Abstract: Certain substituted amines, alkylenediamines or polyamines, and derivatives of these, are suitable for use in preventing, inhibiting, or otherwise modifying crystalline gas hydrate formation. These inhibitors include compounds from any of the following groups. The substituents R1-R5 may be hydrocarbyl groups or, in some cases, polyhydroxyalkyl groups or (CH2)P—COO— in which p is either 1 or 2.

Abstract: N,N-Dialkylpolyhydroxyalkylamines may be made by the reductive alkylation of an N-alkylpolyhydroxyalkylamine with an aldehyde or ketone, or with an equivalent compound, in the presence of a transition metal catalyst and hydrogen. The reaction is performed in a reaction solvent that contains at least 30 wt % of an organic solvent. The use of a sufficiently high proportion of an appropriate organic solvent in the reaction mixture reduces the amount of water present in the reaction mixture, and provides rapid reaction rates and high yields of the desired product. The N,N-dialkylpolyhydroxyalkylamines may be used in a wide variety of applications.

Abstract: Surfactant compositions containing compounds according to structure (I), and methods of making them, are disclosed. The compounds provide reduced dynamic and equilibrium surface tension, good solubility, moderate foaming, and good cleaning performance. The methods for making them involve reaction of N-(polyhydroxyalkyl)-alkylamines with dinitriles, dialdehydes, or acetals or hemiacetals of dialdehydes in the presence of hydrogen and a transition metal catalyst. In structure (I), x is an integer from about 1 to 12, R1 and R2 are independently C3-C30 linear alkyl, cyclic alkyl, branched alkyl, alkenyl, aryl, alkylaryl, alkoxyalkyl, and dialkylaminoalkyl; and R3 and R4 are independently hydrogen or a pyranosyl group such as ?-D-glucopyranosyl, ?-D-glucopyranosyl, or ?-D-galactopyranosyl.

Abstract: In the method according to the invention, scatter lines (2, 3, 4, 5, 6, 7, 8) with a predetermined width are produced, which run at a predetermined distance from selected edges of mask structure elements (1). These scatter lines (2, 3, 4, 5, 6, 7, 8) produced are inspected with regard to compliance with a predetermined distance from adjoining edges of mask structure elements (1) and with regard to compliance with a predetermined distance from one another. Scatter lines (2, 3, 4, 5, 6, 7, 8) which fall below the predetermined distance are shortened and/or eliminated.

Abstract: In the method according to the invention, scatter lines (2, 3, 4, 5, 6, 7, 8) with a predetermined width are produced, which run at a predetermined distance from selected edges of mask structure elements (1). These scatter lines (2, 3, 4, 5, 6, 7, 8) produced are inspected with regard to compliance with a predetermined distance from adjoining edges of mask structure elements (1) and with regard to compliance with a predetermined distance from one another. Scatter lines (2, 3, 4, 5, 6, 7, 8) which fall below the predetermined distance are shortened and/or eliminated.