Patents by Inventor Iqbal A. Shareef

Iqbal A. Shareef has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10760944
    Abstract: A gas flow metrology system for a substrate processing system includes N primary valves selectively flowing gas from N gas sources, respectively, where N is an integer. N mass flow controllers are connected to the N primary valves, respectively, to flow N gases from the N gas sources, respectively. N secondary valves selectively flow gas from the N mass flow controllers, respectively. A gas flow path connects the N secondary valves to a flow metrology system located remote from the N secondary valves, wherein the gas flow path includes a plurality of gas lines. A controller is configured to perform a hybrid flow metrology by selectively using a first flow metrology and a second flow metrology that is different from the first flow metrology to determine an actual flow rate for a selected gas at a desired flow rate from one of the N mass flow controllers.
    Type: Grant
    Filed: August 7, 2018
    Date of Patent: September 1, 2020
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Evangelos T. Spyropoulos, Piyush Agarwal, James Leung, Seyed Hossein Hashemi Ghermezi, Iqbal Shareef
  • Publication number: 20200049547
    Abstract: A gas flow metrology system for a substrate processing system includes N primary valves selectively flowing gas from N gas sources, respectively, where N is an integer. N mass flow controllers are connected to the N primary valves, respectively, to flow N gases from the N gas sources, respectively. N secondary valves selectively flow gas from the N mass flow controllers, respectively. A gas flow path connects the N secondary valves to a flow metrology system located remote from the N secondary valves, wherein the gas flow path includes a plurality of gas lines. A controller is configured to perform a hybrid flow metrology by selectively using a first flow metrology and a second flow metrology that is different from the first flow metrology to determine an actual flow rate for a selected gas at a desired flow rate from one of the N mass flow controllers.
    Type: Application
    Filed: August 7, 2018
    Publication date: February 13, 2020
    Inventors: Evangelos T. SPYROPOULOS, Piyush AGARWAL, James LEUNG, Seyed Hossein HASHEMI GHERMEZI, Iqbal SHAREEF
  • Publication number: 20200027702
    Abstract: Apparatus and methods for distributing and mixing gas are provided. In one example, a gas distributor comprises a body, a gas inlet for admitting gas to the body, an orbital array of gas outlets for distributing the gas to an external component, and a central gas distribution point disposed within the body at a center of the orbital array of gas outlets and in fluid communication with the orbital array of gas outlets.
    Type: Application
    Filed: July 19, 2018
    Publication date: January 23, 2020
    Inventors: Mark Taskar, Iqbal A. Shareef
  • Patent number: 10431431
    Abstract: A gas supply delivery arrangement of a plasma processing system for processing a substrate with gases introduced through at least first, second, and third gas injection zones comprises process gas supply inlets and tuning gas inlets. A mixing manifold comprises gas sticks in fluid communication with a process gas supply and tuning gas sticks in fluid communication with a tuning gas supply. A first gas outlet delivers gas to the first gas injection zone, a second gas outlet delivers gas to the second gas injection zone, and a third gas outlet delivers gas to the third gas injection zone. A gas splitter is in fluid communication with the mixing manifold, and includes a first valve arrangement which splits mixed gas exiting the mixing manifold into a first mixed gas supplied to the first gas outlet and a second mixed gas supplied to the second, and/or third gas outlets.
    Type: Grant
    Filed: October 19, 2015
    Date of Patent: October 1, 2019
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Mark Taskar, Iqbal Shareef, Anthony Zemlock, Ryan Bise, Nathan Kugland
  • Patent number: 10128087
    Abstract: A gas delivery apparatus for supplying process gas to a processing chamber of a plasma processing apparatus includes a mixing manifold having a plurality of gas inlets on a surface thereof, the gas inlets being equally spaced from a center mixing point of the mixing manifold; and optionally a plurality of gas supplies in communication with the plurality of gas inlets on the surface of the mixing manifold. A method of supplying gas to a processing chamber of a plasma processing apparatus using such a gas delivery apparatus involves providing a plurality of gas supplies in communication with a plurality of gas inlets on a surface of a mixing manifold; flowing at least two different gases from the plurality of gas supplies to the mixing manifold to create a first mixed gas; and supplying the first mixed gas to a plasma processing chamber coupled downstream of the mixing manifold.
