Patents by Inventor Inna Shmurun

Inna Shmurun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170121813
    Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
    Type: Application
    Filed: January 17, 2017
    Publication date: May 4, 2017
    Inventors: Maosheng ZHAO, Juan Carlos ROCHA-ALVAREZ, Inna SHMURUN, Soovo SEN, Mao D. LIM, Shankar VENKATARAMAN, Ju-Hyung LEE
  • Publication number: 20140158048
    Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
    Type: Application
    Filed: February 12, 2014
    Publication date: June 12, 2014
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Maosheng ZHAO, Juan Carlos ROCHA- ALVAREZ, Inna SHMURUN, Soovo SEN, Mao D. LIM, Shankar VENKATARAMAN, Ju-Hyung LEE
  • Patent number: 8597011
    Abstract: Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other.
    Type: Grant
    Filed: December 22, 2010
    Date of Patent: December 3, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Andrzei Kaszuba, Juan Carlos Rocha-Alvarez, Thomas Nowak, Sanjeev Baluja, Ashish Shah, Inna Shmurun
  • Publication number: 20120003398
    Abstract: Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other.
    Type: Application
    Filed: December 22, 2010
    Publication date: January 5, 2012
    Applicant: Applied Materials, Inc.
    Inventors: Andrzei Kaszuba, Juan Carlos Rocha-Alvarez, Thomas Nowak, Sanjeev Baluja, Ashish Shah, Inna Shmurun
  • Patent number: 7909595
    Abstract: Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other.
    Type: Grant
    Filed: March 15, 2007
    Date of Patent: March 22, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Andrzei Kaszuba, Juan Carlos Rocha-Alvarez, Thomas Nowak, Sanjeev Baluja, Ashish Shah, Inna Shmurun
  • Publication number: 20100095891
    Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
    Type: Application
    Filed: January 7, 2010
    Publication date: April 22, 2010
    Inventors: Maosheng Zhao, Juan Carlos Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao D. Lim, Shankar Venkataraman, Ju-Hyung Lee
  • Patent number: 7654224
    Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
    Type: Grant
    Filed: February 17, 2009
    Date of Patent: February 2, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Maosheng Zhao, Juan Carlos Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao D. Lim, Shankar Venkataraman, Ju-Hyung Lee
  • Patent number: 7628863
    Abstract: A method and apparatus for a chamber for chemical vapor deposition on a substrate in a processing region comprising a gas box having a heated lid comprising a gas inlet passage, and a face plate connected to the heated lid positioned to conduct gas from the heated gas box to a substrate processing region. Also, a method for providing heat to a chemical vapor deposition chamber comprising supplying heat to a lid of a gas box, and heating a face plate connected to the gas box by heat transfer from the lid.
    Type: Grant
    Filed: August 3, 2004
    Date of Patent: December 8, 2009
    Assignee: Applied Materials, Inc.
    Inventors: Soovo Sen, Inna Shmurun, Thomas Nowak, Nancy Fung, Brian Hopper, Andrzej Kaszuba, Eller Juco
  • Publication number: 20090145360
    Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
    Type: Application
    Filed: February 17, 2009
    Publication date: June 11, 2009
    Inventors: Maosheng Zhao, Juan Carlos Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao D. Lim, Shankar Venkataraman, Ju-Hyung Lee
  • Patent number: 7500445
    Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
    Type: Grant
    Filed: January 27, 2003
    Date of Patent: March 10, 2009
    Assignee: Applied Materials, Inc.
    Inventors: Maosheng Zhao, Juan Carlos Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao D. Lim, Shankar Venkataraman, Ju-Hyung Lee
  • Patent number: 7465357
    Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
    Type: Grant
    Filed: June 23, 2006
    Date of Patent: December 16, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Maosheng Zhao, Juan Carlos Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao D. Lim, Shankar Venkataraman, Ju-Hyung Lee
  • Patent number: 7464717
    Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
    Type: Grant
    Filed: June 19, 2006
    Date of Patent: December 16, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Maosheng Zhao, Juan Carlos Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao D. Lim, Shankar Venkataraman, Ju-Hyung Lee
  • Publication number: 20070228618
    Abstract: Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other.
