Abstract: One aspect of the present invention relates to a device for managing a fine particle concentration of a target region by supplying charges to a target region, the device comprising: a container configured to store liquid, at least one nozzle configured to output the liquid, a pump configured to supply the liquid from the container to the at least one nozzle, a power supply configured to supply power to the device, and a controller configured to supply the charges to the target region through the at least one nozzle by using the power supply, wherein the controller is configured to, by using the power supply, apply a voltage equal to or greater than a reference value to the at least one nozzle, and provide electric force in a direction away from the device to the fine particles in the target region charged by the supplied charges.

Abstract: A plasma processing system. The system may include a vacuum chamber including an electron emission region and a processing region, in which plasma is produced and a substrate is loaded, the electron emission region having a first pressure and the processing region being maintained to a pressure higher than the first pressure, a thermal electron emission unit provided in the electron emission region and used to emit a thermal electron, a grid electrode grounded and used to selectively provide an electron emitted from the thermal electron emission unit to the processing region, a substrate holder provided in a lower region of the vacuum chamber and in the processing region, the substrate holder being used to load the substrate thereon, and an RF power source configured to apply an RF power to the substrate holder and to produce the plasma.