Abstract: A substrate holding hand includes a frame, a plurality of blades each to support a substrate, and a mounting member to support the plurality of blades and mount the plurality of blades to the frame. The plurality of blades are aligned in a direction perpendicular to main surfaces of the blades, and among the plurality of blades, an intermediate blade is removable from the mounting member while an end blade located at an end in the direction perpendicular to the main surfaces of the blades is attached to the mounting member.

Abstract: A substrate holding hand includes a frame, a blade supported by the frame, a pair of front supports provided on a tip end side of the blade to support a substrate, and a pair of rear supports provided on a base end side of the blade to support the substrate. The frame, the pair of front supports, and the pair of rear supports are provided in a V-shape.

Abstract: A robot that transfers a substrate includes a hand, an arm, a substrate detector, and a substrate orientation examiner. The hand holds and transfers the substrate. The arm is connected to the hand and moves the hand. The substrate detector detects absence or presence of the substrate in a non-contact manner. The substrate orientation examiner examines an orientation of the substrate based on a height detected by the substrate detector at which the substrate is located when it is not held by the hand.

Abstract: A substrate conveying robot includes a cable guide that is arranged inside a housing, in which a robot cable extending from an arm is arranged, and that deforms to follow the robot cable moved as the arm is moved up and down.

Abstract: A robot is for transferring a substrate. The robot includes an arm, a hand, and a tilter. The arm is movable. The hand is installed to the arm to project from it and holds and transfers the substrate. The tilter tilts an orientation of the hand. The hand includes a holder. The holder contacts the top surface and the bottom surface of the substrate. With the tilter, the holder holds the substrate keeping in contact with the top surface and the bottom surface of the substrate and applying forces to only one of two halves of the substrate bisected.

Abstract: A robot that transfers a substrate includes an arm, a hand, a substrate detector, and a substrate shape abnormality examiner. The hand is installed to the arm and holds and transfers the substrate. The substrate detector detects absence or presence of the substrate in a non-contact manner. The substrate shape abnormality examiner examines the substrate for a shape abnormality based on a height detected by the substrate detector at which the substrate is located when it is not held by the hand.

Abstract: A robot includes a guide, a mover, a hand, a deformation acquirer, a orientation adjuster, and a controller. The mover is installed to the guide and movable in a direction that the guide guides along. The hand is installed to the mover and holds a substrate. The deformation acquirer acquires information on a deformation of the guide. The orientation adjuster adjusts an orientation of the hand according to the deformation of the guide acquired by the deformation acquirer. The controller controls operation of the orientation adjuster. The controller adjusts the orientation of the hand performing a holding operation on the substrate to be transferred by using the orientation adjuster based on the information on the deformation of the guide.

Abstract: A substrate holding hand includes a frame, a blade to support a substrate, a mounting member to support the blade and mount the blade to the frame, and an inclination adjusting mechanism operable to adjust an inclination of the blade with respect to a horizontal direction in a side view by adjusting an inclination of the mounting member with respect to the frame.

Abstract: A robot that transfers a substrate includes an arm, a hand, a substrate orientation acquirer, a hand orientation adjuster, and a control unit. The hand is installed to the arm and holds and transfers the substrate. The substrate orientation acquirer acquires information about an orientation of a to-be-transferred substrate, which is the substrate to be transferred. The hand orientation adjuster adjusts an orientation of the hand with respect to the to-be-transferred substrate. The control unit controls operations of the arm, the hand, and the hand orientation adjuster. The control unit adjusts the orientation of the hand performing a taking-out operation on the to-be-transferred substrate by using the hand orientation adjuster based on the information about the orientation of the to-be-transferred substrate.

Abstract: A substrate holding hand includes a blade including a support to support a substrate, a movable pressing unit including a pressing member that moves back and forth to press the substrate, and an inclination adjusting mechanism operable to adjust an inclination of the pressing member.

Abstract: A substrate holding hand includes a sensor support member to support a plurality of substrate detection sensors and includes a positioner to collectively position the plurality of substrate detection sensors with respect to a plurality of blades.

Abstract: A substrate holding hand includes a blade including a support to support a substrate, a movable support unit that moves back and forth to support the substrate, a movable pressing unit that moves back and forth to press the substrate, and a positioner to position the movable support unit and the movable pressing unit in common.