    Type: Grant
    Filed: April 7, 2015
    Date of Patent: November 13, 2018
    Assignee: Lam Research Corporation
    Inventors: Mark Taskar, Iqbal Shareef
  • Patent number: 10022689
    Abstract: A mixing hub for use in semiconductor processing tools is provided. The hub may include a plurality of ports arranged about an axis, a mixing chamber, and a plurality of flow paths. Each of the flow paths may fluidically connect a corresponding one of the ports to the mixing chamber and each flow path may include a first passage, a second passage, and a valve interface. Each valve interface may be configured to interface with a valve such that the valve, when installed in the valve interface, is able to regulate fluid flow between the first passage and the second passage. Each valve interface may be located between a first reference plane that is perpendicular to the axis and passes through the corresponding port and a second reference plane that is perpendicular to the axis and passes through the mixing chamber.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: July 17, 2018
    Assignee: Lam Research Corporation
    Inventors: Iqbal A. Shareef, Mark Taskar
  • Patent number: 10002747
    Abstract: Methods and apparatus for supplying gas in a plasma processing system that employs the single line drop approach wherein a regulator is shared among multiple mass flow controllers. In one or more embodiments, an accumulator is provided and coupled in gaseous communication with a shared manifold to reduce pressure spikes and dips. A filter, which may be replaceable or non-replaceable separate from the accumulator, is integrated with the accumulator in one or more embodiments.
    Type: Grant
    Filed: March 27, 2012
    Date of Patent: June 19, 2018
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Iqbal Shareef, Evangelos Spyropoulos, Mark Taskar
  • Patent number: 9778083
    Abstract: A method of calculating a transient flow rate of a flowed process gas comprises flowing process gas through a mass flow controller into a chamber of known volume and measuring successive data sample points which include pressure data, temperature data, and a time value for each successive data sample point. Groups of successive data sample points are identified wherein each group shares one or more successive data sample points with another group, and ratio values are calculated for each of the successive data sample points wherein each ratio value is a ratio between the pressure data and a product of temperature and gas compressibility data for each respective time value.
    Type: Grant
    Filed: May 16, 2013
    Date of Patent: October 3, 2017
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Evangelos Spyropoulos, Iqbal Shareef
  • Patent number: 9721763
    Abstract: A gas supply system for providing a plurality of process gases to a process chamber includes a plurality of mass flow controllers each arranged to receive a respective subset of the plurality of process gases. Each of the respective subsets includes more than one of the process gases, and at least one of the process gases is provided to more than one of the plurality of mass flow controllers. Respective valves are arranged upstream of each of the plurality of mass flow controllers to selectively provide the respective subsets to the mass flow controllers. A first quantity of the plurality of mass flow controllers is less than a total number of the plurality of process gases to be supplied to the process chamber. The first quantity is equal to a maximum number of the plurality of process gases to be used in the process chamber at any one time.
    Type: Grant
    Filed: June 29, 2015
    Date of Patent: August 1, 2017
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Iqbal Shareef, Mark Taskar, Evangelos Spyropoulos
  • Patent number: 9721782
    Abstract: A method for etching a bevel edge of a substrate in a processing chamber is provided. The method includes flowing an inert gas into a center region of the processing chamber defined above a center region of the substrate and flowing a mixture of an inert gas and a processing gas over an edge region of the substrate. The method further includes striking a plasma in the edge region, wherein the flow of the inert gas and the flow of the mixture maintain a mass fraction of the processing gas substantially constant. A processing chamber configured to clean a bevel edge of a substrate is also provided.
    Type: Grant
    Filed: June 9, 2011
    Date of Patent: August 1, 2017
    Assignee: Lam Research Corporation
    Inventors: Jack Chen, Andrew D. Bailey, III, Iqbal Shareef
  • Patent number: 9704761
    Abstract: A corrosion sensor retainer assembly and method for predicting and detecting corrosion within a gas delivery system of a semiconductor substrate processing apparatus. The corrosion sensor retainer assembly comprises a laminate that includes a first insulating layer with a first port and a second insulating layer with a second port, wherein the first port and the second port are configured to retain a seal. The corrosion sensor retainer assembly includes a conductor housed within the laminate. The conductor forms a path that extends around the first port and the second port. At least a portion of the conductor has an exposed surface with a property that changes in the presence of corrosive gas or acid.
