer surfaces of the seal element. Each of the seal element and carriers is substantially toroidal in shape. The outer carrier comprises retention means to hold the seal element in position. The inner carrier comprises at least one recess located in a surface adjacent to the seal element, and the seal element comprises at least one protrusion on an inner surface, which extends into the at least one recess of the inner carrier. A seal system comprises the described seal and first and second flanges. Methods for enhancing the chemical resistance of a seal system for use in a vacuum pump, and the use of the seal or seal system to connect pipework, are also provided.

Abstract: Dry pumps are used to pump a variety of gas mixtures from the semiconductor industry. The present invention provides a liquid ring pump located between the dry pump and an abatement device to remove soluble corrosive materials prior to the exhaust gases entry to the abatement device, the work fluid exhausted from the liquid ring pump being separated from the gas prior to entry to the abatement device.

Abstract: Dry pumps are used to pump a variety of gas mixtures from the semiconductor industry. The present invention provides a liquid ring pump located between the dry pump and an abatement device to remove soluble corrosive materials prior to the exhaust gases entry to the abatement device, the work fluid exhausted from the liquid ring pump being separated from the gas prior to entry to the abatement device.

Abstract: In order to prevent excessive motor loading or system overheating due to the accumulation of particulate or dust, from SACVD type CVD processes, in the running clearances of the vacuum pump a vacuum pumping arrangement is provided having a plurality of vacuum pumping stages and comprising a first pump inlet through which process fluid from the vacuum chamber can enter the pump and pass through each of the pumping sections towards a pump outlet, and a second pump inlet through which process fluid can enter the pump and pass through only one or more pumping stages downstream of the most upstream pumping stage, wherein the apparatus configured to conveying process fluid from the vacuum chamber to the first pump inlet for pumping during the second processing step and conveying process fluid from the vacuum chamber to the second pump inlet for pumping during the first processing step.