Abstract: A substrate holding hand includes a supporting plate where a circular reference capture range is defined, a plurality of pads disposed within the reference capture range, at least one stationary stopper that is disposed along an outer circumferential circle of the reference capture range, at least one movable stopper having a part at the same height from the supporting plate as the stationary stopper, and a stopper actuator that moves the movable stopper from a retracted position outside the reference capture range to a deployed position closer to the stationary stopper than the retracted position. A circular reduced capture range is defined by the movable stopper at the deployed position, and the front stopper, and a diameter of the reduced capture range is larger than a diameter of the substrate and smaller than a diameter of the reference capture range.

Abstract: A substrate mapping device 4 maps a plurality of substrates 10 inside a container where the substrates 10 are accommodated so as to be arrayed in a given arrayed direction. The substrate mapping device 4 includes a sensor 16 configured to detect a state of the substrate 10, a manipulator 14 configured to move the sensor 16, and a control device 18 configured to control the manipulator 14 to move the sensor 16 along a mapping course. The control device 18 sets a first mapping position and a second mapping position different in the position in the arrayed direction of the substrates 10 from the first mapping position, and sets the mapping course based on the first mapping position and the second mapping position.

Abstract: At least three spherical surface sliding bearings provided between a first member and a second member and disposed at mutually different positions when seen in the height direction, are provided. Each of the at least three spherical surface sliding bearings has an inner ring and an outer ring, either one of the inner ring and the outer ring is attached to the first member, and the other is attached to the second member. In at least two of the at least three spherical surface sliding bearings, the height adjustment mechanism intervenes, at least either one of between one of the inner ring and the outer ring, and the first member, and between the other and the second member.

Abstract: A robot hand to hold a substrate, which includes a base body, a blade defining a holding position for holding the substrate and attached at a base part to the base body, and a differential screw having a center axis perpendicular to a principal surface of the substrate existing at the holding position and configured to attach the base part of the blade to the base body. The differential screw includes a first threaded part having a first pitch, a second threaded part having a second pitch different from the first pitch, and an intervening member coaxially having a third threaded part to be threadedly engaged with the first threaded part, and a fourth threaded part to be threadedly engaged with the second threaded part. The first threaded part is provided to the base body, and the second threaded part is provided to the base part of the blade.

Abstract: Blades, base parts to which the blades are fixed, a guide mechanism configured to guide movement of the base parts in a direction in which the base parts are arranged side by side, and a linkage mechanism configured to parallelly change intervals of the base parts according to angle changes of link members coupled to the base parts, are included. An interval fine-adjustment mechanism is provided at each of coupling parts between the base pars and the link members, the interval fine-adjustment mechanism being configured to finely adjust positions of the base parts in the direction in which the base parts are arranged side by side, individually. According to this, a blade interval adjusting device capable of finely adjusting the intervals of the blades which transfer wafers etc., is provided.

Abstract: A plasma processing apparatus is provided that is configured to supply a gas into a chamber, generate a plasma from the gas using a power of an electromagnetic wave, and perform a predetermined plasma process on a substrate that is held by a mounting table. The plasma processing apparatus includes a dielectric window through which the electromagnetic wave that is output from an electromagnetic wave generator is propagated and transmitted into the chamber, a support member that supports the dielectric window, a partition member that separates a space where the support member is arranged from a plasma generation space and includes a protrusion abutting against the dielectric window, and a conductive member that is arranged between the partition member and the dielectric window and is protected from being exposed to the plasma generation space by the protrusion.

Abstract: A plasma processing apparatus includes a process chamber including a sidewall, a mounting table disposed in the process chamber, a shield member which is disposed along the inner surface of the sidewall to surround the mounting table and has an opening facing the transfer port, and a shutter configured to open/close the opening, the shutter being movable up and down. The shutter has a first portion adapted to face the opening, and a second portion adapted to face the shield member at a lower side of the shield member. The shield member has a lower portion including a contact surface facing the second portion. A contactor adapted to contact the contact surface is disposed at the second portion. The first portion of the shutter closes the opening through a gap between the first portion and the shield member. The contact surface and the contactor are formed of HASTELLOY®.

Abstract: A plasma processing apparatus includes a processing chamber, a table disposed in the processing chamber, a dielectric window provided at the processing chamber, and a surrounding body made of a dielectric material surrounding a processing space between the table and the dielectric window. The dielectric window and the surrounding body are separated from each other in a vertical direction with a predetermined gap therebetween.