    Type: Grant
    Filed: September 17, 2014
    Date of Patent: July 11, 2017
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Mark Taskar, Iqbal Shareef, Anthony Zemlock
  • Patent number: 9580360
    Abstract: A method of making a monolithic ceramic component of a gas delivery system of a semiconductor substrate processing apparatus wherein the gas delivery system is configured to supply process gas to a gas distribution member disposed downstream thereof. The gas distribution member is configured to supply the process gas to a processing region of a vacuum chamber of the apparatus, wherein the processing region is disposed above an upper surface of a semiconductor substrate to be processed. The method comprises preparing a green compact of ceramic material. The green compact of ceramic material is formed into a form of a desired monolithic ceramic component of the gas delivery system. The formed green compact of ceramic material is fired to form the monolithic ceramic component of the gas delivery system.
    Type: Grant
    Filed: April 1, 2015
    Date of Patent: February 28, 2017
    Assignee: LAM RESEARCH CORPORATION
    Inventors: John Daugherty, Iqbal Shareef, Mike Ingamells
  • Publication number: 20170021317
    Abstract: A mixing hub for use in semiconductor processing tools is provided. The hub may include a plurality of ports arranged about an axis, a mixing chamber, and a plurality of flow paths. Each of the flow paths may fluidically connect a corresponding one of the ports to the mixing chamber and each flow path may include a first passage, a second passage, and a valve interface. Each valve interface may be configured to interface with a valve such that the valve, when installed in the valve interface, is able to regulate fluid flow between the first passage and the second passage. Each valve interface may be located between a first reference plane that is perpendicular to the axis and passes through the corresponding port and a second reference plane that is perpendicular to the axis and passes through the mixing chamber.
    Type: Application
    Filed: July 24, 2015
    Publication date: January 26, 2017
    Inventors: Iqbal A. Shareef, Mark Taskar
  • Patent number: 9364870
    Abstract: Ultrasonic cleaning apparatuses and methods of cleaning substantially planar articles. An apparatus comprises (i) a substantially circular tank; (ii) a plurality of cleaning fluid inlets for delivering a cleaning fluid to the tank; (iii) an intermediate support for receiving an article to be cleaned; and (iv) an ultrasonic generator coupled to the tank for generating ultrasonic waves in the tank and cleaning fluid received therein. The apparatus is configured to remove particles from a substantially planar article and have them carried by flow of cleaning fluid away from the article and out of the tank. Using such an apparatus, a cleaning method comprises introducing a substantially planar article to be cleaned into the tank; introducing a cleaning fluid into the tank through the plurality of cleaning fluid inlets; and exciting the cleaning fluid with ultrasonic waves.
    Type: Grant
    Filed: October 29, 2015
    Date of Patent: June 14, 2016
    Assignee: Lam Research Corporation
    Inventors: Evangelos T. Spyropoulos, Iqbal A. Shareef, Clifford Erik La Croix
  • Patent number: 9335768
    Abstract: A multi-line mass flow device configured for controlled delivery of two or more fluids into a process chamber. The multi-line mass flow device comprises a cluster mass flow control manifold and a multi-inlet manifold. The cluster mass flow control manifold comprises a controller, a gas manifold mounting block, and two or more gas flow control stations. The multi-inlet manifold comprises a multi-inlet mounting block, and two or more isolation valves mounted on the multi-inlet mounting block.
    Type: Grant
    Filed: September 12, 2013
    Date of Patent: May 10, 2016
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Mark Taskar, Iqbal Shareef
  • Publication number: 20160111258
    Abstract: A gas supply delivery arrangement of a plasma processing system for processing a substrate with gases introduced through at least first, second, and third gas injection zones comprises process gas supply inlets and tuning gas inlets. A mixing manifold comprises gas sticks in fluid communication with a process gas supply and tuning gas sticks in fluid communication with a tuning gas supply. A first gas outlet delivers gas to the first gas injection zone, a second gas outlet delivers gas to the second gas injection zone, and a third gas outlet delivers gas to the third gas injection zone. A gas splitter is in fluid communication with the mixing manifold, and includes a first valve arrangement which splits mixed gas exiting the mixing manifold into a first mixed gas supplied to the first gas outlet and a second mixed gas supplied to the second, and/or third gas outlets.
