Patents by Inventor Ippei Sawayama

Ippei Sawayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6491808
    Abstract: An electrolytic etching method for etching treating an object to be etched by an electrochemical reaction through an electrolyte between the object to be etched and an etching electrode, where the contact angle of the electrolyte to the object to be etched is not more than 70°. This electrolytic etching method can etch the object in a non-contact manner, can reduce the cost, number of steps, and processing time, and can enhance the patterning accuracy.
    Type: Grant
    Filed: September 9, 1998
    Date of Patent: December 10, 2002
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hirofumi Ichinose, Ippei Sawayama, Tsutomu Murakami, Masaya Hisamatsu, Yukie Ueno
  • Patent number: 6425325
    Abstract: An offset printing method comprises the steps of: a process for suspending a sheet-shaped or belt-shaped blanket by supporting both ends thereof at the leading and trailing ends thereof in the printing direction; and a process for performing ink reception from a plate to the blanket and also transferring ink from the blanket to a work, by pressing the blanket by a pressuring jig from an upwards direction down onto a plate or work situated below and sweeping in the printing direction. An offset printing apparatus is configured so as to carry out this method.
    Type: Grant
    Filed: January 27, 2000
    Date of Patent: July 30, 2002
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yasuo Mukai, Ippei Sawayama, Masayuki Kusakari, Takaomi Ishida
  • Publication number: 20010007306
    Abstract: Provided is an electrolytic etching method for etching treating an object to be etched by an electrochemical reaction through an electrolyte between the object to be etched and an etching electrode, wherein the contact angle of the electrolyte to the object to be etched is not more than 70°. Thus provided is an electrolytic etching method that can etch the object in a non-contact manner, that can reduce the cost, the number of steps, and the processing time, and that can enhance the patterning accuracy.
    Type: Application
    Filed: September 9, 1998
    Publication date: July 12, 2001
    Inventors: HIROFUMI ICHINOSE, IPPEI SAWAYAMA, TSUTOMU MURAKAMI, MASAYA HISAMATSU, YUKIE UENO
  • Patent number: 6214636
    Abstract: A photovoltaic device of this invention has a semiconductor layer for generating a photovoltaic power and a collector electrode formed on the semiconductor layer to collect the power generated by the semiconductor layer. A conductive layer containing a conductive powder is formed on at least one side of the collector electrode closer to the semiconductor layer, and a metal layer is formed on the side away from the semiconductor layer. The metal layer covers the surface of the conductive layer away from the semiconductor layer.
    Type: Grant
    Filed: October 29, 1997
    Date of Patent: April 10, 2001
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ippei Sawayama, Hitoshi Toma, Yoshihiko Hyosu, Tatsuo Fujisaki, Toshihiko Mimura
  • Patent number: 6114185
    Abstract: Laser light having a wavelength where a thin-film semiconductor layer can absorb the laser light is applied on the side of the thin-film semiconductor layer to join a semiconductor-holding member and a metal member by welding. Materials can be joined at a sufficiently high strength and with long term stability especially when a metal member of the same or different type is welded to a conductive substrate which is a part of a photovoltaic device.
    Type: Grant
    Filed: August 26, 1998
    Date of Patent: September 5, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventors: Koji Tsuzuki, Ippei Sawayama, Yoshimitsu Hayashi, Yoshifumi Takeyama
  • Patent number: 6051116
    Abstract: An etching apparatus is described comprising a substrate holding segment for holding a substrate with a portion to be etched, an electrolytic bath for maintaining an electrolyte solution therein, a locomotive mechanism for moving the substrate holding segment in order to immerse the substrate held on the substrate holding segment in the electrolyte solution maintained in the electrolytic bath, and a counter electrode holding segment for holding a counter electrode having a pattern corresponding a desired etching pattern to be formed at the portion to be etched of the substrate. The counter electrode is positioned to oppose the substrate held on the substrate holding segment.
    Type: Grant
    Filed: September 30, 1998
    Date of Patent: April 18, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hirofumi Ichinose, Ippei Sawayama, Akio Hasebe, Tsutomu Murakami, Masaya Hisamatsu, Satoshi Shinkura, Yukie Ueno
  • Patent number: 5863412
    Abstract: A method for etching an object having a portion to be etched on the surface thereof, comprising a step of immersing said object in an electrolyte solution such that said object serves as a negative electrode; a step of arranging a counter electrode having a pattern corresponding to a desired etching pattern to be formed at said portion to be etched of said object in said electrolyte solution so as to maintain a predetermined interval between said counter electrode and said object, and a step of applying a direct current or a pulse current between said object and said counter electrode to etch said portion to be etched of said object into a pattern corresponding to said pattern of said counter electrode.
    Type: Grant
    Filed: October 17, 1996
    Date of Patent: January 26, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hirofumi Ichinose, Ippei Sawayama, Akio Hasebe, Tsutomu Murakami, Masaya Hisamatsu, Satoshi Shinkura, Yukie Ueno
  • Patent number: 5428249
    Abstract: A photovoltaic device of this invention has a semiconductor layer for generating a photovoltaic power and a collector electrode formed on the semiconductor layer to collect the power generated by the semiconductor layer. A conductive layer containing a conductive powder is formed on at least one side of the collector electrode closer to the semiconductor layer, and a metal layer is formed on the side away from the semiconductor layer. The metal layer covers the surface of the conductive layer away from the semiconductor layer.
    Type: Grant
    Filed: July 12, 1993
    Date of Patent: June 27, 1995
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ippei Sawayama, Hitoshi Toma, Yoshihiko Hyosu, Tatsuo Fujisaki, Toshihiko Mimura
  • Patent number: 4926085
    Abstract: A vibration wave motor which produces a relative movement between a vibrator and a member which is in contact with the vibrator via friction surfaces by means of a traveling vibration wave produced in the vibrator. In the motor, a friction surface of either one of the vibrator and frictional member is made of a material subjected to a hard alumite processing, and at least a friction surface of another one of the vibrator and frictional member is made of an ultrahard material consisting of a nickel-phosphorus-base alloy which contains at least one kind of material selected from the group consisting of silicon carbide, boron carbide, titanium boride and boron nitride.
    Type: Grant
    Filed: May 3, 1989
    Date of Patent: May 15, 1990
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ippei Sawayama, Masayuki Jinnai
  • Patent number: 4709221
    Abstract: A sheet coil in the form of a conductor on an insulating substrate has a mending metal portion at a side portion forming the conductor gap so as to narrow the gap width. The sheet coil can be produced by forming a coil pattern on a base material made up of an insulating substrate and a metal layer laminated thereon by using a photosensitive material. The portion of the metal layer not covered with the photosensitive material is removed by etching, and, while the photosensitive material remains, a metal plating treatment is carried out so as to narrow the etched width of the metal layer.
    Type: Grant
    Filed: June 17, 1985
    Date of Patent: November 24, 1987
    Assignee: Canon Kabushiki Kaisha
    Inventors: Susumu Kadokura, Ippei Sawayama, Tomoaki Kato, Tadashi Okamoto