    Type: Application
    Filed: March 15, 2007
    Publication date: October 4, 2007
    Applicant: Applied Materials, Inc.
    Inventors: Andrzei Kaszuba, Juan Rocha-Alvarez, Thomas Nowak, Sanjeev Baluja, Ashish Shah, Inna Shmurun
  • Publication number: 20070107660
    Abstract: A method and apparatus for a chamber for chemical vapor deposition on a substrate in a processing region comprising a gas box having a heated lid comprising a gas inlet passage, and a face plate connected to the heated lid positioned to conduct gas from the heated gas box to a substrate processing region. Also, a method for providing heat to a chemical vapor deposition chamber comprising supplying heat to a lid of a gas box, and heating a face plate connected to the gas box by heat transfer from the lid.
    Type: Application
    Filed: August 3, 2004
    Publication date: May 17, 2007
    Inventors: Soovo Sen, Inna Shmurun, Thomas Nowak, Nancy Fung, Brian Hopper, Andrzej Kaszuba, Eller Juco
  • Publication number: 20060231205
    Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
    Type: Application
    Filed: June 23, 2006
    Publication date: October 19, 2006
    Inventors: Maosheng Zhao, Juan Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao Lim, Shankar Venkataraman, Ju-Hyung Lee
  • Publication number: 20060225767
    Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
    Type: Application
    Filed: June 19, 2006
    Publication date: October 12, 2006
    Inventors: Maosheng Zhao, Juan Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao Lim, Shankar Venkataraman, Ju-Hyung Lee
  • Publication number: 20060027165
    Abstract: Method and apparatus for obtaining a tailored heat transfer profile in a chamber housing a microprocessor manufacturing process, including estimating heat transfer properties of the chamber; estimating heat absorptive properties of a wafer; adjusting the physical characteristics of the chamber to correct the heat transfer properties; and utilizing the chamber for manufacturing microprocessors.
    Type: Application
    Filed: August 3, 2004
    Publication date: February 9, 2006
    Inventors: Soovo Sen, Inna Shmurun, Thomas Nowak, Nancy Fung, Brian Hopper, Andrzej Kaszuba, Eller Juco
  • Patent number: 6946033
    Abstract: An apparatus for distributing gas in a processing system. In one embodiment, the system includes a gas distribution assembly having a gas distribution plate. The gas distribution plate defines a plurality of holes through which gases are transmitted. The assembly further includes a gas box coupled to the gas distribution plate, in which the gas box is configured to supply the gases into the plurality of holes. The assembly further includes a means for reducing heat transfer from the gas box to the gas distribution plate.
    Type: Grant
    Filed: September 16, 2002
    Date of Patent: September 20, 2005
    Assignee: Applied Materials Inc.
    Inventors: Lun Tsuei, Soovo Sen, Ju-Hyung Lee, Juan Carlos Rocha-Alvarez, Inna Shmurun, Maosheng Zhao, Troy Kim, Shankar Venkataraman
  • Publication number: 20040144490
    Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
    Type: Application
    Filed: January 27, 2003
    Publication date: July 29, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Maosheng Zhao, Juan Carlos Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao D. Lim, Shankar Venkataraman, Ju-Hyung Lee
  • Publication number: 20040118519
    Abstract: A method and apparatus for distributing gases into a processing chamber. In one embodiment, the apparatus includes a gas distribution plate defining a plurality of holes disposed therethrough, a blocker plate defining a plurality of holes disposed therethrough, a first gas pathway configured to deliver a first gas through the blocker plate and the gas distribution plate, and a second gas pathway configured to deliver a second gas around the blocker plate and through the gas distribution plate.
    Type: Application
    Filed: December 20, 2002
    Publication date: June 24, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Soovo Sen, Maosheng Zhao, Inna Shmurun, Ju-Hyung Lee, Shankar Venkataraman