    Type: Application
    Filed: October 19, 2015
    Publication date: April 21, 2016
    Applicant: Lam Research Corporation
    Inventors: Mark Taskar, Iqbal Shareef, Anthony Zemlock, Ryan Bise, Nathan Kugland
  • Publication number: 20160076989
    Abstract: A corrosion sensor retainer assembly and method for predicting and detecting corrosion within a gas delivery system of a semiconductor substrate processing apparatus. The corrosion sensor retainer assembly comprises a laminate that includes a first insulating layer with a first port and a second insulating layer with a second port, wherein the first port and the second port are configured to retain a seal. The corrosion sensor retainer assembly includes a conductor housed within the laminate. The conductor forms a path that extends around the first port and the second port. At least a portion of the conductor has an exposed surface with a property that changes in the presence of corrosive gas or acid.
    Type: Application
    Filed: September 17, 2014
    Publication date: March 17, 2016
    Inventors: Mark Taskar, Iqbal Shareef, Anthony Zemlock
  • Publication number: 20160045941
    Abstract: Ultrasonic cleaning apparatuses and methods of cleaning substantially planar articles. An apparatus comprises (i) a substantially circular tank; (ii) a plurality of cleaning fluid inlets for delivering a cleaning fluid to the tank; (iii) an intermediate support for receiving an article to be cleaned; and (iv) an ultrasonic generator coupled to the tank for generating ultrasonic waves in the tank and cleaning fluid received therein. The apparatus is configured to remove particles from a substantially planar article and have them carried by flow of cleaning fluid away from the article and out of the tank. Using such an apparatus, a cleaning method comprises introducing a substantially planar article to be cleaned into the tank; introducing a cleaning fluid into the tank through the plurality of cleaning fluid inlets; and exciting the cleaning fluid with ultrasonic waves.
    Type: Application
    Filed: October 29, 2015
    Publication date: February 18, 2016
    Inventors: Evangelos T. Spyropoulos, Iqbal A. Shareef, Clifford Erik La Croix
  • Patent number: 9174249
    Abstract: Ultrasonic cleaning apparatuses and methods of cleaning substantially planar articles. An apparatus comprises (i) a substantially circular tank; (ii) a plurality of cleaning fluid inlets for delivering a cleaning fluid to the tank; (iii) an intermediate support for receiving an article to be cleaned; and (iv) an ultrasonic generator coupled to the tank for generating ultrasonic waves in the tank and cleaning fluid received therein. The apparatus is configured to remove particles from a substantially planar article and have them carried by flow of cleaning fluid away from the article and out of the tank. Using such an apparatus, a cleaning method comprises introducing a substantially planar article to be cleaned into the tank; introducing a cleaning fluid into the tank through the plurality of cleaning fluid inlets; and exciting the cleaning fluid with ultrasonic waves.
    Type: Grant
    Filed: December 12, 2012
    Date of Patent: November 3, 2015
    Assignee: Lam Research Corporation
    Inventors: Evangelos T. Spyropoulos, Iqbal A. Shareef, Clifford Erik La Croix
  • Patent number: 9175808
    Abstract: A method and apparatus is provided for decreasing the scrubber exhaust from gas panels, lower the cost of operation, lower the facilitation cost and power consumption by increasing the air velocity in areas of high potential risk of ignition. The apparatus includes a supply of compressed dry air (CDA) through the tubing with individual dispersion nozzles. The CDA dispersion nozzles can be installed at various key locations in order to provide additional ventilation turbulence and reduce potential dead zones inside the gas panel. Aspects of the invention help to save the energy and protect the environment by reducing the power consumption. In addition human safety shall be improved by minimizing the potential risk of ignition.
    Type: Grant
    Filed: August 30, 2011
    Date of Patent: November 3, 2015
    Assignee: Lam Research Corporation
    Inventors: Mark Taskar, Iqbal Shareef